ReP USP - Resultado da busca

Artigo de periodico
Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase (2023)
Singh, Hardepinder; Gupta, Mukul; Gupta, Pooja; Penacchio, Rafaela ; Morelhao, Sergio L. ; Kumar, Hardeep
Source: Applied Physics A: Materials Science and Processing (Applied Physics A). Unidade: IF
Subjects: FILMES FINOS, TUNGSTÊNIO, DIFRAÇÃO POR RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SINGH, Hardepinder et al. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase. Applied Physics A: Materials Science and Processing (Applied Physics A), v. 129, n. 5, 2023Tradução . . Disponível em: https://doi.org/10.1007/s00339-023-06552-x. Acesso em: 18 out. 2024.
APA
Singh, H., Gupta, M., Gupta, P., Penacchio, R., Morelhao, S. L., & Kumar, H. (2023). Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase. Applied Physics A: Materials Science and Processing (Applied Physics A), 129( 5). doi:10.1007/s00339-023-06552-x
NLM
Singh H, Gupta M, Gupta P, Penacchio R, Morelhao SL, Kumar H. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase [Internet]. Applied Physics A: Materials Science and Processing (Applied Physics A). 2023 ; 129( 5):[citado 2024 out. 18 ] Available from: https://doi.org/10.1007/s00339-023-06552-x
Vancouver
Singh H, Gupta M, Gupta P, Penacchio R, Morelhao SL, Kumar H. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase [Internet]. Applied Physics A: Materials Science and Processing (Applied Physics A). 2023 ; 129( 5):[citado 2024 out. 18 ] Available from: https://doi.org/10.1007/s00339-023-06552-x
Artigo de periodico
Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator (2022)
Penacchio, Rafaela Felix da Silva ; Fornari, Celso I.; Camillo, Yorí G.; Kagerer, Philipp; Buchberger, Sebastian; Kamp, Martin; Bentmann, Hendrik; Reinert, Friedrich; Morelhão, Sergio Luiz
Source: Thin Solid Films. Unidade: IF
Subjects: FÍSICA DA MATÉRIA CONDENSADA, FILMES FINOS, DIFRAÇÃO POR RAIOS X, MATERIAIS NANOESTRUTURADOS, EPITAXIA POR FEIXE MOLECULAR, CAMPO MAGNÉTICO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PENACCHIO, Rafaela Felix da Silva et al. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator. Thin Solid Films, v. 750, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2022.139183. Acesso em: 18 out. 2024.
APA
Penacchio, R. F. da S., Fornari, C. I., Camillo, Y. G., Kagerer, P., Buchberger, S., Kamp, M., et al. (2022). Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator. Thin Solid Films, 750. doi:10.1016/j.tsf.2022.139183
NLM
Penacchio RF da S, Fornari CI, Camillo YG, Kagerer P, Buchberger S, Kamp M, Bentmann H, Reinert F, Morelhão SL. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator [Internet]. Thin Solid Films. 2022 ; 750[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.tsf.2022.139183
Vancouver
Penacchio RF da S, Fornari CI, Camillo YG, Kagerer P, Buchberger S, Kamp M, Bentmann H, Reinert F, Morelhão SL. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator [Internet]. Thin Solid Films. 2022 ; 750[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.tsf.2022.139183
Artigo de periodico
Structural and magnetic properties of FeRh films grown on MgO(001) MgO(011) and MgO(111) substrates (2022)
Kumar, Hardeep; Morelhão, Sergio Luiz ; Pessotto, Gerson ; Singh, Hardepinder; Sinha, Anil K.; Cornejo, Daniel Reinaldo
Source: Journal of Magnetism and Magnetic Materials. Unidade: IF
Subjects: FÍSICA DA MATÉRIA CONDENSADA, FILMES FINOS, RADIAÇÃO SINCROTRON, DIFRAÇÃO POR RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
KUMAR, Hardeep et al. Structural and magnetic properties of FeRh films grown on MgO(001) MgO(011) and MgO(111) substrates. Journal of Magnetism and Magnetic Materials, v. 556, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.jmmm.2022.169442. Acesso em: 18 out. 2024.
APA
Kumar, H., Morelhão, S. L., Pessotto, G., Singh, H., Sinha, A. K., & Cornejo, D. R. (2022). Structural and magnetic properties of FeRh films grown on MgO(001) MgO(011) and MgO(111) substrates. Journal of Magnetism and Magnetic Materials, 556. doi:10.1016/j.jmmm.2022.169442
NLM
Kumar H, Morelhão SL, Pessotto G, Singh H, Sinha AK, Cornejo DR. Structural and magnetic properties of FeRh films grown on MgO(001) MgO(011) and MgO(111) substrates [Internet]. Journal of Magnetism and Magnetic Materials. 2022 ; 556[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.jmmm.2022.169442
