ReP USP - Resultado da busca

Artigo de periodico
Compatibility of polyvinyl chloride (PVC) medical devices and other polymeric materials with reactive ion etching (RIE) and inductively couple plasma (ICP) sterilization using a quality by design (QbD) approach (2018)
Oliveira, Débora Cristina de; Calixto, Leandro Augusto; Fukuda, Isa Martins; Saviano, Alessandro Morais; Moreira, Adir José; Kawano, Yoshio; Mansano, Ronaldo Domingues ; Pinto, Terezinha de Jesus Andreoli ; Lourenço, Felipe Rebello
Source: Journal of Pharmaceutical Innovation. Unidades: RUSP, IQ, EP, FCF
Subjects: ESTERILIZAÇÃO, DISPOSITIVOS E INSTRUMENTOS MÉDICOS
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ABNT
OLIVEIRA, Débora Cristina de et al. Compatibility of polyvinyl chloride (PVC) medical devices and other polymeric materials with reactive ion etching (RIE) and inductively couple plasma (ICP) sterilization using a quality by design (QbD) approach. Journal of Pharmaceutical Innovation, v. 13, n. 2, p. 110-120, 2018Tradução . . Disponível em: https://doi.org/10.1007/s12247-018-9309-1. Acesso em: 05 nov. 2024.
APA
Oliveira, D. C. de, Calixto, L. A., Fukuda, I. M., Saviano, A. M., Moreira, A. J., Kawano, Y., et al. (2018). Compatibility of polyvinyl chloride (PVC) medical devices and other polymeric materials with reactive ion etching (RIE) and inductively couple plasma (ICP) sterilization using a quality by design (QbD) approach. Journal of Pharmaceutical Innovation, 13( 2), 110-120. doi:10.1007/s12247-018-9309-1
NLM
Oliveira DC de, Calixto LA, Fukuda IM, Saviano AM, Moreira AJ, Kawano Y, Mansano RD, Pinto T de JA, Lourenço FR. Compatibility of polyvinyl chloride (PVC) medical devices and other polymeric materials with reactive ion etching (RIE) and inductively couple plasma (ICP) sterilization using a quality by design (QbD) approach [Internet]. Journal of Pharmaceutical Innovation. 2018 ; 13( 2): 110-120.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s12247-018-9309-1
Vancouver
Oliveira DC de, Calixto LA, Fukuda IM, Saviano AM, Moreira AJ, Kawano Y, Mansano RD, Pinto T de JA, Lourenço FR. Compatibility of polyvinyl chloride (PVC) medical devices and other polymeric materials with reactive ion etching (RIE) and inductively couple plasma (ICP) sterilization using a quality by design (QbD) approach [Internet]. Journal of Pharmaceutical Innovation. 2018 ; 13( 2): 110-120.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s12247-018-9309-1
Artigo de periodico
Temperature Modulated Nanomechanical Thermal Analysis (2018)
Alves, Gustavo Marcati Alexandrino; Goswani, Sanjukta Bose; Mansano, Ronaldo Domingues ; Boisen, Anja
Source: IEEE Sensors Journal. Unidade: EP
Subjects: AQUECIMENTO, TEMPERATURA, ANÁLISE TÉRMICA
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ALVES, Gustavo Marcati Alexandrino et al. Temperature Modulated Nanomechanical Thermal Analysis. IEEE Sensors Journal, v. 18, n. 10, p. 4001-4007, 2018Tradução . . Disponível em: https://doi.org/10.1109/JSEN.2018.2819898. Acesso em: 05 nov. 2024.
