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Artigo de periodico
Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods (2011)
Soto-García, Lydia L; Andreae, M O; Andreae, T W; Artaxo Netto, Paulo Eduardo ; Maenhaut, W; Kirchstetter, T; Novakov, T; Chow, J C; Mayol-Bracero, O L
Source: Atmospheric Chemistry and Physics. Unidade: IF
Assunto: AEROSSOL
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ABNT
SOTO-GARCÍA, Lydia L et al. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods. Atmospheric Chemistry and Physics, v. 11(9), p. 4425–4444, 2011Tradução . . Disponível em: https://doi.org/10.5194/acp-11-4425-2011. Acesso em: 23 jun. 2024.
APA
Soto-García, L. L., Andreae, M. O., Andreae, T. W., Artaxo Netto, P. E., Maenhaut, W., Kirchstetter, T., et al. (2011). Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods. Atmospheric Chemistry and Physics, 11(9), 4425–4444. doi:10.5194/acp-11-4425-2011
NLM
Soto-García LL, Andreae MO, Andreae TW, Artaxo Netto PE, Maenhaut W, Kirchstetter T, Novakov T, Chow JC, Mayol-Bracero OL. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods [Internet]. Atmospheric Chemistry and Physics. 2011 ;11(9) 4425–4444.[citado 2024 jun. 23 ] Available from: https://doi.org/10.5194/acp-11-4425-2011
Vancouver
Soto-García LL, Andreae MO, Andreae TW, Artaxo Netto PE, Maenhaut W, Kirchstetter T, Novakov T, Chow JC, Mayol-Bracero OL. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods [Internet]. Atmospheric Chemistry and Physics. 2011 ;11(9) 4425–4444.[citado 2024 jun. 23 ] Available from: https://doi.org/10.5194/acp-11-4425-2011
Artigo de periodico
Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods (2010)
Soto-García, Lydia L; Andreae, M O; Andreae, T W; Artaxo Netto, Paulo Eduardo ; Maenhaut, W; Kirchstetter, T; Novakov, T; Chow, J C; Mayol-Bracero, O L
Source: Atmospheric Chemistry and Physics Discussions. Unidade: IF
Assunto: AEROSSOL
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ABNT
SOTO-GARCÍA, Lydia L et al. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods. Atmospheric Chemistry and Physics Discussions, v. 10(5), p. 12859-12906, 2010Tradução . . Disponível em: https://doi.org/10.5194/acpd-10-12859-2010. Acesso em: 23 jun. 2024.
APA
Soto-García, L. L., Andreae, M. O., Andreae, T. W., Artaxo Netto, P. E., Maenhaut, W., Kirchstetter, T., et al. (2010). Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods. Atmospheric Chemistry and Physics Discussions, 10(5), 12859-12906. doi:10.5194/acpd-10-12859-2010
NLM
Soto-García LL, Andreae MO, Andreae TW, Artaxo Netto PE, Maenhaut W, Kirchstetter T, Novakov T, Chow JC, Mayol-Bracero OL. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods [Internet]. Atmospheric Chemistry and Physics Discussions. 2010 ;10(5) 12859-12906.[citado 2024 jun. 23 ] Available from: https://doi.org/10.5194/acpd-10-12859-2010
Vancouver
Soto-García LL, Andreae MO, Andreae TW, Artaxo Netto PE, Maenhaut W, Kirchstetter T, Novakov T, Chow JC, Mayol-Bracero OL. Evaluation of the carbon content of aerosols from the burning of biomass in the Brazilian Amazon using thermal, optical and thermal-optical analysis methods [Internet]. Atmospheric Chemistry and Physics Discussions. 2010 ;10(5) 12859-12906.[citado 2024 jun. 23 ] Available from: https://doi.org/10.5194/acpd-10-12859-2010
Artigo de periodico
Structure of disordered gold-polymer thin films using small angle x-ray scattering (2010)
Teixeira, Fernanda de Sá; Salvadori, Maria Cecília Barbosa da Silveira; Cattani, Mauro Sérgio Dorsa ; Brown, I G
Source: Journal of applied physics. Unidade: IF
Assunto: FILMES FINOS
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ABNT
TEIXEIRA, Fernanda de Sá et al. Structure of disordered gold-polymer thin films using small angle x-ray scattering. Journal of applied physics, v. 108, n. 9, p. 093505/1-093505/6, 2010Tradução . . Disponível em: https://doi.org/10.1063/1.3493241. Acesso em: 23 jun. 2024.
