Filtros : "FILMES FINOS" "FANTINI, MARCIA CARVALHO DE ABREU" "ARTIGO DE PERIODICO" Removido: "WATANABE, II SEI" Limpar

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  • Conference titles: Activity Report 2008: LNLS/Brazilian Synchrotron Light Laboratory. Unidade: IF

    Subjects: MATERIAIS, FILMES FINOS

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      MACHADO, A C et al. Au-Pd bilayered films deposited on Si(100) By DC magnetron sputtering. 2009Tradução . . Disponível em: http://www.lnls.br/ar2008/web/index.html. Acesso em: 19 ago. 2024.
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      Machado, A. C., Silva, P. J. M., Gobbi, A. L., Fantini, M. C. de A., Gheno, S. M., Paulin Filho, P. I., & Nascente, P. A. P. (2009). Au-Pd bilayered films deposited on Si(100) By DC magnetron sputtering. Recuperado de http://www.lnls.br/ar2008/web/index.html
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      Machado AC, Silva PJM, Gobbi AL, Fantini MC de A, Gheno SM, Paulin Filho PI, Nascente PAP. Au-Pd bilayered films deposited on Si(100) By DC magnetron sputtering [Internet]. 2009 ;[citado 2024 ago. 19 ] Available from: http://www.lnls.br/ar2008/web/index.html
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      Machado AC, Silva PJM, Gobbi AL, Fantini MC de A, Gheno SM, Paulin Filho PI, Nascente PAP. Au-Pd bilayered films deposited on Si(100) By DC magnetron sputtering [Internet]. 2009 ;[citado 2024 ago. 19 ] Available from: http://www.lnls.br/ar2008/web/index.html
  • Source: Journal of Applied Physics. Unidade: IF

    Subjects: FILMES FINOS, ESPECTROSCOPIA DE RAIO X

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      MARTINS, A et al. X-ray absorption spectroscopy study of FePt thin films. Journal of Applied Physics, v. 100, n. 1, p. 013905-1/013905-6, 2006Tradução . . Disponível em: https://doi.org/10.1063/1.2208745. Acesso em: 19 ago. 2024.
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      Martins, A., Souza Neto, N. M., Santos, A. D., Prado, R. J., Ramos, A. Y., & Fantini, M. C. de A. (2006). X-ray absorption spectroscopy study of FePt thin films. Journal of Applied Physics, 100( 1), 013905-1/013905-6. doi:10.1063/1.2208745
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      Martins A, Souza Neto NM, Santos AD, Prado RJ, Ramos AY, Fantini MC de A. X-ray absorption spectroscopy study of FePt thin films [Internet]. Journal of Applied Physics. 2006 ; 100( 1): 013905-1/013905-6.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1063/1.2208745
    • Vancouver

      Martins A, Souza Neto NM, Santos AD, Prado RJ, Ramos AY, Fantini MC de A. X-ray absorption spectroscopy study of FePt thin films [Internet]. Journal of Applied Physics. 2006 ; 100( 1): 013905-1/013905-6.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1063/1.2208745
  • Source: Journal of non-crystalline solids. Unidades: IF, EP

    Subjects: DIFRAÇÃO POR RAIOS X, ESTRUTURA DOS SÓLIDOS, FILMES FINOS

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      CRIADO, Denise et al. Study of the mechanical and structural properties of silicon oxynitride films for optical applications. Journal of non-crystalline solids, v. 352, n. 23-25, p. 2319-2323, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.jnoncrysol.2006.03.012. Acesso em: 19 ago. 2024.
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      Criado, D., Alayo Chávez, M. I., Fantini, M. C. de A., & Pereyra, I. (2006). Study of the mechanical and structural properties of silicon oxynitride films for optical applications. Journal of non-crystalline solids, 352( 23-25), 2319-2323. doi:10.1016/j.jnoncrysol.2006.03.012
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      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Study of the mechanical and structural properties of silicon oxynitride films for optical applications [Internet]. Journal of non-crystalline solids. 2006 ; 352( 23-25): 2319-2323.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.jnoncrysol.2006.03.012
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      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Study of the mechanical and structural properties of silicon oxynitride films for optical applications [Internet]. Journal of non-crystalline solids. 2006 ; 352( 23-25): 2319-2323.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.jnoncrysol.2006.03.012
  • Source: Journal of Non-Crystalline Solids. Unidades: IF, EP

