Ion implantation in titanium dioxide thin films studied by perturbed angular correlations (2017)
- Authors:
- Autor USP: MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- DOI: 10.1063/1.4980168
- Subjects: TEMPERATURA; RAIOS GAMA; FILMES FINOS
- Language: Inglês
- Source:
- Título do periódico: Journal of Applied Physics
- Volume/Número/Paginação/Ano: v. 121, n. 14, April 2017
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
SCHELL, Juliana et al. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations. Journal of Applied Physics, v. 121, n. 14, 2017Tradução . . Disponível em: https://doi.org/10.1063/1.4980168. Acesso em: 19 abr. 2024. -
APA
Schell, J., Lupascu, D. C., Carbonari, A. W., Mansano, R. D., Ribeiro Junior, I. S., Dang, T. T., et al. (2017). Ion implantation in titanium dioxide thin films studied by perturbed angular correlations. Journal of Applied Physics, 121( 14). doi:10.1063/1.4980168 -
NLM
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Ribeiro Junior IS, Dang TT, Anusca I, Trivedi HK, Johnston K, Vianden R. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations [Internet]. Journal of Applied Physics. 2017 ; 121( 14):[citado 2024 abr. 19 ] Available from: https://doi.org/10.1063/1.4980168 -
Vancouver
Schell J, Lupascu DC, Carbonari AW, Mansano RD, Ribeiro Junior IS, Dang TT, Anusca I, Trivedi HK, Johnston K, Vianden R. Ion implantation in titanium dioxide thin films studied by perturbed angular correlations [Internet]. Journal of Applied Physics. 2017 ; 121( 14):[citado 2024 abr. 19 ] Available from: https://doi.org/10.1063/1.4980168 - Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering
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Informações sobre o DOI: 10.1063/1.4980168 (Fonte: oaDOI API)
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