APA
Teixeira, F. de S., Salvadori, M. C. B. da S., Cattani, M. S. D., & Brown, I. G. (2010). Structure of disordered gold-polymer thin films using small angle x-ray scattering. Journal of applied physics, 108( 9), 093505/1-093505/6. doi:10.1063/1.3493241
NLM
Teixeira F de S, Salvadori MCB da S, Cattani MSD, Brown IG. Structure of disordered gold-polymer thin films using small angle x-ray scattering [Internet]. Journal of applied physics. 2010 ;108( 9): 093505/1-093505/6.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.3493241
Vancouver
Teixeira F de S, Salvadori MCB da S, Cattani MSD, Brown IG. Structure of disordered gold-polymer thin films using small angle x-ray scattering [Internet]. Journal of applied physics. 2010 ;108( 9): 093505/1-093505/6.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.3493241
Artigo de periodico
Topology studies of hydrodynamics using two-particle correlation analysis (2009)
Takahashi, Jiro; Tavares, B M; Qian, Wei-Liang; Andrade, R; Grassi, Frederique Marie Brigitte Sylvie; Hama, Yogiro; Kodama, Takeshi; Xu, N
Source: Physical Review Letters. Unidade: IF
Subjects: HIDRODINÂMICA, ÍONS PESADOS
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ABNT
TAKAHASHI, Jiro et al. Topology studies of hydrodynamics using two-particle correlation analysis. Physical Review Letters, v. 103, n. 25, 2009Tradução . . Disponível em: http://prl.aps.org/pdf/PRL/v103/i24/e242301. Acesso em: 23 jun. 2024.
APA
Takahashi, J., Tavares, B. M., Qian, W. -L., Andrade, R., Grassi, F. M. B. S., Hama, Y., et al. (2009). Topology studies of hydrodynamics using two-particle correlation analysis. Physical Review Letters, 103( 25). Recuperado de http://prl.aps.org/pdf/PRL/v103/i24/e242301
NLM
Takahashi J, Tavares BM, Qian W-L, Andrade R, Grassi FMBS, Hama Y, Kodama T, Xu N. Topology studies of hydrodynamics using two-particle correlation analysis [Internet]. Physical Review Letters. 2009 ; 103( 25):[citado 2024 jun. 23 ] Available from: http://prl.aps.org/pdf/PRL/v103/i24/e242301
Vancouver
Takahashi J, Tavares BM, Qian W-L, Andrade R, Grassi FMBS, Hama Y, Kodama T, Xu N. Topology studies of hydrodynamics using two-particle correlation analysis [Internet]. Physical Review Letters. 2009 ; 103( 25):[citado 2024 jun. 23 ] Available from: http://prl.aps.org/pdf/PRL/v103/i24/e242301
Artigo de periodico
Gold-implanted shallow conducting layers in polymethylmethacrylate (2009)
Teixeira, Fernanda de Sá; Salvadori, Maria Cecília Barbosa da Silveira; Cattani, Mauro Sérgio Dorsa ; Brown, I G
Source: Journal of Applied Physics,. Unidade: IF
Subjects: FILMES FINOS, MÉTODO DE MONTE CARLO
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ABNT
TEIXEIRA, Fernanda de Sá et al. Gold-implanted shallow conducting layers in polymethylmethacrylate. Journal of Applied Physics, v. 105, n. 6, p. 064313-1/-064313-5, 2009Tradução . . Disponível em: https://doi.org/10.1063/1.3088874. Acesso em: 23 jun. 2024.