APA
Alves, G. M. A., Goswani, S. B., Mansano, R. D., & Boisen, A. (2018). Temperature Modulated Nanomechanical Thermal Analysis. IEEE Sensors Journal, 18( 10), 4001-4007. doi:10.1109/JSEN.2018.2819898
NLM
Alves GMA, Goswani SB, Mansano RD, Boisen A. Temperature Modulated Nanomechanical Thermal Analysis [Internet]. IEEE Sensors Journal. 2018 ; 18( 10): 4001-4007.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1109/JSEN.2018.2819898
Vancouver
Alves GMA, Goswani SB, Mansano RD, Boisen A. Temperature Modulated Nanomechanical Thermal Analysis [Internet]. IEEE Sensors Journal. 2018 ; 18( 10): 4001-4007.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1109/JSEN.2018.2819898
Artigo de periodico
Using microcantilever sensors to measure poly(lactic-co-glycolic acid) plasticization by moisture uptake (2018)
Alves, Gustavo Marcati Alexandrino; Mansano, Ronaldo Domingues ; Goswani, Sanjukta Bose; Boisen, Anja
Source: Polymer Testing. Unidade: EP
Subjects: ANÁLISE TÉRMICA, PLÁSTICOS, VIDRO
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ALVES, Gustavo Marcati Alexandrino et al. Using microcantilever sensors to measure poly(lactic-co-glycolic acid) plasticization by moisture uptake. Polymer Testing, v. 65, p. 407-413, 2018Tradução . . Disponível em: https://doi.org/10.1016/j.polymertesting.2017.12.017. Acesso em: 05 nov. 2024.
APA
Alves, G. M. A., Mansano, R. D., Goswani, S. B., & Boisen, A. (2018). Using microcantilever sensors to measure poly(lactic-co-glycolic acid) plasticization by moisture uptake. Polymer Testing, 65, 407-413. doi:10.1016/j.polymertesting.2017.12.017
NLM
Alves GMA, Mansano RD, Goswani SB, Boisen A. Using microcantilever sensors to measure poly(lactic-co-glycolic acid) plasticization by moisture uptake [Internet]. Polymer Testing. 2018 ; 65 407-413.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.polymertesting.2017.12.017
Vancouver
Alves GMA, Mansano RD, Goswani SB, Boisen A. Using microcantilever sensors to measure poly(lactic-co-glycolic acid) plasticization by moisture uptake [Internet]. Polymer Testing. 2018 ; 65 407-413.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.polymertesting.2017.12.017
Artigo de periodico
In and Cd as defect traps in titanium dioxide (2017)
Schell, Juliana; Johnston, Karl; Ribeiro Junior, Iberê Souza; Lupascu, Doru C; Correia, João Guilherme Martins; Carbonari, Artur Wilson; Deicher, Manfred; Barbosa, Marcelo Baptista; Mansano, Ronaldo Domingues
Source: Hyperfine Interactions. Unidade: EP
Subjects: CRISTALOGRAFIA FÍSICA, GAMAESPECTROMETRIA
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ABNT
SCHELL, Juliana et al. In and Cd as defect traps in titanium dioxide. Hyperfine Interactions, v. 238, n. 2, p. 1-9, 2017Tradução . . Disponível em: https://doi.org/10.1007/s10751-016-1373-7. Acesso em: 05 nov. 2024.
APA
Schell, J., Johnston, K., Ribeiro Junior, I. S., Lupascu, D. C., Correia, J. G. M., Carbonari, A. W., et al. (2017). In and Cd as defect traps in titanium dioxide. Hyperfine Interactions, 238( 2), 1-9. doi:10.1007/s10751-016-1373-7
NLM
Schell J, Johnston K, Ribeiro Junior IS, Lupascu DC, Correia JGM, Carbonari AW, Deicher M, Barbosa MB, Mansano RD. In and Cd as defect traps in titanium dioxide [Internet]. Hyperfine Interactions. 2017 ; 238( 2): 1-9.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s10751-016-1373-7
Vancouver
Schell J, Johnston K, Ribeiro Junior IS, Lupascu DC, Correia JGM, Carbonari AW, Deicher M, Barbosa MB, Mansano RD. In and Cd as defect traps in titanium dioxide [Internet]. Hyperfine Interactions. 2017 ; 238( 2): 1-9.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s10751-016-1373-7
Artigo de periodico
Ion implantation in titanium dioxide thin films studied by perturbed angular correlations (2017)
Schell, Juliana; Lupascu, Doru C; Carbonari, Artur Wilson; Mansano, Ronaldo Domingues ; Ribeiro Junior, Iberê Souza; Dang, Thien Thanh; Anusca, Irina; Trivedi, Harsh K; Johnston, Karl; Vianden, Reiner
Source: Journal of Applied Physics. Unidade: EP
Subjects: TEMPERATURA, RAIOS GAMA, FILMES FINOS
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ABNT
SCHELL, Juliana et al. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations. Journal of Applied Physics, v. 121, n. 14, 2017Tradução . . Disponível em: https://doi.org/10.1063/1.4980168. Acesso em: 05 nov. 2024.