    Subjects: FILMES FINOS, ESPECTROSCOPIA DE RAIO X

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      CRIADO, Denise et al. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films. Journal of Non-Crystalline Solids, v. 352, n. 9-20, p. 1298-1302, 2006Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e. Acesso em: 19 ago. 2024.
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      Criado, D., Alayo Chávez, M. I., Fantini, M. C. de A., & Pereyra, I. (2006). Local bonding in PECVD-"SiO IND.X" "N IND.Y" films. Journal of Non-Crystalline Solids, 352( 9-20), 1298-1302. Recuperado de http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
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      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films [Internet]. Journal of Non-Crystalline Solids. 2006 ; 352( 9-20): 1298-1302.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
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      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films [Internet]. Journal of Non-Crystalline Solids. 2006 ; 352( 9-20): 1298-1302.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
  • Source: Journal of the Brazilian Chemical Society. Unidades: IF, EP

    Subjects: FÍSICO-QUÍMICA, CRISTALOGRAFIA FÍSICA, ESPECTROSCOPIA RAMAN, DIFRAÇÃO POR RAIOS X, ESPECTROSCOPIA INFRAVERMELHA, FILMES FINOS

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      FORHAN, Neisy Amparo Escobar e FANTINI, Marcia e PEREYRA, Inés. Characterization of Si1-xCx:H thin films deposited by PECVD for SiCOI heterojuntion fabrication. Journal of the Brazilian Chemical Society, v. 17, n. 6, p. 1158-1162, 2006Tradução . . Disponível em: https://doi.org/10.1590/S0103-50532006000600013. Acesso em: 19 ago. 2024.
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      Forhan, N. A. E., Fantini, M., & Pereyra, I. (2006). Characterization of Si1-xCx:H thin films deposited by PECVD for SiCOI heterojuntion fabrication. Journal of the Brazilian Chemical Society, 17( 6), 1158-1162. doi:10.1590/S0103-50532006000600013
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      Forhan NAE, Fantini M, Pereyra I. Characterization of Si1-xCx:H thin films deposited by PECVD for SiCOI heterojuntion fabrication [Internet]. Journal of the Brazilian Chemical Society. 2006 ; 17( 6): 1158-1162.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/S0103-50532006000600013
    • Vancouver

      Forhan NAE, Fantini M, Pereyra I. Characterization of Si1-xCx:H thin films deposited by PECVD for SiCOI heterojuntion fabrication [Internet]. Journal of the Brazilian Chemical Society. 2006 ; 17( 6): 1158-1162.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/S0103-50532006000600013
  • Source: Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing. Unidade: IF

    Subjects: FILMES FINOS, ESTRUTURA DOS MATERIAIS

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      NASCENTE, P A P et al. Structure, morphology and composition of nanometric Pd films deposited by dc magnetron sputtering on Cu, Ag and Au foils. Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing, v. 432, n. 1-2, p. 303-307, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.msea.2006.06.045. Acesso em: 19 ago. 2024.
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      Nascente, P. A. P., Maluf, S. S., Pinheiro, L. M. P., Gobbi, A. L., Paulino Filho, P. I., Fantini, M. C. de A., & Alcantra, N. G. (2006). Structure, morphology and composition of nanometric Pd films deposited by dc magnetron sputtering on Cu, Ag and Au foils. Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing, 432( 1-2), 303-307. doi:10.1016/j.msea.2006.06.045
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      Nascente PAP, Maluf SS, Pinheiro LMP, Gobbi AL, Paulino Filho PI, Fantini MC de A, Alcantra NG. Structure, morphology and composition of nanometric Pd films deposited by dc magnetron sputtering on Cu, Ag and Au foils [Internet]. Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing. 2006 ; 432( 1-2): 303-307.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.msea.2006.06.045
    • Vancouver

