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  • Artigo de periodico

    Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation (2020)

    Andrade, Marco Aurélio Brizzotti ; Ramos, Tiago S.; Adamowski, Júlio Cezar ; Marzo, Asier

    Source: Applied Physics Letters. Unidades: IF, EP

    Subjects: ACÚSTICA, ACÚSTICA, MICROELETRÔNICA, DINÂMICA DOS FLUÍDOS COMPUTACIONAL, MÉTODOS NUMÉRICOS EM DINÂMICA DE FLUÍDOS

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      ANDRADE, Marco Aurélio Brizzotti et al. Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation. Applied Physics Letters, v. 116, n. 5, 2020Tradução . . Disponível em: https://doi.org/10.1063/1.5138598. Acesso em: 17 out. 2024.

    • APA

      Andrade, M. A. B., Ramos, T. S., Adamowski, J. C., & Marzo, A. (2020). Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation. Applied Physics Letters, 116( 5). doi:10.1063/1.5138598

    • NLM

      Andrade MAB, Ramos TS, Adamowski JC, Marzo A. Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation [Internet]. Applied Physics Letters. 2020 ; 116( 5):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.5138598

    • Vancouver

      Andrade MAB, Ramos TS, Adamowski JC, Marzo A. Contactless pick-and-place of millimetric objects using inverted near-field acoustic levitation [Internet]. Applied Physics Letters. 2020 ; 116( 5):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.5138598

  • Artigo de periodico

    Acoustic levitation in mid-air: Recent advances, challenges, and future perspectives (2020)

    Andrade, Marco Aurélio Brizzotti ; Marzo, Asier ; Adamowski, Júlio Cezar

    Source: Applied Physics Letters. Unidades: IF, EP

    Subjects: ACÚSTICA, ACÚSTICA

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    • ABNT

      ANDRADE, Marco Aurélio Brizzotti e MARZO, Asier e ADAMOWSKI, Júlio Cezar. Acoustic levitation in mid-air: Recent advances, challenges, and future perspectives. Applied Physics Letters, v. 116, n. 25, 2020Tradução . . Disponível em: https://doi.org/10.1063/5.0012660. Acesso em: 17 out. 2024.

    • APA

      Andrade, M. A. B., Marzo, A., & Adamowski, J. C. (2020). Acoustic levitation in mid-air: Recent advances, challenges, and future perspectives. Applied Physics Letters, 116( 25). doi:10.1063/5.0012660

    • NLM

      Andrade MAB, Marzo A, Adamowski JC. Acoustic levitation in mid-air: Recent advances, challenges, and future perspectives [Internet]. Applied Physics Letters. 2020 ; 116( 25):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/5.0012660

    • Vancouver

      Andrade MAB, Marzo A, Adamowski JC. Acoustic levitation in mid-air: Recent advances, challenges, and future perspectives [Internet]. Applied Physics Letters. 2020 ; 116( 25):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/5.0012660

  • Artigo de periodico

    Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films (2018)

    Morelhao, Sergio Luiz; Kycia, Stefan; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo

    Source: Applied Physics Letters. Unidade: IF

    Subjects: DIFRAÇÃO POR RAIOS X, SEMICONDUTORES, CRISTALOGRAFIA DE RAIOS X

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      MORELHAO, Sergio Luiz et al. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. Applied Physics Letters, v. 112, n. 12, p. 101903, 2018Tradução . . Disponível em: https://aip.scitation.org/doi/10.1063/1.5020375. Acesso em: 17 out. 2024.

    • APA

      Morelhao, S. L., Kycia, S., Netzke, S., Fornari, C. I., Rappl, P. H. O., & Abramof, E. (2018). Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. Applied Physics Letters, 112( 12), 101903. doi:10.1063/1.5020375

    • NLM

      Morelhao SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. Applied Physics Letters. 2018 ; 112( 12): 101903.[citado 2024 out. 17 ] Available from: https://aip.scitation.org/doi/10.1063/1.5020375

    • Vancouver

      Morelhao SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. Applied Physics Letters. 2018 ; 112( 12): 101903.[citado 2024 out. 17 ] Available from: https://aip.scitation.org/doi/10.1063/1.5020375

  • Artigo de periodico

    Particle manipulation by a non-resonant acoustic levitator (2015)

    Andrade, Marco Aurélio Brizzotti ; Perez, Nicolas; Adamowski, Júlio Cezar

    Source: Applied Physics Letters. Unidades: IF, EP

    Assunto: SENSOR

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      ANDRADE, Marco Aurélio Brizzotti e PEREZ, Nicolas e ADAMOWSKI, Júlio Cezar. Particle manipulation by a non-resonant acoustic levitator. Applied Physics Letters, v. 106, n. 1, p. 014101, 2015Tradução . . Disponível em: https://doi.org/10.1063/1.4905130. Acesso em: 17 out. 2024.

