Experimental study of preoxidation cleaning effects on the oxide growth rate (1992)
Source: Anais. Conference titles: Congresso da Sociedade Brasileira de Microeletronica. Unidade: EP
Assunto: SEMICONDUTORES
ABNT
CHEN, H e ZASNICOFF, Luiz Sergio. Experimental study of preoxidation cleaning effects on the oxide growth rate. 1992, Anais.. São Paulo: Sbmicro/Epusp, 1992. . Acesso em: 03 out. 2024.APA
Chen, H., & Zasnicoff, L. S. (1992). Experimental study of preoxidation cleaning effects on the oxide growth rate. In Anais. São Paulo: Sbmicro/Epusp.NLM
Chen H, Zasnicoff LS. Experimental study of preoxidation cleaning effects on the oxide growth rate. Anais. 1992 ;[citado 2024 out. 03 ]Vancouver
Chen H, Zasnicoff LS. Experimental study of preoxidation cleaning effects on the oxide growth rate. Anais. 1992 ;[citado 2024 out. 03 ]