      Nascente PAP, Maluf SS, Pinheiro LMP, Gobbi AL, Paulino Filho PI, Fantini MC de A, Alcantra NG. Structure, morphology and composition of nanometric Pd films deposited by dc magnetron sputtering on Cu, Ag and Au foils [Internet]. Materials Science and Engineering A - Structural Materials Properties Microstructure and Processing. 2006 ; 432( 1-2): 303-307.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.msea.2006.06.045
  • Source: Journal of Magnetism and Magnetic Materials. Unidade: IF

    Subjects: FILMES FINOS, MATERIAIS MAGNÉTICOS, MAGNETISMO

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      MARTINS, A et al. Alternate monatomic layer sputter deposition of FCT ("L1 IND.0-type") ordered FePt and CoPt films. Journal of Magnetism and Magnetic Materials, v. 305, n. 1, p. 152-156, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.jmmm.2005.12.005. Acesso em: 19 ago. 2024.
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      Martins, A., Souza Neto, N. M., Santos, A. D., Ramos, A. Y., & Fantini, M. C. de A. (2006). Alternate monatomic layer sputter deposition of FCT ("L1 IND.0-type") ordered FePt and CoPt films. Journal of Magnetism and Magnetic Materials, 305( 1), 152-156. doi:10.1016/j.jmmm.2005.12.005
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      Martins A, Souza Neto NM, Santos AD, Ramos AY, Fantini MC de A. Alternate monatomic layer sputter deposition of FCT ("L1 IND.0-type") ordered FePt and CoPt films [Internet]. Journal of Magnetism and Magnetic Materials. 2006 ; 305( 1): 152-156.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.jmmm.2005.12.005
    • Vancouver

      Martins A, Souza Neto NM, Santos AD, Ramos AY, Fantini MC de A. Alternate monatomic layer sputter deposition of FCT ("L1 IND.0-type") ordered FePt and CoPt films [Internet]. Journal of Magnetism and Magnetic Materials. 2006 ; 305( 1): 152-156.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.jmmm.2005.12.005
  • Source: Thin Solid Films. Unidade: IF

    Subjects: FILMES FINOS, LÍTIO, BATERIAS ELÉTRICAS

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      FONSECA, C. Polo e FANTINI, Marcia e NEVES, S. Improving the electrochemical properties of porous LiCoO2 films obtained by template synthesis. Thin Solid Films, v. 488, n. 1-2, p. 68-73, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2005.04.057. Acesso em: 19 ago. 2024.
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      Fonseca, C. P., Fantini, M., & Neves, S. (2005). Improving the electrochemical properties of porous LiCoO2 films obtained by template synthesis. Thin Solid Films, 488( 1-2), 68-73. doi:10.1016/j.tsf.2005.04.057
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      Fonseca CP, Fantini M, Neves S. Improving the electrochemical properties of porous LiCoO2 films obtained by template synthesis [Internet]. Thin Solid Films. 2005 ; 488( 1-2): 68-73.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.tsf.2005.04.057
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      Fonseca CP, Fantini M, Neves S. Improving the electrochemical properties of porous LiCoO2 films obtained by template synthesis [Internet]. Thin Solid Films. 2005 ; 488( 1-2): 68-73.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.tsf.2005.04.057
  • Source: Chemistry of Materials. Unidades: IQ, IF

    Subjects: FILMES FINOS, ELETROQUÍMICA, MOLIBDÊNIO

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      PEREIRA, Audrei Conti et al. Characterization of electrochemically co-deposited metal-molybdenum oxide films. Chemistry of Materials, v. 16, n. 13, p. 2662-2668, 2004Tradução . . Acesso em: 19 ago. 2024.
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      Pereira, A. C., Ferreira, T. L., Kosminsky, L., Matos, R. C., Bertotti, M., Tabacniks, M. H., et al. (2004). Characterization of electrochemically co-deposited metal-molybdenum oxide films. Chemistry of Materials, 16( 13), 2662-2668.
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      Pereira AC, Ferreira TL, Kosminsky L, Matos RC, Bertotti M, Tabacniks MH, Kiyohara PK, Fantini MC de A. Characterization of electrochemically co-deposited metal-molybdenum oxide films. Chemistry of Materials. 2004 ; 16( 13): 2662-2668.[citado 2024 ago. 19 ]
    • Vancouver