APA
Schell, J., Lupascu, D. C., Carbonari, A. W., Mansano, R. D., Ribeiro Junior, I. S., Dang, T. T., et al. (2017). Ion implantation in titanium dioxide thin films studied by perturbed angular correlations. Journal of Applied Physics, 121( 14). doi:10.1063/1.4980168
NLM
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Ribeiro Junior IS, Dang TT, Anusca I, Trivedi HK, Johnston K, Vianden R. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations [Internet]. Journal of Applied Physics. 2017 ; 121( 14):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4980168
Vancouver
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Ribeiro Junior IS, Dang TT, Anusca I, Trivedi HK, Johnston K, Vianden R. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations [Internet]. Journal of Applied Physics. 2017 ; 121( 14):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4980168
Artigo de periodico
Implantation of cobalt in SnO2 thin films studied by TDPAC (2017)
Schell, Juliana; Dang, Thien Thanh; Viaden, Reiner; Mansano, Ronaldo Domingues ; Lupascu, Doru C; Carbonari, Artur Wilson
Source: AIP Advances. Unidade: EP
Subjects: FILMES FINOS, SEMICONDUTORES, CRISTALOGRAFIA FÍSICA
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ABNT
SCHELL, Juliana et al. Implantation of cobalt in SnO2 thin films studied by TDPAC. AIP Advances, v. 7, n. 5, 2017Tradução . . Disponível em: https://doi.org/10.1063/1.4983270. Acesso em: 05 nov. 2024.
APA
Schell, J., Dang, T. T., Viaden, R., Mansano, R. D., Lupascu, D. C., & Carbonari, A. W. (2017). Implantation of cobalt in SnO2 thin films studied by TDPAC. AIP Advances, 7( 5). doi:10.1063/1.4983270
NLM
Schell J, Dang TT, Viaden R, Mansano RD, Lupascu DC, Carbonari AW. Implantation of cobalt in SnO2 thin films studied by TDPAC [Internet]. AIP Advances. 2017 ; 7( 5):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4983270
Vancouver
Schell J, Dang TT, Viaden R, Mansano RD, Lupascu DC, Carbonari AW. Implantation of cobalt in SnO2 thin films studied by TDPAC [Internet]. AIP Advances. 2017 ; 7( 5):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4983270
Artigo de periodico
Cd and In-doping in thin film SnO2 (2017)
Schell, Juliana; Lupascu, Doru C; Carbonari, Artur Wilson; Mansano, Ronaldo Domingues ; Freitas, Rafael Sá de; Gonçalves, João Nuno; Dang, Thien Thanh; Vianden, Reiner
Source: Journal of Applied Physics. Unidades: EP, IF
Subjects: MAGNETISMO, FENOMENOS MAGNÉTICOS, FILMES FINOS
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SCHELL, Juliana et al. Cd and In-doping in thin film SnO2. Journal of Applied Physics, v. 121, n. 19, p. 195303/1-195303/6, 2017Tradução . . Disponível em: https://doi.org/10.1063/1.4983669. Acesso em: 05 nov. 2024.