    • APA

      Andrade, M. A. B., Perez, N., & Adamowski, J. C. (2015). Particle manipulation by a non-resonant acoustic levitator. Applied Physics Letters, 106( 1), 014101. doi:10.1063/1.4905130

    • NLM

      Andrade MAB, Perez N, Adamowski JC. Particle manipulation by a non-resonant acoustic levitator [Internet]. Applied Physics Letters. 2015 ; 106( 1): 014101.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.4905130

    • Vancouver

      Andrade MAB, Perez N, Adamowski JC. Particle manipulation by a non-resonant acoustic levitator [Internet]. Applied Physics Letters. 2015 ; 106( 1): 014101.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.4905130

  • Artigo de periodico

    Low cost ion implantation technique (2012)

    Salvadori, M C ; Teixeira, F S ; Sgubin, L G ; Araújo, W W R ; Spirin, R E; Oks, E M; Yu, K M; Brown, I G

    Source: Applied Physics Letters. Unidade: IF

    Assunto: FILMES FINOS

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      SALVADORI, M C et al. Low cost ion implantation technique. Applied Physics Letters, v. 101, n. 22, p. 224104/1-224104/4, 2012Tradução . . Disponível em: https://doi.org/10.1063/1.4768699. Acesso em: 17 out. 2024.

    • APA

      Salvadori, M. C., Teixeira, F. S., Sgubin, L. G., Araújo, W. W. R., Spirin, R. E., Oks, E. M., et al. (2012). Low cost ion implantation technique. Applied Physics Letters, 101( 22), 224104/1-224104/4. doi:10.1063/1.4768699

    • NLM

      Salvadori MC, Teixeira FS, Sgubin LG, Araújo WWR, Spirin RE, Oks EM, Yu KM, Brown IG. Low cost ion implantation technique [Internet]. Applied Physics Letters. 2012 ;101( 22): 224104/1-224104/4.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.4768699

    • Vancouver

      Salvadori MC, Teixeira FS, Sgubin LG, Araújo WWR, Spirin RE, Oks EM, Yu KM, Brown IG. Low cost ion implantation technique [Internet]. Applied Physics Letters. 2012 ;101( 22): 224104/1-224104/4.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.4768699

  • Artigo de periodico

    Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal (2012)

    Kellermann, Guinther; Montoro, Luciano A; Giovanetti, Lisandro J; Claro, Paula C dos Santos; Zhang, Liang; Ramirez, Antonio J; Requejo, Félix G; Craievich, Aldo Felix

    Source: Applied Physics Letters. Unidade: IF

    Subjects: NANOPARTÍCULAS, FILMES FINOS

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    • ABNT

      KELLERMANN, Guinther et al. Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal. Applied Physics Letters, v. 100, n. 6, p. 063116/1-063116/5, 2012Tradução . . Disponível em: https://doi.org/10.1063/1.3683493. Acesso em: 17 out. 2024.

    • APA

      Kellermann, G., Montoro, L. A., Giovanetti, L. J., Claro, P. C. dos S., Zhang, L., Ramirez, A. J., et al. (2012). Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal. Applied Physics Letters, 100( 6), 063116/1-063116/5. doi:10.1063/1.3683493

    • NLM

      Kellermann G, Montoro LA, Giovanetti LJ, Claro PC dos S, Zhang L, Ramirez AJ, Requejo FG, Craievich AF. Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal [Internet]. Applied Physics Letters. 2012 ; 100( 6): 063116/1-063116/5.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.3683493

    • Vancouver

      Kellermann G, Montoro LA, Giovanetti LJ, Claro PC dos S, Zhang L, Ramirez AJ, Requejo FG, Craievich AF. Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal [Internet]. Applied Physics Letters. 2012 ; 100( 6): 063116/1-063116/5.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.3683493

  • Artigo de periodico

    Irradiation induced pulsations of reverse biased metal oxide/silicon structures (2007)

    Finka, D.; Kiv, A.; Fuks, D.; Tabacniks, Manfredo ; Rizzutto, Marcia ; Silva, A. De O. D.; Chandra, A.; Golovanov, V.; Ivanovskaya, M.; Khirunenko, L.

