Filtros : "EP" "Inglaterra" "Massi, Marcos" Limpar

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  • Source: Microelectronics Journal. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

    Acesso à fonteDOIHow to cite
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    • ABNT

      MOUSINHO, Ana Paula et al. High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, v. 34, n. 5-8, p. 627-629, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00065-x. Acesso em: 14 set. 2024.
    • APA

      Mousinho, A. P., Mansano, R. D., Massi, M., & Zambom, L. da S. (2003). High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, 34( 5-8), 627-629. doi:10.1016/s0026-2692(03)00065-x
    • NLM

      Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
    • Vancouver

      Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
  • Source: Microelectronics Journal,. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

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    • ABNT

      MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 14 set. 2024.
    • APA

      Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
    • NLM

      Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
    • Vancouver

      Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
  • Source: Microelectronics Journal. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

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    • ABNT

      GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 14 set. 2024.
    • APA

      Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
    • NLM

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
    • Vancouver

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
  • Source: Journal of Materials Science: Materials in Electronics. Unidade: EP

    Assunto: FILMES FINOS

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    • ABNT

      MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 14 set. 2024.
    • APA

      Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.
    • NLM

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 set. 14 ]
    • Vancouver

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 set. 14 ]
  • Source: Journal of Materials Science: Materials in Electronics. Conference titles: International Conference on Materials for Microelectronics. Unidade: EP

    Assunto: FILMES

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    • ABNT

      MASSI, Marcos et al. Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343–346, 2001Tradução . . Disponível em: https://doi.org/10.1023/A:1011252629646. Acesso em: 14 set. 2024.
    • APA

      Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343–346. doi:10.1023/A:1011252629646
    • NLM

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 set. 14 ] Available from: https://doi.org/10.1023/A:1011252629646
    • Vancouver

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 set. 14 ] Available from: https://doi.org/10.1023/A:1011252629646

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