APA
Schell, J., Lupascu, D. C., Carbonari, A. W., Mansano, R. D., Freitas, R. S. de, Gonçalves, J. N., et al. (2017). Cd and In-doping in thin film SnO2. Journal of Applied Physics, 121( 19), 195303/1-195303/6. doi:10.1063/1.4983669
NLM
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Freitas RS de, Gonçalves JN, Dang TT, Vianden R. Cd and In-doping in thin film SnO2 [Internet]. Journal of Applied Physics. 2017 ; 121( 19): 195303/1-195303/6.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4983669
Vancouver
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Freitas RS de, Gonçalves JN, Dang TT, Vianden R. Cd and In-doping in thin film SnO2 [Internet]. Journal of Applied Physics. 2017 ; 121( 19): 195303/1-195303/6.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1063/1.4983669
Artigo de periodico
Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition (2015)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues
Source: Journal of Physics: Conference Series. Unidade: EP
Assunto: NANOTUBOS DE CARBONO
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ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition. Journal of Physics: Conference Series, v. 591, 2015Tradução . . Disponível em: https://doi.org/10.1088/1742-6596/591/1/012054. Acesso em: 05 nov. 2024.
APA
Mousinho, A. P., & Mansano, R. D. (2015). Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition. Journal of Physics: Conference Series, 591. doi:10.1088/1742-6596/591/1/012054
NLM
Mousinho AP, Mansano RD. Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition [Internet]. Journal of Physics: Conference Series. 2015 ; 591[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012054
Vancouver
Mousinho AP, Mansano RD. Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition [Internet]. Journal of Physics: Conference Series. 2015 ; 591[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012054
Artigo de periodico
Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support (2015)
Moreira, Adir José; Mansano, Ronaldo Domingues ; Ordonez, Nelson
Source: Journal of Physics: Conference Series. Unidade: EP
Assunto: CÉLULAS A COMBUSTÍVEL
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ABNT
MOREIRA, Adir José e MANSANO, Ronaldo Domingues e ORDONEZ, Nelson. Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support. Journal of Physics: Conference Series, v. 591, p. 012053, 2015Tradução . . Disponível em: https://doi.org/10.1088/1742-6596/591/1/012053. Acesso em: 05 nov. 2024.
APA
Moreira, A. J., Mansano, R. D., & Ordonez, N. (2015). Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support. Journal of Physics: Conference Series, 591, 012053. doi:10.1088/1742-6596/591/1/012053
NLM
Moreira AJ, Mansano RD, Ordonez N. Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support [Internet]. Journal of Physics: Conference Series. 2015 ; 591 012053.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012053
Vancouver
Moreira AJ, Mansano RD, Ordonez N. Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support [Internet]. Journal of Physics: Conference Series. 2015 ; 591 012053.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012053
Trabalho de evento-anais periodico
p-ZnO Thin Films Deposited by RF-Magnetron Sputtering (2015)
Zambom, Luís da Silva ; Mansano, Ronaldo Domingues
Source: Journal of Physics: Conference Series. Conference titles: IAEA TM on Research Using Small Fusion Devices (RUSFD). Unidade: EP
Assunto: FILMES FINOS
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ABNT
ZAMBOM, Luís da Silva e MANSANO, Ronaldo Domingues. p-ZnO Thin Films Deposited by RF-Magnetron Sputtering. Journal of Physics: Conference Series. [S.l.]: Escola Politécnica, Universidade de São Paulo. Disponível em: https://doi.org/10.1088/1742-6596/591/1/012040. Acesso em: 05 nov. 2024. , 2015
APA
Zambom, L. da S., & Mansano, R. D. (2015). p-ZnO Thin Films Deposited by RF-Magnetron Sputtering. Journal of Physics: Conference Series. Escola Politécnica, Universidade de São Paulo. doi:10.1088/1742-6596/591/1/012040
NLM
Zambom L da S, Mansano RD. p-ZnO Thin Films Deposited by RF-Magnetron Sputtering [Internet]. Journal of Physics: Conference Series. 2015 ; 591[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012040