    Source: Applied Physics Letters. Unidade: IF

    Subjects: FÍSICA NUCLEAR, SILÍCIO, COLISÕES DE ÍONS PESADOS RELATIVÍSTICOS, RESISTÊNCIA FÍSICA, DISPOSITIVOS ELETRÔNICOS, FÍSICA, SEMICONDUTORES, TRANSISTORES

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      FINKA, D. et al. Irradiation induced pulsations of reverse biased metal oxide/silicon structures. Applied Physics Letters, v. 91, n. 8, 2007Tradução . . Disponível em: https://doi.org/10.1063/1.2773950. Acesso em: 17 out. 2024.

    • APA

      Finka, D., Kiv, A., Fuks, D., Tabacniks, M., Rizzutto, M., Silva, A. D. O. D., et al. (2007). Irradiation induced pulsations of reverse biased metal oxide/silicon structures. Applied Physics Letters, 91( 8). doi:10.1063/1.2773950

    • NLM

      Finka D, Kiv A, Fuks D, Tabacniks M, Rizzutto M, Silva ADOD, Chandra A, Golovanov V, Ivanovskaya M, Khirunenko L. Irradiation induced pulsations of reverse biased metal oxide/silicon structures [Internet]. Applied Physics Letters. 2007 ; 91( 8):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.2773950

    • Vancouver

      Finka D, Kiv A, Fuks D, Tabacniks M, Rizzutto M, Silva ADOD, Chandra A, Golovanov V, Ivanovskaya M, Khirunenko L. Irradiation induced pulsations of reverse biased metal oxide/silicon structures [Internet]. Applied Physics Letters. 2007 ; 91( 8):[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.2773950

  • Artigo de periodico

    Thermoelectric effect in very thin film Pt/Au thermocouples (2006)

    Salvadori, Maria Cecília Barbosa da Silveira; Vaz, A; Teixeira, F S; Cattani, Mauro Sérgio Dorsa ; Brown, I G

    Source: Applied Physics Letters. Unidade: IF

    Subjects: MATÉRIA CONDENSADA, FILMES FINOS

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      SALVADORI, Maria Cecília Barbosa da Silveira et al. Thermoelectric effect in very thin film Pt/Au thermocouples. Applied Physics Letters, v. 88, n. 13, p. 133106/1-133106/3, 2006Tradução . . Disponível em: https://doi.org/10.1063/1.2189192. Acesso em: 17 out. 2024.

    • APA

      Salvadori, M. C. B. da S., Vaz, A., Teixeira, F. S., Cattani, M. S. D., & Brown, I. G. (2006). Thermoelectric effect in very thin film Pt/Au thermocouples. Applied Physics Letters, 88( 13), 133106/1-133106/3. doi:10.1063/1.2189192

    • NLM

      Salvadori MCB da S, Vaz A, Teixeira FS, Cattani MSD, Brown IG. Thermoelectric effect in very thin film Pt/Au thermocouples [Internet]. Applied Physics Letters. 2006 ; 88( 13): 133106/1-133106/3.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.2189192

    • Vancouver

      Salvadori MCB da S, Vaz A, Teixeira FS, Cattani MSD, Brown IG. Thermoelectric effect in very thin film Pt/Au thermocouples [Internet]. Applied Physics Letters. 2006 ; 88( 13): 133106/1-133106/3.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.2189192

  • Artigo de periodico

    Nanostructure of sol-gel films by x-ray specular reflectivity (2002)

    Morelhão, Sérgio Luiz; Brito, Giancarlo Esposito de Souza; Abramof, E

    Source: Applied Physics Letters. Unidade: IF

    Assunto: FILMES FINOS

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      MORELHÃO, Sérgio Luiz e BRITO, Giancarlo Esposito de Souza e ABRAMOF, E. Nanostructure of sol-gel films by x-ray specular reflectivity. Applied Physics Letters, v. 80, n. 3, p. 407-409, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1436271. Acesso em: 17 out. 2024.

