Insulator / polysilicon interface: technological electrical and modelling aspects. Application to thin film transistors (1995)
- Authors:
- USP affiliated author: MORIMOTO, NILTON ITIRO - EP
- School: EP
- Subject: CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Publisher: Instituto de Informatica da Ufrgs
- Place of publication: Porto Alegre
- Date published: 1995
- Source:
- Título do periódico: Proceedings
- Conference title: Congress of the Brazilian Microelectronics Society
-
ABNT
SALAUN, A C et al. Insulator / polysilicon interface: technological electrical and modelling aspects. Application to thin film transistors. 1995, Anais.. Porto Alegre: Instituto de Informatica da Ufrgs, 1995. . Acesso em: 11 ago. 2022. -
APA
Salaun, A. C., Fortin, B., Bonnaud, O., Morimoto, N. I., Kis-Sion, K., Lhermite, H., & Le Bihan, F. (1995). Insulator / polysilicon interface: technological electrical and modelling aspects. Application to thin film transistors. In Proceedings. Porto Alegre: Instituto de Informatica da Ufrgs. -
NLM
Salaun AC, Fortin B, Bonnaud O, Morimoto NI, Kis-Sion K, Lhermite H, Le Bihan F. Insulator / polysilicon interface: technological electrical and modelling aspects. Application to thin film transistors. Proceedings. 1995 ;[citado 2022 ago. 11 ] -
Vancouver
Salaun AC, Fortin B, Bonnaud O, Morimoto NI, Kis-Sion K, Lhermite H, Le Bihan F. Insulator / polysilicon interface: technological electrical and modelling aspects. Application to thin film transistors. Proceedings. 1995 ;[citado 2022 ago. 11 ] - Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication
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