Vancouver
Zambom L da S, Mansano RD. p-ZnO Thin Films Deposited by RF-Magnetron Sputtering [Internet]. Journal of Physics: Conference Series. 2015 ; 591[citado 2024 nov. 05 ] Available from: https://doi.org/10.1088/1742-6596/591/1/012040
Trabalho de evento
Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system (2012)
Cirino, Giuseppe Antonio; Lopera, S. A.; Montagnoli, A. N.; Gonçalves Neto, Luiz; Mansano, Ronaldo Domingues
Source: Proceedings of SPIE. Conference titles: SPIE Optical Engineering + Applications. Unidades: EESC, EP
Subjects: LENTES, ENGENHARIA ELÉTRICA
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ABNT
CIRINO, Giuseppe Antonio et al. Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system. 2012, Anais.. Bellingham, WA, USA: SPIE, 2012. p. 1-7. Disponível em: https://doi.org/10.1117/12.928819. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Lopera, S. A., Montagnoli, A. N., Gonçalves Neto, L., & Mansano, R. D. (2012). Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system. In Proceedings of SPIE (Vol. 8489, p. 1-7). Bellingham, WA, USA: SPIE. doi:10.1117/12.928819
NLM
Cirino GA, Lopera SA, Montagnoli AN, Gonçalves Neto L, Mansano RD. Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system [Internet]. Proceedings of SPIE. 2012 ; 8489 1-7.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1117/12.928819
Vancouver
Cirino GA, Lopera SA, Montagnoli AN, Gonçalves Neto L, Mansano RD. Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system [Internet]. Proceedings of SPIE. 2012 ; 8489 1-7.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1117/12.928819
Trabalho de evento
Low-cost polymer fresnel microlens array fabricated by maskless lithography (2012)
Cirino, Giuseppe Antonio; Lopera Aristizábal, Sergio; Gonçalves Neto, Luiz; Montagnoli, Arlindo Neto; Mansano, Ronaldo Domingues
Conference titles: Latin America Optics & Photonics Conference - LAOP. Unidades: EESC, EP
Subjects: TOLERÂNCIA, ÓPTICA, FABRICAÇÃO (MICROELETRÔNICA)
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ABNT
CIRINO, Giuseppe Antonio et al. Low-cost polymer fresnel microlens array fabricated by maskless lithography. 2012, Anais.. Washington: Optical Society of America, 2012. Disponível em: https://doi.org/10.1364/LAOP.2012.LS4C.4. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Lopera Aristizábal, S., Gonçalves Neto, L., Montagnoli, A. N., & Mansano, R. D. (2012). Low-cost polymer fresnel microlens array fabricated by maskless lithography. In . Washington: Optical Society of America. doi:10.1364/LAOP.2012.LS4C.4
NLM
Cirino GA, Lopera Aristizábal S, Gonçalves Neto L, Montagnoli AN, Mansano RD. Low-cost polymer fresnel microlens array fabricated by maskless lithography [Internet]. 2012 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/LAOP.2012.LS4C.4
Vancouver
Cirino GA, Lopera Aristizábal S, Gonçalves Neto L, Montagnoli AN, Mansano RD. Low-cost polymer fresnel microlens array fabricated by maskless lithography [Internet]. 2012 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/LAOP.2012.LS4C.4
Trabalho de evento
Microlens array fabricated by gray-scale lithography maskless system (2012)
Cirino, Giuseppe Antonio; Lopera Aristizábal, Sergio; Montagnoli, Arlindo Neto ; Mansano, Ronaldo Domingues ; Goncalves Neto, Luiz
Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidades: EP, EESC
Assunto: MICROELETRÔNICA
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ABNT
CIRINO, Giuseppe Antonio et al. Microlens array fabricated by gray-scale lithography maskless system. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://doi.org/10.1149/04901.0339ecst. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Lopera Aristizábal, S., Montagnoli, A. N., Mansano, R. D., & Goncalves Neto, L. (2012). Microlens array fabricated by gray-scale lithography maskless system. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. doi:10.1149/04901.0339ecst
NLM
Cirino GA, Lopera Aristizábal S, Montagnoli AN, Mansano RD, Goncalves Neto L. Microlens array fabricated by gray-scale lithography maskless system [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/04901.0339ecst