Vancouver
Kumar H, Morelhão SL, Pessotto G, Singh H, Sinha AK, Cornejo DR. Structural and magnetic properties of FeRh films grown on MgO(001) MgO(011) and MgO(111) substrates [Internet]. Journal of Magnetism and Magnetic Materials. 2022 ; 556[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.jmmm.2022.169442
Relatorio tecnico
Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators (2020)
Fornari, Celso I; Abramof, Eduardo; Rappl, Paulo H O; Kycia, Stefan W; Morelhão, Sergio Luiz
Unidade: IF
Subjects: FILMES FINOS, BISMUTO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
FORNARI, Celso I et al. Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/ftp/arxiv/papers/2008/2008.02180.pdf. Acesso em: 18 out. 2024. , 2020
APA
Fornari, C. I., Abramof, E., Rappl, P. H. O., Kycia, S. W., & Morelhão, S. L. (2020). Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/ftp/arxiv/papers/2008/2008.02180.pdf
NLM
Fornari CI, Abramof E, Rappl PHO, Kycia SW, Morelhão SL. Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators [Internet]. 2020 ;[citado 2024 out. 18 ] Available from: https://arxiv.org/ftp/arxiv/papers/2008/2008.02180.pdf
Vancouver
Fornari CI, Abramof E, Rappl PHO, Kycia SW, Morelhão SL. Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators [Internet]. 2020 ;[citado 2024 out. 18 ] Available from: https://arxiv.org/ftp/arxiv/papers/2008/2008.02180.pdf
Artigo de periodico
Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111) (2020)
Kagerer, Philipp ; Fornari, Celso Israel ; Buchberger, S.; Morelhao, Sergio L.; Vidal, R. C.; Tcakaev, Abdul-Vakhab ; Zabolotnyy, V.; Weschke, E.; Hinkov, Vladimir ; Kamp, Martin ; Büchner, B.; Isaeva, Anna ; Bentmann, H.; Reinert, F.
Source: Journal of Applied Physics. Unidade: IF
Subjects: FÍSICA DO ESTADO SÓLIDO, CRISTALOGRAFIA DE RAIOS X, FILMES FINOS, EPITAXIA POR FEIXE MOLECULAR, MICROSCOPIA ELETRÔNICA DE VARREDURA, MICROSCOPIA DE FORÇA ATÔMICA, ESPECTROSCOPIA DE RAIO X, DIFRAÇÃO POR RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
KAGERER, Philipp et al. Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111). Journal of Applied Physics, v. 128, n. 13, 2020Tradução . . Disponível em: https://doi.org/10.1063/5.0025933. Acesso em: 18 out. 2024.
APA
Kagerer, P., Fornari, C. I., Buchberger, S., Morelhao, S. L., Vidal, R. C., Tcakaev, A. -V., et al. (2020). Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111). Journal of Applied Physics, 128( 13). doi:10.1063/5.0025933
NLM
Kagerer P, Fornari CI, Buchberger S, Morelhao SL, Vidal RC, Tcakaev A-V, Zabolotnyy V, Weschke E, Hinkov V, Kamp M, Büchner B, Isaeva A, Bentmann H, Reinert F. Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111) [Internet]. Journal of Applied Physics. 2020 ; 128( 13):[citado 2024 out. 18 ] Available from: https://doi.org/10.1063/5.0025933
Vancouver
Kagerer P, Fornari CI, Buchberger S, Morelhao SL, Vidal RC, Tcakaev A-V, Zabolotnyy V, Weschke E, Hinkov V, Kamp M, Büchner B, Isaeva A, Bentmann H, Reinert F. Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111) [Internet]. Journal of Applied Physics. 2020 ; 128( 13):[citado 2024 out. 18 ] Available from: https://doi.org/10.1063/5.0025933
Trabalho de evento-resumo
A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating (2006)
Morelhão, Sérgio Luiz
Source: ORAL SESSION G4. Conference titles: Encontro da Sociedade Brasileira de Pesquisas em Materiais (SBPMat. Unidade: IF
Subjects: MATERIAIS (PESQUISA), FILMES FINOS, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MORELHÃO, Sérgio Luiz. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating. 2006, Anais.. Rio de Janeiro: SBPMat, 2006. Disponível em: http://www.sbpmat.org.br/5encontro/SympG.pdf. Acesso em: 18 out. 2024.
APA
Morelhão, S. L. (2006). A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating. In ORAL SESSION G4. Rio de Janeiro: SBPMat. Recuperado de http://www.sbpmat.org.br/5encontro/SympG.pdf
NLM
Morelhão SL. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating [Internet]. ORAL SESSION G4. 2006 ;[citado 2024 out. 18 ] Available from: http://www.sbpmat.org.br/5encontro/SympG.pdf
Vancouver