      Pereira AC, Ferreira TL, Kosminsky L, Matos RC, Bertotti M, Tabacniks MH, Kiyohara PK, Fantini MC de A. Characterization of electrochemically co-deposited metal-molybdenum oxide films. Chemistry of Materials. 2004 ; 16( 13): 2662-2668.[citado 2024 ago. 19 ]
  • Source: Solid State Ionics. Unidade: IF

    Subjects: FILMES FINOS, DISPOSITIVOS ÓPTICOS, DISPOSITIVOS ELETRÔNICOS, DIFRAÇÃO POR RAIOS X

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      FERREIRA, F F e FANTINI, Márcia Carvalho de Abreu. Multilayered composite "Au-NiO IND.x" electrochromic films. Solid State Ionics, v. 175, n. 1-4, p. 517-520, 2004Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TY4-4DN15GN-D-1&_cdi=5608&_user=972067&_orig=browse&_coverDate=11%2F30%2F2004&_sk=998249998&view=c&wchp=dGLbVlb-zSkWz&md5=2e2229962a776fce1ec913802c7d1753&ie=/sdarticle.pdf. Acesso em: 19 ago. 2024.
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      Ferreira, F. F., & Fantini, M. C. de A. (2004). Multilayered composite "Au-NiO IND.x" electrochromic films. Solid State Ionics, 175( 1-4), 517-520. Recuperado de http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TY4-4DN15GN-D-1&_cdi=5608&_user=972067&_orig=browse&_coverDate=11%2F30%2F2004&_sk=998249998&view=c&wchp=dGLbVlb-zSkWz&md5=2e2229962a776fce1ec913802c7d1753&ie=/sdarticle.pdf
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      Ferreira FF, Fantini MC de A. Multilayered composite "Au-NiO IND.x" electrochromic films [Internet]. Solid State Ionics. 2004 ; 175( 1-4): 517-520.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TY4-4DN15GN-D-1&_cdi=5608&_user=972067&_orig=browse&_coverDate=11%2F30%2F2004&_sk=998249998&view=c&wchp=dGLbVlb-zSkWz&md5=2e2229962a776fce1ec913802c7d1753&ie=/sdarticle.pdf
    • Vancouver

      Ferreira FF, Fantini MC de A. Multilayered composite "Au-NiO IND.x" electrochromic films [Internet]. Solid State Ionics. 2004 ; 175( 1-4): 517-520.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TY4-4DN15GN-D-1&_cdi=5608&_user=972067&_orig=browse&_coverDate=11%2F30%2F2004&_sk=998249998&view=c&wchp=dGLbVlb-zSkWz&md5=2e2229962a776fce1ec913802c7d1753&ie=/sdarticle.pdf
  • Source: Materials Science and Engineering B. Unidades: IF, EP

    Subjects: MATERIAIS, MATÉRIA CONDENSADA, FILMES FINOS, FÍSICA DE PLASMAS

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      CRIADO, Denise et al. Structural analysis of silicon oxynitride films deposited by PECVD. Materials Science and Engineering B, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.mseb.2004.05.017. Acesso em: 19 ago. 2024.
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      Criado, D., Alayo Chávez, M. I., Pereyra, I., & Fantini, M. C. de A. (2004). Structural analysis of silicon oxynitride films deposited by PECVD. Materials Science and Engineering B. doi:10.1016/j.mseb.2004.05.017
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      Criado D, Alayo Chávez MI, Pereyra I, Fantini MC de A. Structural analysis of silicon oxynitride films deposited by PECVD [Internet]. Materials Science and Engineering B. 2004 ;[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.mseb.2004.05.017
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      Criado D, Alayo Chávez MI, Pereyra I, Fantini MC de A. Structural analysis of silicon oxynitride films deposited by PECVD [Internet]. Materials Science and Engineering B. 2004 ;[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/j.mseb.2004.05.017
  • Source: Journal of Non-Crystalline Solids. Unidades: IF, EP