Vancouver
Cirino GA, Lopera Aristizábal S, Montagnoli AN, Mansano RD, Goncalves Neto L. Microlens array fabricated by gray-scale lithography maskless system [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/04901.0339ecst
Artigo de periodico
Diffractive phase-shift lithography photomask operating in proximity printing mode (2010)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Cescato, Lucila; Gonçalves Neto, Luiz
Source: Optics Express. Unidades: EP, EESC
Subjects: HOLOGRAMAS, ÓPTICA
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ABNT
CIRINO, Giuseppe Antonio et al. Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, v. 18, n. 16, p. 16387-16405, 2010Tradução . . Disponível em: https://doi.org/10.1364/OE.18.016387. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L., & Gonçalves Neto, L. (2010). Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, 18( 16), 16387-16405. doi:10.1364/OE.18.016387
NLM
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387
Trabalho de evento
Diffractive optical element applied to proximity exposure lithography exploring partial light coherence (2010)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Gonçalves Neto, Luiz
Conference titles: Latin America Optics & Photonics Conference. Unidades: EP, EESC
Subjects: DIFRAÇÃO DA LUZ, ANÁLISE ÓTICA
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ABNT
CIRINO, Giuseppe Antonio et al. Diffractive optical element applied to proximity exposure lithography exploring partial light coherence. 2010, Anais.. Washington: Optical Society of America, 2010. . Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., & Gonçalves Neto, L. (2010). Diffractive optical element applied to proximity exposure lithography exploring partial light coherence. In . Washington: Optical Society of America.
NLM
Cirino GA, Mansano RD, Verdonck PB, Gonçalves Neto L. Diffractive optical element applied to proximity exposure lithography exploring partial light coherence. 2010 ;[citado 2024 nov. 05 ]
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Gonçalves Neto L. Diffractive optical element applied to proximity exposure lithography exploring partial light coherence. 2010 ;[citado 2024 nov. 05 ]
Artigo de periodico
a-Si:H thin films deposited at low temperature by sputtering (2010)
Nunes, Carolina Carvalho Previdi; Zambom, Luís da Silva ; Mansano, Ronaldo Domingues
Source: Microelectronics Technology and Devices - SBMicro 2010. Unidade: EP
Assunto: ELETROQUÍMICA
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ABNT
NUNES, Carolina Carvalho Previdi e ZAMBOM, Luís da Silva e MANSANO, Ronaldo Domingues. a-Si:H thin films deposited at low temperature by sputtering. Microelectronics Technology and Devices - SBMicro 2010, v. 31, n. 1, p. 135-142, 2010Tradução . . Disponível em: https://doi.org/10.1149/1.3474151. Acesso em: 05 nov. 2024.
APA
Nunes, C. C. P., Zambom, L. da S., & Mansano, R. D. (2010). a-Si:H thin films deposited at low temperature by sputtering. Microelectronics Technology and Devices - SBMicro 2010, 31( 1), 135-142. doi:10.1149/1.3474151
NLM
Nunes CCP, Zambom L da S, Mansano RD. a-Si:H thin films deposited at low temperature by sputtering [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 135-142.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474151
Vancouver
Nunes CCP, Zambom L da S, Mansano RD. a-Si:H thin films deposited at low temperature by sputtering [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 135-142.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474151
Artigo de periodico
Thickness dependence of indium-tin oxide thin films deposited by RF magnetron sputtering (2010)
Damiani, Larissa Rodrigues; Mansano, Ronaldo Domingues
Source: Microelectronics Technology and Devices - SBMicro 2010. Unidade: EP
Assunto: ELETROQUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
DAMIANI, Larissa Rodrigues e MANSANO, Ronaldo Domingues. Thickness dependence of indium-tin oxide thin films deposited by RF magnetron sputtering. Microelectronics Technology and Devices - SBMicro 2010, v. 31, n. 1, p. 117-124, 2010Tradução . . Disponível em: https://doi.org/10.1149/1.3474149. Acesso em: 05 nov. 2024.