APA
Teixeira, F. de S., Salvadori, M. C. B. da S., Cattani, M. S. D., & Brown, I. G. (2009). Gold-implanted shallow conducting layers in polymethylmethacrylate. Journal of Applied Physics,, 105( 6), 064313-1/-064313-5. doi:10.1063/1.3088874
NLM
Teixeira F de S, Salvadori MCB da S, Cattani MSD, Brown IG. Gold-implanted shallow conducting layers in polymethylmethacrylate [Internet]. Journal of Applied Physics,. 2009 ; 105( 6): 064313-1/-064313-5.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.3088874
Vancouver
Teixeira F de S, Salvadori MCB da S, Cattani MSD, Brown IG. Gold-implanted shallow conducting layers in polymethylmethacrylate [Internet]. Journal of Applied Physics,. 2009 ; 105( 6): 064313-1/-064313-5.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.3088874
Relatorio tecnico
Topology studies of hydrodynamics using two particle correlation analysis (2009)
Takahashi, Jun; Tavares, B M; Qian, Wei-Liang; Andrade, Rone Peterson G; Grassi, Frederique Marie Brigitte Sylvie; Hama, Yogiro; Kodama, Takeshi; Xu, N
Unidade: IF
Subjects: FÍSICA NUCLEAR, HIDRODINÂMICA
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ABNT
TAKAHASHI, Jun et al. Topology studies of hydrodynamics using two particle correlation analysis. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: http://xxx.if.usp.br/PS_cache/arxiv/pdf/0902/0902.4870v2.pdf. Acesso em: 23 jun. 2024. , 2009
APA
Takahashi, J., Tavares, B. M., Qian, W. -L., Andrade, R. P. G., Grassi, F. M. B. S., Hama, Y., et al. (2009). Topology studies of hydrodynamics using two particle correlation analysis. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de http://xxx.if.usp.br/PS_cache/arxiv/pdf/0902/0902.4870v2.pdf
NLM
Takahashi J, Tavares BM, Qian W-L, Andrade RPG, Grassi FMBS, Hama Y, Kodama T, Xu N. Topology studies of hydrodynamics using two particle correlation analysis [Internet]. 2009 ;[citado 2024 jun. 23 ] Available from: http://xxx.if.usp.br/PS_cache/arxiv/pdf/0902/0902.4870v2.pdf
Vancouver
Takahashi J, Tavares BM, Qian W-L, Andrade RPG, Grassi FMBS, Hama Y, Kodama T, Xu N. Topology studies of hydrodynamics using two particle correlation analysis [Internet]. 2009 ;[citado 2024 jun. 23 ] Available from: http://xxx.if.usp.br/PS_cache/arxiv/pdf/0902/0902.4870v2.pdf
Artigo de periodico
Novel method for measuring nanofriction by atomic force microscope (2008)
Salvadori, Maria Cecília Barbosa da Silveira; Lisboa, F S; Fernandes, Fernando Massa; Brown, I G
Source: Journal of Vacuum Science and Technology B. Unidade: IF
Subjects: SUPERFÍCIE FÍSICA, FILMES FINOS
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ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Novel method for measuring nanofriction by atomic force microscope. Journal of Vacuum Science and Technology B, v. 26, n. 2, p. 643-650, 2008Tradução . . Disponível em: https://doi.org/10.1116/1.2890694. Acesso em: 23 jun. 2024.
