ReP USP - Resultado da busca

Artigo de periodico
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1–xAs nTFETs (2017)
Bordallo, Caio Cesar Mendes ; Collaert, Nadine ; Claeys, Cor ; Simoen, Eddy ; Vandooren, A; Rooyackers, Rita; Mols, Yannick; Alian, A; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: IEEE Transactions on Electron Devices. Unidade: EP
Subjects: MICROELETRÔNICA, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
BORDALLO, Caio Cesar Mendes et al. The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1–xAs nTFETs. IEEE Transactions on Electron Devices, v. 64, n. 9, p. 3595-3600, 2017Tradução . . Disponível em: https://doi.org/10.1109/ted.2017.2721110. Acesso em: 17 nov. 2025.
APA
Bordallo, C. C. M., Collaert, N., Claeys, C., Simoen, E., Vandooren, A., Rooyackers, R., et al. (2017). The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1–xAs nTFETs. IEEE Transactions on Electron Devices, 64( 9), 3595-3600. doi:10.1109/ted.2017.2721110
NLM
Bordallo CCM, Collaert N, Claeys C, Simoen E, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1–xAs nTFETs [Internet]. IEEE Transactions on Electron Devices. 2017 ; 64( 9): 3595-3600.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2017.2721110
Vancouver
Bordallo CCM, Collaert N, Claeys C, Simoen E, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1–xAs nTFETs [Internet]. IEEE Transactions on Electron Devices. 2017 ; 64( 9): 3595-3600.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2017.2721110
Artigo de periodico
Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source (2016)
Neves, Felipe S; Agopian, Paula Ghedini Der ; Cretu, B; Rooyackers, Rita; Vandooren, A; Simoen, Eddy ; Thean, Aaron; Martino, João Antonio
Source: IEEE Transactions on Electron Devices. Unidade: EP
Assunto: SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
NEVES, Felipe S et al. Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source. IEEE Transactions on Electron Devices, v. 63, n. 4, p. 1658-1665, 2016Tradução . . Disponível em: https://doi.org/10.1109/ted.2016.2533360. Acesso em: 17 nov. 2025.
APA
Neves, F. S., Agopian, P. G. D., Cretu, B., Rooyackers, R., Vandooren, A., Simoen, E., et al. (2016). Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source. IEEE Transactions on Electron Devices, 63( 4), 1658-1665. doi:10.1109/ted.2016.2533360
NLM
Neves FS, Agopian PGD, Cretu B, Rooyackers R, Vandooren A, Simoen E, Thean A, Martino JA. Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 4): 1658-1665.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2016.2533360
Vancouver
Neves FS, Agopian PGD, Cretu B, Rooyackers R, Vandooren A, Simoen E, Thean A, Martino JA. Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 4): 1658-1665.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2016.2533360
Artigo de periodico
Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective (2016)
Bordallo, Caio Cesar Mendes ; Claeys, Cor ; Thean, Aaron; Simoen, Eddy ; Vandooren, A; Rooyackers, Rita; Agopian, Paula Ghedini Der ; Sivieri, Victor de Bodt; Martino, João Antonio
Source: IEEE Transactions on Electron Devices. Unidade: EP
Subjects: TRANSISTORES, SILÍCIO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
BORDALLO, Caio Cesar Mendes et al. Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective. IEEE Transactions on Electron Devices, v. 63, n. 7, p. 2930-2935, 2016Tradução . . Disponível em: https://doi.org/10.1109/ted.2016.2559580. Acesso em: 17 nov. 2025.
APA
Bordallo, C. C. M., Claeys, C., Thean, A., Simoen, E., Vandooren, A., Rooyackers, R., et al. (2016). Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective. IEEE Transactions on Electron Devices, 63( 7), 2930-2935. doi:10.1109/ted.2016.2559580
NLM
Bordallo CCM, Claeys C, Thean A, Simoen E, Vandooren A, Rooyackers R, Agopian PGD, Sivieri V de B, Martino JA. Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 7): 2930-2935.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2016.2559580
Vancouver
Bordallo CCM, Claeys C, Thean A, Simoen E, Vandooren A, Rooyackers R, Agopian PGD, Sivieri V de B, Martino JA. Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 7): 2930-2935.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2016.2559580
Artigo de periodico
Experimental Comparison Between Trigate p-TFET and p-FinFET Analog Performance as a Function of Temperature (2013)
Agopian, Paula Ghedini Der ; Simoen, Eddy ; Vandooren, A; Rooyackers, Rita; Martino, João Antonio
Source: IEEE Transactions on Electron Devices. Unidade: EP
Subjects: AVALIAÇÃO DE DESEMPENHO, TRANSISTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
AGOPIAN, Paula Ghedini Der et al. Experimental Comparison Between Trigate p-TFET and p-FinFET Analog Performance as a Function of Temperature. IEEE Transactions on Electron Devices, v. 60, n. 8, p. 2493-2497, 2013Tradução . . Disponível em: https://doi.org/10.1109/ted.2013.2267614. Acesso em: 17 nov. 2025.
APA
Agopian, P. G. D., Simoen, E., Vandooren, A., Rooyackers, R., & Martino, J. A. (2013). Experimental Comparison Between Trigate p-TFET and p-FinFET Analog Performance as a Function of Temperature. IEEE Transactions on Electron Devices, 60( 8), 2493-2497. doi:10.1109/ted.2013.2267614
NLM
Agopian PGD, Simoen E, Vandooren A, Rooyackers R, Martino JA. Experimental Comparison Between Trigate p-TFET and p-FinFET Analog Performance as a Function of Temperature [Internet]. IEEE Transactions on Electron Devices. 2013 ; 60( 8): 2493-2497.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2013.2267614
Vancouver
Agopian PGD, Simoen E, Vandooren A, Rooyackers R, Martino JA. Experimental Comparison Between Trigate p-TFET and p-FinFET Analog Performance as a Function of Temperature [Internet]. IEEE Transactions on Electron Devices. 2013 ; 60( 8): 2493-2497.[citado 2025 nov. 17 ] Available from: https://doi.org/10.1109/ted.2013.2267614

USP Schools

ReP

Filtros

Authors