Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas

Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas (2003)

Authors:
Autor USP: SEABRA, ANTONIO CARLOS - EP
Unidade: EP
Assunto: MICROELETRÔNICA
Language: Inglês
Imprenta:
- Publisher: Electrochemical Society
- Publisher place: Pennington
- Date published: 2003
ISBN: 1-56677-389-X
Source:
- Título: Microelectronic Technology and Devices SBMicro 2003

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ABNT

REYES BETANZO, C et al. Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas. Microelectronic Technology and Devices SBMicro 2003. Tradução . Pennington: Electrochemical Society, 2003. . . Acesso em: 17 mar. 2026.
APA

Reyes Betanzo, C., Moshkalyov, S. A., Seabra, A. C., & Swart, J. W. (2003). Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas. In Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society.
NLM

Reyes Betanzo C, Moshkalyov SA, Seabra AC, Swart JW. Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2026 mar. 17 ]
Vancouver

Reyes Betanzo C, Moshkalyov SA, Seabra AC, Swart JW. Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2026 mar. 17 ]