APA
Salvadori, M. C. B. da S., Lisboa, F. S., Fernandes, F. M., & Brown, I. G. (2008). Novel method for measuring nanofriction by atomic force microscope. Journal of Vacuum Science and Technology B, 26( 2), 643-650. doi:10.1116/1.2890694
NLM
Salvadori MCB da S, Lisboa FS, Fernandes FM, Brown IG. Novel method for measuring nanofriction by atomic force microscope [Internet]. Journal of Vacuum Science and Technology B. 2008 ; 26( 2): 643-650.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2890694
Vancouver
Salvadori MCB da S, Lisboa FS, Fernandes FM, Brown IG. Novel method for measuring nanofriction by atomic force microscope [Internet]. Journal of Vacuum Science and Technology B. 2008 ; 26( 2): 643-650.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2890694
Artigo de periodico
Influence of electron scattering from morphological granularity and surface roughness on thin film electrical resistivity (2007)
Cattani, Mauro Sérgio Dorsa ; Vaz, A R; Wiederkehr, Rodrigo Sérgio; Teixeira, Fernanda de Sá; Salvadori, Maria Cecília Barbosa da Silveira; Brown, I G
Source: Surface Review and Letters. Unidade: IF
Assunto: FILMES FINOS
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ABNT
CATTANI, Mauro Sérgio Dorsa et al. Influence of electron scattering from morphological granularity and surface roughness on thin film electrical resistivity. Surface Review and Letters, v. 14, n. 1, p. 87-91, 2007Tradução . . Disponível em: http://db.worldscinet.com/worldscientific/Files/20080117040740835290[000000@143.107.135.25]@page.pdf. Acesso em: 23 jun. 2024.
APA
Cattani, M. S. D., Vaz, A. R., Wiederkehr, R. S., Teixeira, F. de S., Salvadori, M. C. B. da S., & Brown, I. G. (2007). Influence of electron scattering from morphological granularity and surface roughness on thin film electrical resistivity. Surface Review and Letters, 14( 1), 87-91. Recuperado de http://db.worldscinet.com/worldscientific/Files/20080117040740835290[000000@143.107.135.25]@page.pdf
NLM
Cattani MSD, Vaz AR, Wiederkehr RS, Teixeira F de S, Salvadori MCB da S, Brown IG. Influence of electron scattering from morphological granularity and surface roughness on thin film electrical resistivity [Internet]. Surface Review and Letters. 2007 ; 14( 1): 87-91.[citado 2024 jun. 23 ] Available from: http://db.worldscinet.com/worldscientific/Files/20080117040740835290[000000@143.107.135.25]@page.pdf
Vancouver
Cattani MSD, Vaz AR, Wiederkehr RS, Teixeira F de S, Salvadori MCB da S, Brown IG. Influence of electron scattering from morphological granularity and surface roughness on thin film electrical resistivity [Internet]. Surface Review and Letters. 2007 ; 14( 1): 87-91.[citado 2024 jun. 23 ] Available from: http://db.worldscinet.com/worldscientific/Files/20080117040740835290[000000@143.107.135.25]@page.pdf
Artigo de periodico
Electrical resistivity of very thin metallic films with isotropic and anisotropic surfaces (2007)
Cattani, Mauro Sérgio Dorsa ; Salvadori, Maria Cecília Barbosa da Silveira; Teixeira, Fernanda Sá; Wiederkehr, R S; Brown, I G
Source: Surface Review and Letters. Unidade: IF
Subjects: SUPERFÍCIE FÍSICA, FILMES FINOS
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ABNT
CATTANI, Mauro Sérgio Dorsa et al. Electrical resistivity of very thin metallic films with isotropic and anisotropic surfaces. Surface Review and Letters, v. 14, n. 3, p. 345-356, 2007Tradução . . Disponível em: http://db.worldscinet.com/worldscientific/Files/20080130013118099303[CAPES152@143.107.135.25]@page.pdf. Acesso em: 23 jun. 2024.
