Silicon wall profiles generated by isotropic dry etching process (1997)
Fonte: CIP'97 : proceedings. Nome do evento: International Colloquium on Plasma Processes. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Silicon wall profiles generated by isotropic dry etching process. 1997, Anais.. Paris: Société Française du Vide, 1997. . Acesso em: 26 ago. 2024.APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1997). Silicon wall profiles generated by isotropic dry etching process. In CIP'97 : proceedings. Paris: Société Française du Vide.NLM
Mansano RD, Verdonck PB, Maciel HS. Silicon wall profiles generated by isotropic dry etching process. CIP'97 : proceedings. 1997 ;[citado 2024 ago. 26 ]Vancouver
Mansano RD, Verdonck PB, Maciel HS. Silicon wall profiles generated by isotropic dry etching process. CIP'97 : proceedings. 1997 ;[citado 2024 ago. 26 ]