    • APA

      Morelhão, S. L., Brito, G. E. de S., & Abramof, E. (2002). Nanostructure of sol-gel films by x-ray specular reflectivity. Applied Physics Letters, 80( 3), 407-409. doi:10.1063/1.1436271

    • NLM

      Morelhão SL, Brito GE de S, Abramof E. Nanostructure of sol-gel films by x-ray specular reflectivity [Internet]. Applied Physics Letters. 2002 ; 80( 3): 407-409.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.1436271

    • Vancouver

      Morelhão SL, Brito GE de S, Abramof E. Nanostructure of sol-gel films by x-ray specular reflectivity [Internet]. Applied Physics Letters. 2002 ; 80( 3): 407-409.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.1436271

  • Artigo de periodico

    Contamination due to memory effects in filtered vacuum arc plasma deposition systems (2002)

    Martins, Deilton Reis; Salvadori, Maria Cecília Barbosa da Silveira; Verdonck, Patrick Bernard; Brown, I G

    Source: Applied Physics Letters. Unidades: IF, EP

    Subjects: VÁCUO, FÍSICA DE PLASMAS, FILMES FINOS

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      MARTINS, Deilton Reis et al. Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, v. 81, n. 11, p. 1969-1971, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1506019. Acesso em: 17 out. 2024.

    • APA

      Martins, D. R., Salvadori, M. C. B. da S., Verdonck, P. B., & Brown, I. G. (2002). Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, 81( 11), 1969-1971. doi:10.1063/1.1506019

    • NLM

      Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.1506019

    • Vancouver

      Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.1506019

  • Artigo de periodico

    Observation of coherent hybrid reflection with synchrotron radiation (1998)

    Morelhão, S L; Avanci, L H; Hayashi, M A; Cardoso, L P; Collins, S P

    Source: Applied Physics Letters. Unidade: IF

    Assunto: FÍSICA

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      MORELHÃO, S L et al. Observation of coherent hybrid reflection with synchrotron radiation. Applied Physics Letters, v. 73, n. 15, p. 2194-2196, 1998Tradução . . Disponível em: https://doi.org/10.1063/1.122420. Acesso em: 17 out. 2024.

    • APA

      Morelhão, S. L., Avanci, L. H., Hayashi, M. A., Cardoso, L. P., & Collins, S. P. (1998). Observation of coherent hybrid reflection with synchrotron radiation. Applied Physics Letters, 73( 15), 2194-2196. doi:10.1063/1.122420

    • NLM

      Morelhão SL, Avanci LH, Hayashi MA, Cardoso LP, Collins SP. Observation of coherent hybrid reflection with synchrotron radiation [Internet]. Applied Physics Letters. 1998 ; 73( 15): 2194-2196.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.122420

    • Vancouver

      Morelhão SL, Avanci LH, Hayashi MA, Cardoso LP, Collins SP. Observation of coherent hybrid reflection with synchrotron radiation [Internet]. Applied Physics Letters. 1998 ; 73( 15): 2194-2196.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.122420

  • Artigo de periodico

    Sensitivity Bragg surface diffraction to analyze ion-implanted semiconductors (1997)

    Hayashi, M A; Morelhão, Sérgio Luiz; Avanci, L H; Cardoso, L P; Sasaki, J M; Kretly, L C; Chang, S L

    Source: Applied Physics Letters. Unidade: IF

    Assunto: SEMICONDUTORES

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      HAYASHI, M A et al. Sensitivity Bragg surface diffraction to analyze ion-implanted semiconductors. Applied Physics Letters, v. 71, n. 18, p. 2614-2616. 1997, 1997Tradução . . Disponível em: https://doi.org/10.1063/1.120157. Acesso em: 17 out. 2024.

    • APA

      Hayashi, M. A., Morelhão, S. L., Avanci, L. H., Cardoso, L. P., Sasaki, J. M., Kretly, L. C., & Chang, S. L. (1997). Sensitivity Bragg surface diffraction to analyze ion-implanted semiconductors. Applied Physics Letters, 71( 18), 2614-2616. 1997. doi:10.1063/1.120157

    • NLM

      Hayashi MA, Morelhão SL, Avanci LH, Cardoso LP, Sasaki JM, Kretly LC, Chang SL. Sensitivity Bragg surface diffraction to analyze ion-implanted semiconductors [Internet]. Applied Physics Letters. 1997 ; 71( 18): 2614-2616. 1997.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.120157

    • Vancouver

      Hayashi MA, Morelhão SL, Avanci LH, Cardoso LP, Sasaki JM, Kretly LC, Chang SL. Sensitivity Bragg surface diffraction to analyze ion-implanted semiconductors [Internet]. Applied Physics Letters. 1997 ; 71( 18): 2614-2616. 1997.[citado 2024 out. 17 ] Available from: https://doi.org/10.1063/1.120157
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