APA
Cattani, M. S. D., Salvadori, M. C. B. da S., Teixeira, F. S., Wiederkehr, R. S., & Brown, I. G. (2007). Electrical resistivity of very thin metallic films with isotropic and anisotropic surfaces. Surface Review and Letters, 14( 3), 345-356. Recuperado de http://db.worldscinet.com/worldscientific/Files/20080130013118099303[CAPES152@143.107.135.25]@page.pdf
NLM
Cattani MSD, Salvadori MCB da S, Teixeira FS, Wiederkehr RS, Brown IG. Electrical resistivity of very thin metallic films with isotropic and anisotropic surfaces [Internet]. Surface Review and Letters. 2007 ; 14( 3): 345-356.[citado 2024 jun. 23 ] Available from: http://db.worldscinet.com/worldscientific/Files/20080130013118099303[CAPES152@143.107.135.25]@page.pdf
Vancouver
Cattani MSD, Salvadori MCB da S, Teixeira FS, Wiederkehr RS, Brown IG. Electrical resistivity of very thin metallic films with isotropic and anisotropic surfaces [Internet]. Surface Review and Letters. 2007 ; 14( 3): 345-356.[citado 2024 jun. 23 ] Available from: http://db.worldscinet.com/worldscientific/Files/20080130013118099303[CAPES152@143.107.135.25]@page.pdf
Artigo de periodico
Small plasma source for materials application (2007)
Vizir, A; Oks, E M; Salvadori, Maria Cecília Barbosa da Silveira; Teixeira, Fernanda de Sá; Brown, I G
Source: Review of Scientific Instruments. Unidade: IF
Subjects: FÍSICA DE PLASMAS, ÍONS
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ABNT
VIZIR, A et al. Small plasma source for materials application. Review of Scientific Instruments, v. 78, n. 8, p. 086103/1-086103/2, 2007Tradução . . Disponível em: https://doi.org/10.1063/1.2766837. Acesso em: 23 jun. 2024.
APA
Vizir, A., Oks, E. M., Salvadori, M. C. B. da S., Teixeira, F. de S., & Brown, I. G. (2007). Small plasma source for materials application. Review of Scientific Instruments, 78( 8), 086103/1-086103/2. doi:10.1063/1.2766837
NLM
Vizir A, Oks EM, Salvadori MCB da S, Teixeira F de S, Brown IG. Small plasma source for materials application [Internet]. Review of Scientific Instruments. 2007 ; 78( 8): 086103/1-086103/2.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2766837
Vancouver
Vizir A, Oks EM, Salvadori MCB da S, Teixeira F de S, Brown IG. Small plasma source for materials application [Internet]. Review of Scientific Instruments. 2007 ; 78( 8): 086103/1-086103/2.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2766837
Artigo de periodico
Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness (2007)
Salvadori, Maria Cecília Barbosa da Silveira; Cattani, Mauro Sérgio Dorsa ; Teixeira, F S; Wiederkehr, R S; Brown, I G
Source: Journal of Vacuum Science & Technology A. Unidade: IF
Subjects: FILMES FINOS, VÁCUO
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ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness. Journal of Vacuum Science & Technology A, v. 25, n. 2, p. 330-333, 2007Tradução . . Disponível em: https://doi.org/10.1116/1.2699254. Acesso em: 23 jun. 2024.
APA
Salvadori, M. C. B. da S., Cattani, M. S. D., Teixeira, F. S., Wiederkehr, R. S., & Brown, I. G. (2007). Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness. Journal of Vacuum Science & Technology A, 25( 2), 330-333. doi:10.1116/1.2699254
NLM
Salvadori MCB da S, Cattani MSD, Teixeira FS, Wiederkehr RS, Brown IG. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness [Internet]. Journal of Vacuum Science & Technology A. 2007 ; 25( 2): 330-333.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2699254
Vancouver
Salvadori MCB da S, Cattani MSD, Teixeira FS, Wiederkehr RS, Brown IG. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness [Internet]. Journal of Vacuum Science & Technology A. 2007 ; 25( 2): 330-333.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2699254
Artigo de periodico
Atomic force microscope nanolithography of polymethylmethacrylate polymer (2007)
Teixeira, Fernanda de Sá; Mansano, Ronaldo Domingues ; Salvadori, Maria Cecília Barbosa da Silveira; Cattani, Mauro Sérgio Dorsa ; Brown, I G
Source: Review of Scientific Instruments. Unidades: EP, IF
Subjects: MICROSCOPIA ELETRÔNICA DE VARREDURA, POLÍMEROS (MATERIAIS)
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ABNT
TEIXEIRA, Fernanda de Sá et al. Atomic force microscope nanolithography of polymethylmethacrylate polymer. Review of Scientific Instruments, v. 78, n. 4, p. 053702-053702/3, 2007Tradução . . Disponível em: https://doi.org/10.1063/1.2736311. Acesso em: 23 jun. 2024.
