SU-8 low contrast process for multi-level e-beam lithography (2005)
Source: Microelectronics Technology and Devices SBMICRO 2005. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
CATELLI, R e SEABRA, Antonio Carlos. SU-8 low contrast process for multi-level e-beam lithography. 2005, Anais.. Pennington: The Electrochemical Society, 2005. . Acesso em: 09 out. 2024.APA
Catelli, R., & Seabra, A. C. (2005). SU-8 low contrast process for multi-level e-beam lithography. In Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society.NLM
Catelli R, Seabra AC. SU-8 low contrast process for multi-level e-beam lithography. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2024 out. 09 ]Vancouver
Catelli R, Seabra AC. SU-8 low contrast process for multi-level e-beam lithography. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2024 out. 09 ]