Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film (2023)
- Authors:
- Autor USP: CRAIEVICH, ALDO FELIX - IF
- Unidade: IF
- DOI: 10.1107/S1600576722010974
- Assunto: FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: John Wiley
- Publisher place: Chester
- Date published: 2023
- Source:
- Título: Journal of Applied Crystallography
- Volume/Número/Paginação/Ano: v. 56, p. 95-102, 2023
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
COSTA, Daniel da Silva e KELLERMANN, Guinther e CRAIEVICH, Aldo Felix. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film. Journal of Applied Crystallography, v. 56, p. 95-102, 2023Tradução . . Disponível em: https://doi.org/10.1107/S1600576722010974. Acesso em: 08 fev. 2026. -
APA
Costa, D. da S., Kellermann, G., & Craievich, A. F. (2023). Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film. Journal of Applied Crystallography, 56, 95-102. doi:10.1107/S1600576722010974 -
NLM
Costa D da S, Kellermann G, Craievich AF. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film [Internet]. Journal of Applied Crystallography. 2023 ; 56 95-102.[citado 2026 fev. 08 ] Available from: https://doi.org/10.1107/S1600576722010974 -
Vancouver
Costa D da S, Kellermann G, Craievich AF. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film [Internet]. Journal of Applied Crystallography. 2023 ; 56 95-102.[citado 2026 fev. 08 ] Available from: https://doi.org/10.1107/S1600576722010974 - Investigaciones de nanomateriales meidante XRD, XAFS y SAXS con luz de síncrotron
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Informações sobre o DOI: 10.1107/S1600576722010974 (Fonte: oaDOI API)
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