    Subjects: FILMES FINOS, NANOTECNOLOGIA, ESTRUTURA DOS MATERIAIS

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      ESCOBAR FORHAN, Neisy Amparo e FANTINI, Márcia Carvalho de Abreu e PEREYRA, Inés. Nano-crystalline "Si IND.1-x" "C IND.x" :H thin films deposited by PECVD for SiC-on-insulator application. Journal of Non-Crystalline Solids, v. 338-340, 2004Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TXM-4CCFCKJ-1-8&_cdi=5594&_user=972067&_orig=browse&_coverDate=06%2F15%2F2004&_sk=996619999&view=c&wchp=dGLbVlz-zSkWz&md5=768c7876eb02ac94f3aa329920376045&ie=/sdarticle.pdf. Acesso em: 19 ago. 2024.
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      Escobar Forhan, N. A., Fantini, M. C. de A., & Pereyra, I. (2004). Nano-crystalline "Si IND.1-x" "C IND.x" :H thin films deposited by PECVD for SiC-on-insulator application. Journal of Non-Crystalline Solids, 338-340. Recuperado de http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TXM-4CCFCKJ-1-8&_cdi=5594&_user=972067&_orig=browse&_coverDate=06%2F15%2F2004&_sk=996619999&view=c&wchp=dGLbVlz-zSkWz&md5=768c7876eb02ac94f3aa329920376045&ie=/sdarticle.pdf
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      Escobar Forhan NA, Fantini MC de A, Pereyra I. Nano-crystalline "Si IND.1-x" "C IND.x" :H thin films deposited by PECVD for SiC-on-insulator application [Internet]. Journal of Non-Crystalline Solids. 2004 ; 338-340[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TXM-4CCFCKJ-1-8&_cdi=5594&_user=972067&_orig=browse&_coverDate=06%2F15%2F2004&_sk=996619999&view=c&wchp=dGLbVlz-zSkWz&md5=768c7876eb02ac94f3aa329920376045&ie=/sdarticle.pdf
    • Vancouver

      Escobar Forhan NA, Fantini MC de A, Pereyra I. Nano-crystalline "Si IND.1-x" "C IND.x" :H thin films deposited by PECVD for SiC-on-insulator application [Internet]. Journal of Non-Crystalline Solids. 2004 ; 338-340[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TXM-4CCFCKJ-1-8&_cdi=5594&_user=972067&_orig=browse&_coverDate=06%2F15%2F2004&_sk=996619999&view=c&wchp=dGLbVlz-zSkWz&md5=768c7876eb02ac94f3aa329920376045&ie=/sdarticle.pdf
  • Source: Physica Status Solidi A. Unidade: IF

    Assunto: FILMES FINOS

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      MARTINS, A e FANTINI, Márcia Carvalho de Abreu e SANTOS, A. D. Growth of 'L1 Ind. 0' ordered FePt alloy films at reduced temperatures. Physica Status Solidi A, 2004Tradução . . Disponível em: http://www3.interscience.wiley.com/cgi-bin/fulltext/107641579/PDFSTART. Acesso em: 19 ago. 2024.
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      Martins, A., Fantini, M. C. de A., & Santos, A. D. (2004). Growth of 'L1 Ind. 0' ordered FePt alloy films at reduced temperatures. Physica Status Solidi A. Recuperado de http://www3.interscience.wiley.com/cgi-bin/fulltext/107641579/PDFSTART
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      Martins A, Fantini MC de A, Santos AD. Growth of 'L1 Ind. 0' ordered FePt alloy films at reduced temperatures [Internet]. Physica Status Solidi A. 2004 ;[citado 2024 ago. 19 ] Available from: http://www3.interscience.wiley.com/cgi-bin/fulltext/107641579/PDFSTART
    • Vancouver

