Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process (2000)
Source: SBMicro 2000: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
SILVA, Ana Neilde Rodrigues da et al. Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 04 out. 2024.APA
Silva, A. N. R. da, Silva, M. L. P. da, Morimoto, N. I., & Bonnaud, O. (2000). Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process. In SBMicro 2000: proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP.NLM
Silva ANR da, Silva MLP da, Morimoto NI, Bonnaud O. Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process. SBMicro 2000: proceedings. 2000 ;[citado 2024 out. 04 ]Vancouver
Silva ANR da, Silva MLP da, Morimoto NI, Bonnaud O. Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process. SBMicro 2000: proceedings. 2000 ;[citado 2024 out. 04 ]