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Artigo de periodico
Twice a day neuromuscular electrical stimulation post-immobilization alters the mechanical properties and the histomorphometry of the skeletal muscle (2015)
Carvalho, Leonardo; Polizello, Juliana Cristina; Freitas, Fernando; Padula, Natália; Shimano, Antônio Carlos; Mattiello Sverzut, Ana Cláudia
Source: Musculoskeletal Biology. Unidade: FMRP
Subjects: IMOBILIZAÇÃO, ESTIMULAÇÃO ELÉTRICA, MÚSCULO ESQUELÉTICO
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ABNT
CARVALHO, Leonardo et al. Twice a day neuromuscular electrical stimulation post-immobilization alters the mechanical properties and the histomorphometry of the skeletal muscle. Musculoskeletal Biology, v. 2, 2015Tradução . . Disponível em: https://doi.org/10.7243/2054-720X-2-1. Acesso em: 03 out. 2024.
APA
Carvalho, L., Polizello, J. C., Freitas, F., Padula, N., Shimano, A. C., & Mattiello Sverzut, A. C. (2015). Twice a day neuromuscular electrical stimulation post-immobilization alters the mechanical properties and the histomorphometry of the skeletal muscle. Musculoskeletal Biology, 2. doi:10.7243/2054-720X-2-1
NLM
Carvalho L, Polizello JC, Freitas F, Padula N, Shimano AC, Mattiello Sverzut AC. Twice a day neuromuscular electrical stimulation post-immobilization alters the mechanical properties and the histomorphometry of the skeletal muscle [Internet]. Musculoskeletal Biology. 2015 ; 2[citado 2024 out. 03 ] Available from: https://doi.org/10.7243/2054-720X-2-1
Vancouver
Carvalho L, Polizello JC, Freitas F, Padula N, Shimano AC, Mattiello Sverzut AC. Twice a day neuromuscular electrical stimulation post-immobilization alters the mechanical properties and the histomorphometry of the skeletal muscle [Internet]. Musculoskeletal Biology. 2015 ; 2[citado 2024 out. 03 ] Available from: https://doi.org/10.7243/2054-720X-2-1
Trabalho de evento-resumo
Phenolic compounds attenuates UVB radiation effects on cultured keratinocytes (2013)
Fruet, Andréa Costa; Rivelli, B; Pineda, Diogo; Maria-Engler, Silvya Stuchi ; Barros, Silvia Berlanga de Moraes
Source: Book of Abstracts. Conference titles: International Federation of Societies of Cosmetic Chemists Conference (IFSCC). Unidade: FCF
Subjects: COMPOSTOS FENÓLICOS, RADIAÇÃO ULTRAVIOLETA
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ABNT
FRUET, Andréa Costa et al. Phenolic compounds attenuates UVB radiation effects on cultured keratinocytes. 2013, Anais.. Luton: IFSCC; Associação Brasileira de Cosmetologia (ABC), 2013. . Acesso em: 03 out. 2024.
APA
Fruet, A. C., Rivelli, B., Pineda, D., Maria-Engler, S. S., & Barros, S. B. de M. (2013). Phenolic compounds attenuates UVB radiation effects on cultured keratinocytes. In Book of Abstracts. Luton: IFSCC; Associação Brasileira de Cosmetologia (ABC).
NLM
Fruet AC, Rivelli B, Pineda D, Maria-Engler SS, Barros SB de M. Phenolic compounds attenuates UVB radiation effects on cultured keratinocytes. Book of Abstracts. 2013 ;[citado 2024 out. 03 ]
Vancouver
Fruet AC, Rivelli B, Pineda D, Maria-Engler SS, Barros SB de M. Phenolic compounds attenuates UVB radiation effects on cultured keratinocytes. Book of Abstracts. 2013 ;[citado 2024 out. 03 ]
Artigo de periodico
Generation and characterization of polymeric tridimensional microstrucutres for micromachine application (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Arruda, Antonio Carlos Santos de
Source: Microelectronics Journal,. Unidade: EP
Assunto: NANOTECNOLOGIA
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ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e ARRUDA, Antonio Carlos Santos de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00085-5. Acesso em: 03 out. 2024.
APA
Mousinho, A. P., Mansano, R. D., & Arruda, A. C. S. de. (2003). Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal,, 34( 5-8). doi:10.1016/s0026-2692(03)00085-5
NLM
Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5
Vancouver
Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5
Artigo de periodico
High density plasma chemical vapor deposition of diamond-like carbon films (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MOUSINHO, Ana Paula et al. High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, v. 34, n. 5-8, p. 627-629, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00065-x. Acesso em: 03 out. 2024.
APA
Mousinho, A. P., Mansano, R. D., Massi, M., & Zambom, L. da S. (2003). High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, 34( 5-8), 627-629. doi:10.1016/s0026-2692(03)00065-x
NLM
Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
Vancouver
Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
Artigo de periodico
Plasma etching of DLC films for microfluidic channels (2003)
Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal,. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 03 out. 2024.
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Artigo de periodico
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 03 out. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x

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