      Martins A, Fantini MC de A, Santos AD. Growth of 'L1 Ind. 0' ordered FePt alloy films at reduced temperatures [Internet]. Physica Status Solidi A. 2004 ;[citado 2024 ago. 19 ] Available from: http://www3.interscience.wiley.com/cgi-bin/fulltext/107641579/PDFSTART
  • Source: Journal of Physics D. Unidade: IF

    Subjects: FILMES FINOS, ENERGIA SOLAR

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      FERREIRA, Fábio Furlan e FANTINI, Márcia Carvalho de Abreu. Theoretical optical properties of composite metal-NiO films. Journal of Physics D, 2003Tradução . . Disponível em: https://doi.org/10.1088/0022-3727/36/19/012. Acesso em: 19 ago. 2024.
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      Ferreira, F. F., & Fantini, M. C. de A. (2003). Theoretical optical properties of composite metal-NiO films. Journal of Physics D. doi:10.1088/0022-3727/36/19/012
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      Ferreira FF, Fantini MC de A. Theoretical optical properties of composite metal-NiO films [Internet]. Journal of Physics D. 2003 ;[citado 2024 ago. 19 ] Available from: https://doi.org/10.1088/0022-3727/36/19/012
    • Vancouver

      Ferreira FF, Fantini MC de A. Theoretical optical properties of composite metal-NiO films [Internet]. Journal of Physics D. 2003 ;[citado 2024 ago. 19 ] Available from: https://doi.org/10.1088/0022-3727/36/19/012
  • Source: Brazilian Journal of Physics. Unidade: IF

    Assunto: FILMES FINOS

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      MATTA, J A S da et al. Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, v. 33, n. 1, p. 123-127, 2003Tradução . . Disponível em: https://doi.org/10.1590/s0103-97332003000100011. Acesso em: 19 ago. 2024.
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      Matta, J. A. S. da, Galvao, R. M. O., Ruchko, L., Fantini, M. C. de A., & Kiyohara, P. K. (2003). Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, 33( 1), 123-127. doi:10.1590/s0103-97332003000100011
    • NLM

      Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
    • Vancouver

      Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
  • Source: Brazilian Journal of Physics. Unidade: IF

    Subjects: RESSONÂNCIA MAGNÉTICA NUCLEAR, ACELERAÇÃO DE PARTÍCULAS, FÍSICA DE PLASMAS, FILMES FINOS

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      MATTA, J A S da et al. Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, v. 33, n. 1, p. 123-127, 2003Tradução . . Disponível em: https://doi.org/10.1590/s0103-97332003000100011. Acesso em: 19 ago. 2024.
    • APA

      Matta, J. A. S. da, Galvao, R. M. O., Ruchko, L., Fantini, M. C. de A., & Kiyohara, P. K. (2003). Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, 33( 1), 123-127. doi:10.1590/s0103-97332003000100011
    • NLM

      Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
    • Vancouver

      Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
  • Source: Journal of Magnetism and Magnetic Materials. Unidade: IF

    Subjects: FILMES FINOS, MATÉRIA CONDENSADA

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      MARTINS, A e FANTINI, Márcia Carvalho de Abreu e SANTOS, Antonio Domingues dos. The influence of the deposition temperature and substrate on the properties of FePt thin films. Journal of Magnetism and Magnetic Materials, v. 265, n. 1, p. 13-22, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0304-8853(03)00103-3. Acesso em: 19 ago. 2024.
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      Martins, A., Fantini, M. C. de A., & Santos, A. D. dos. (2003). The influence of the deposition temperature and substrate on the properties of FePt thin films. Journal of Magnetism and Magnetic Materials, 265( 1), 13-22. doi:10.1016/s0304-8853(03)00103-3
    • NLM

      Martins A, Fantini MC de A, Santos AD dos. The influence of the deposition temperature and substrate on the properties of FePt thin films [Internet]. Journal of Magnetism and Magnetic Materials. 2003 ; 265( 1): 13-22.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/s0304-8853(03)00103-3
    • Vancouver

      Martins A, Fantini MC de A, Santos AD dos. The influence of the deposition temperature and substrate on the properties of FePt thin films [Internet]. Journal of Magnetism and Magnetic Materials. 2003 ; 265( 1): 13-22.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/s0304-8853(03)00103-3
  • Source: Thin Solids Films. Unidades: IF, EP