APA
Damiani, L. R., & Mansano, R. D. (2010). Thickness dependence of indium-tin oxide thin films deposited by RF magnetron sputtering. Microelectronics Technology and Devices - SBMicro 2010, 31( 1), 117-124. doi:10.1149/1.3474149
NLM
Damiani LR, Mansano RD. Thickness dependence of indium-tin oxide thin films deposited by RF magnetron sputtering [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 117-124.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474149
Vancouver
Damiani LR, Mansano RD. Thickness dependence of indium-tin oxide thin films deposited by RF magnetron sputtering [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 117-124.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474149
Artigo de periodico
Characterization of InN thin films grown by IBAD method (2010)
Sparvoli, Marina; Chubaci, José Fernando Diniz ; Mansano, Ronaldo Domingues
Source: Microelectronics Technology and Devices - SBMicro 2010. Unidades: EP, IF
Subjects: TRANSISTORES, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SPARVOLI, Marina e CHUBACI, José Fernando Diniz e MANSANO, Ronaldo Domingues. Characterization of InN thin films grown by IBAD method. Microelectronics Technology and Devices - SBMicro 2010, v. 31, n. 1, p. 165-170, 2010Tradução . . Disponível em: https://doi.org/10.1149/1.3474155. Acesso em: 05 nov. 2024.
APA
Sparvoli, M., Chubaci, J. F. D., & Mansano, R. D. (2010). Characterization of InN thin films grown by IBAD method. Microelectronics Technology and Devices - SBMicro 2010, 31( 1), 165-170. doi:10.1149/1.3474155
NLM
Sparvoli M, Chubaci JFD, Mansano RD. Characterization of InN thin films grown by IBAD method [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 165-170.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474155
Vancouver
Sparvoli M, Chubaci JFD, Mansano RD. Characterization of InN thin films grown by IBAD method [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 165-170.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1149/1.3474155
Artigo de periodico
Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering (2010)
Rasia, Luiz Antônio; Mansano, Ronaldo Domingues ; Damiani, Larissa Rodrigues; Viana, C. E.
Source: Journal of materials science. Unidade: EP
Assunto: FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RASIA, Luiz Antônio et al. Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering. Journal of materials science, v. 45, n. 15, p. 4224-4228, 2010Tradução . . Disponível em: https://doi.org/10.1007/s10853-010-4517-1. Acesso em: 05 nov. 2024.
APA
Rasia, L. A., Mansano, R. D., Damiani, L. R., & Viana, C. E. (2010). Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering. Journal of materials science, 45( 15), 4224-4228. doi:10.1007/s10853-010-4517-1
NLM
Rasia LA, Mansano RD, Damiani LR, Viana CE. Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering [Internet]. Journal of materials science. 2010 ;45( 15): 4224-4228.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s10853-010-4517-1
Vancouver
Rasia LA, Mansano RD, Damiani LR, Viana CE. Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering [Internet]. Journal of materials science. 2010 ;45( 15): 4224-4228.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1007/s10853-010-4517-1
Trabalho de evento-resumo
Pattern transfer by diffractive photomask (2009)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Cescato, Lucila H.; Marega Junior, Euclydes ; Gonçalves Neto, Luiz
Source: Abstracts. Conference titles: Frontiers in Optics. Unidades: IFSC, EP
Subjects: IMPRESSÃO (TÉCNICAS;DESENVOLVIMENTO), LITOGRAFIA (PROCESSOS DE IMPRESSÃO), HOLOGRAFIA DIGITAL
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CIRINO, Giuseppe Antonio et al. Pattern transfer by diffractive photomask. 2009, Anais.. Washington, DC: Optical Society of America - OSA, 2009. Disponível em: https://doi.org/10.1364/FIO.2009.JWC4. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L. H., Marega Junior, E., & Gonçalves Neto, L. (2009). Pattern transfer by diffractive photomask. In Abstracts. Washington, DC: Optical Society of America - OSA. doi:10.1364/FIO.2009.JWC4
NLM
Cirino GA, Mansano RD, Verdonck PB, Cescato LH, Marega Junior E, Gonçalves Neto L. Pattern transfer by diffractive photomask [Internet]. Abstracts. 2009 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/FIO.2009.JWC4
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Cescato LH, Marega Junior E, Gonçalves Neto L. Pattern transfer by diffractive photomask [Internet]. Abstracts. 2009 ;[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/FIO.2009.JWC4

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