Morelhão SL. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating [Internet]. ORAL SESSION G4. 2006 ;[citado 2024 out. 18 ] Available from: http://www.sbpmat.org.br/5encontro/SympG.pdf
Artigo de periodico
Roughness and nanoholes in sol-gel thin films (2005)
Antunes, A; Amaral, T; Brito, Giancarlo Esposito de Souza; Abramof, E; Morelhao, Sergio Luiz
Source: Microelectronics Journal. Unidade: IF
Subjects: MICROELETRÔNICA, FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
ANTUNES, A et al. Roughness and nanoholes in sol-gel thin films. Microelectronics Journal, v. 36, n. 3-6, p. 567-569, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.mejo.2005.02.078. Acesso em: 18 out. 2024.
APA
Antunes, A., Amaral, T., Brito, G. E. de S., Abramof, E., & Morelhao, S. L. (2005). Roughness and nanoholes in sol-gel thin films. Microelectronics Journal, 36( 3-6), 567-569. doi:10.1016/j.mejo.2005.02.078
NLM
Antunes A, Amaral T, Brito GE de S, Abramof E, Morelhao SL. Roughness and nanoholes in sol-gel thin films [Internet]. Microelectronics Journal. 2005 ; 36( 3-6): 567-569.[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.mejo.2005.02.078
Vancouver
Antunes A, Amaral T, Brito GE de S, Abramof E, Morelhao SL. Roughness and nanoholes in sol-gel thin films [Internet]. Microelectronics Journal. 2005 ; 36( 3-6): 567-569.[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/j.mejo.2005.02.078
Artigo de periodico
Nanostructure of sol-gel films by x-ray specular reflectivity (2002)
Morelhão, Sérgio Luiz; Brito, Giancarlo Esposito de Souza; Abramof, E
Source: Applied Physics Letters. Unidade: IF
Assunto: FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MORELHÃO, Sérgio Luiz e BRITO, Giancarlo Esposito de Souza e ABRAMOF, E. Nanostructure of sol-gel films by x-ray specular reflectivity. Applied Physics Letters, v. 80, n. 3, p. 407-409, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1436271. Acesso em: 18 out. 2024.
APA
Morelhão, S. L., Brito, G. E. de S., & Abramof, E. (2002). Nanostructure of sol-gel films by x-ray specular reflectivity. Applied Physics Letters, 80( 3), 407-409. doi:10.1063/1.1436271
NLM
Morelhão SL, Brito GE de S, Abramof E. Nanostructure of sol-gel films by x-ray specular reflectivity [Internet]. Applied Physics Letters. 2002 ; 80( 3): 407-409.[citado 2024 out. 18 ] Available from: https://doi.org/10.1063/1.1436271
Vancouver
Morelhão SL, Brito GE de S, Abramof E. Nanostructure of sol-gel films by x-ray specular reflectivity [Internet]. Applied Physics Letters. 2002 ; 80( 3): 407-409.[citado 2024 out. 18 ] Available from: https://doi.org/10.1063/1.1436271
Artigo de periodico
Characterization of erbium oxide sol-gel films and devices by grazing incidence X-ray reflectivity (2002)
Morelhão, Sérgio Luiz; Brito, Giancarlo Esposito de Souza; Abramof, Eduardo
Source: Journal of Alloys and Compounds. Unidade: IF
Subjects: SUPERFÍCIE FÍSICA, FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MORELHÃO, Sérgio Luiz e BRITO, Giancarlo Esposito de Souza e ABRAMOF, Eduardo. Characterization of erbium oxide sol-gel films and devices by grazing incidence X-ray reflectivity. Journal of Alloys and Compounds, v. 344, n. 102, p. 207-211, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0925-8388(02)00342-0. Acesso em: 18 out. 2024.
APA
Morelhão, S. L., Brito, G. E. de S., & Abramof, E. (2002). Characterization of erbium oxide sol-gel films and devices by grazing incidence X-ray reflectivity. Journal of Alloys and Compounds, 344( 102), 207-211. doi:10.1016/s0925-8388(02)00342-0
NLM
Morelhão SL, Brito GE de S, Abramof E. Characterization of erbium oxide sol-gel films and devices by grazing incidence X-ray reflectivity [Internet]. Journal of Alloys and Compounds. 2002 ; 344( 102): 207-211.[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/s0925-8388(02)00342-0
Vancouver
Morelhão SL, Brito GE de S, Abramof E. Characterization of erbium oxide sol-gel films and devices by grazing incidence X-ray reflectivity [Internet]. Journal of Alloys and Compounds. 2002 ; 344( 102): 207-211.[citado 2024 out. 18 ] Available from: https://doi.org/10.1016/s0925-8388(02)00342-0

USP Schools

ReP

Filtros

Authors

Date published

Subjects

Source title

Funding Agencies

Indexado em

Non normalized affiliation