    Subjects: FILMES FINOS, FOTOLUMINESCÊNCIA

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      SCOPEL, Wanderla Luis et al. Structural investigation of Si-rich amorphous silicon oxynitride films. Thin Solids Films, v. 425, n. 1-2, p. 275-281, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)01053-2. Acesso em: 19 ago. 2024.
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      Scopel, W. L., Fantini, M. C. de A., Alayo Chávez, M. I., & Pereyra, I. (2003). Structural investigation of Si-rich amorphous silicon oxynitride films. Thin Solids Films, 425( 1-2), 275-281. doi:10.1016/s0040-6090(02)01053-2
    • NLM

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Structural investigation of Si-rich amorphous silicon oxynitride films [Internet]. Thin Solids Films. 2003 ; 425( 1-2): 275-281.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/s0040-6090(02)01053-2
    • Vancouver

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Structural investigation of Si-rich amorphous silicon oxynitride films [Internet]. Thin Solids Films. 2003 ; 425( 1-2): 275-281.[citado 2024 ago. 19 ] Available from: https://doi.org/10.1016/s0040-6090(02)01053-2
  • Source: Solid States Ionics. Unidade: IF

    Subjects: FILMES FINOS, DIFRAÇÃO POR RAIOS X

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      FERREIRA, Fábio Furlan et al. Composite Au-NiO films. Solid States Ionics, 2003Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5608&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=b5c97a23fe0f4f3fceef5ff92984a0a4. Acesso em: 19 ago. 2024.
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      Ferreira, F. F., Haddad, P. S., Fantini, M. C. de A., & Brito, G. E. de S. (2003). Composite Au-NiO films. Solid States Ionics. Recuperado de http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5608&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=b5c97a23fe0f4f3fceef5ff92984a0a4
    • NLM

      Ferreira FF, Haddad PS, Fantini MC de A, Brito GE de S. Composite Au-NiO films [Internet]. Solid States Ionics. 2003 ;[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5608&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=b5c97a23fe0f4f3fceef5ff92984a0a4
    • Vancouver

      Ferreira FF, Haddad PS, Fantini MC de A, Brito GE de S. Composite Au-NiO films [Internet]. Solid States Ionics. 2003 ;[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5608&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=b5c97a23fe0f4f3fceef5ff92984a0a4
  • Source: Journal of Non-Crystalline Solids. Unidades: IF, EP

    Assunto: FILMES FINOS

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      PRADO, J. R et al. Annealing effects of highly homogeneous a-'Si IND. 1-x''C IND. x': H. Journal of Non-Crystalline Solids, v. 330, n. 1-3, p. 196-215, 2003Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5594&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=0f8f94222ce407d33f3e1442abef58bd/. Acesso em: 19 ago. 2024.
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      Prado, J. R., D'Addio, T. F., Fantini, M. C. de A., Pereyra, I., & Flank, A. M. (2003). Annealing effects of highly homogeneous a-'Si IND. 1-x''C IND. x': H. Journal of Non-Crystalline Solids, 330( 1-3), 196-215. Recuperado de http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5594&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=0f8f94222ce407d33f3e1442abef58bd/
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      Prado JR, D'Addio TF, Fantini MC de A, Pereyra I, Flank AM. Annealing effects of highly homogeneous a-'Si IND. 1-x''C IND. x': H [Internet]. Journal of Non-Crystalline Solids. 2003 ; 330( 1-3): 196-215.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5594&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=0f8f94222ce407d33f3e1442abef58bd/
    • Vancouver

      Prado JR, D'Addio TF, Fantini MC de A, Pereyra I, Flank AM. Annealing effects of highly homogeneous a-'Si IND. 1-x''C IND. x': H [Internet]. Journal of Non-Crystalline Solids. 2003 ; 330( 1-3): 196-215.[citado 2024 ago. 19 ] Available from: http://www.sciencedirect.com/science?_ob=JournalURL&_cdi=5594&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=0f8f94222ce407d33f3e1442abef58bd/

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