In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film (2021)
- Authors:
- Autor USP: CRAIEVICH, ALDO FELIX - IF
- Unidade: IF
- DOI: 10.1016/j.jallcom.2021.160345
- Assunto: NANOPARTÍCULAS
- Agências de fomento:
- Language: Inglês
- Imprenta:
- Source:
- Volume/Número/Paginação/Ano: v. 879, 160345, 2021
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
COSTA, Daniel da Silva et al. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film. v. 879, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.jallcom.2021.160345. Acesso em: 08 fev. 2026. -
APA
Costa, D. da S., Kellermann, G., Craievich, A. F., Giovanetti, L. J., Huck-Iriart, C., & Requejo, F. G. (2021). In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film, 879. doi:10.1016/j.jallcom.2021.160345 -
NLM
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2026 fev. 08 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345 -
Vancouver
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2026 fev. 08 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345 - Investigaciones de nanomateriales meidante XRD, XAFS y SAXS con luz de síncrotron
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Informações sobre o DOI: 10.1016/j.jallcom.2021.160345 (Fonte: oaDOI API)
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