APA
Teixeira, F. de S., Mansano, R. D., Salvadori, M. C. B. da S., Cattani, M. S. D., & Brown, I. G. (2007). Atomic force microscope nanolithography of polymethylmethacrylate polymer. Review of Scientific Instruments, 78( 4), 053702-053702/3. doi:10.1063/1.2736311
NLM
Teixeira F de S, Mansano RD, Salvadori MCB da S, Cattani MSD, Brown IG. Atomic force microscope nanolithography of polymethylmethacrylate polymer [Internet]. Review of Scientific Instruments. 2007 ; 78( 4): 053702-053702/3.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2736311
Vancouver
Teixeira F de S, Mansano RD, Salvadori MCB da S, Cattani MSD, Brown IG. Atomic force microscope nanolithography of polymethylmethacrylate polymer [Internet]. Review of Scientific Instruments. 2007 ; 78( 4): 053702-053702/3.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2736311
Artigo de periodico
Thermoelectric effect in very thin film Pt/Au thermocouples (2006)
Salvadori, Maria Cecília Barbosa da Silveira; Vaz, A; Teixeira, F S; Cattani, Mauro Sérgio Dorsa ; Brown, I G
Source: Applied Physics Letters. Unidade: IF
Subjects: MATÉRIA CONDENSADA, FILMES FINOS
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ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Thermoelectric effect in very thin film Pt/Au thermocouples. Applied Physics Letters, v. 88, n. 13, p. 133106/1-133106/3, 2006Tradução . . Disponível em: https://doi.org/10.1063/1.2189192. Acesso em: 23 jun. 2024.
APA
Salvadori, M. C. B. da S., Vaz, A., Teixeira, F. S., Cattani, M. S. D., & Brown, I. G. (2006). Thermoelectric effect in very thin film Pt/Au thermocouples. Applied Physics Letters, 88( 13), 133106/1-133106/3. doi:10.1063/1.2189192
NLM
Salvadori MCB da S, Vaz A, Teixeira FS, Cattani MSD, Brown IG. Thermoelectric effect in very thin film Pt/Au thermocouples [Internet]. Applied Physics Letters. 2006 ; 88( 13): 133106/1-133106/3.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2189192
Vancouver
Salvadori MCB da S, Vaz A, Teixeira FS, Cattani MSD, Brown IG. Thermoelectric effect in very thin film Pt/Au thermocouples [Internet]. Applied Physics Letters. 2006 ; 88( 13): 133106/1-133106/3.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.2189192
Artigo de periodico
Diamond microstructures fabricated using silicon molds (2005)
Salvadori, Maria Cecília Barbosa da Silveira; Martins, D R; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Brown, I G
Source: Journal of Vacuum Science & Technology. Unidades: IF, EP
Subjects: MATERIAIS, DIAMANTE, MICROSCOPIA ELETRÔNICA
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ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Diamond microstructures fabricated using silicon molds. Journal of Vacuum Science & Technology, v. 23, n. 6, p. 1575-1578, 2005Tradução . . Disponível em: https://doi.org/10.1116/1.2091095. Acesso em: 23 jun. 2024.
APA
Salvadori, M. C. B. da S., Martins, D. R., Mansano, R. D., Verdonck, P. B., & Brown, I. G. (2005). Diamond microstructures fabricated using silicon molds. Journal of Vacuum Science & Technology, 23( 6), 1575-1578. doi:10.1116/1.2091095
NLM
Salvadori MCB da S, Martins DR, Mansano RD, Verdonck PB, Brown IG. Diamond microstructures fabricated using silicon molds [Internet]. Journal of Vacuum Science & Technology. 2005 ; 23( 6): 1575-1578.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2091095
Vancouver
Salvadori MCB da S, Martins DR, Mansano RD, Verdonck PB, Brown IG. Diamond microstructures fabricated using silicon molds [Internet]. Journal of Vacuum Science & Technology. 2005 ; 23( 6): 1575-1578.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1116/1.2091095
Artigo de periodico
Contamination due to memory effects in filtered vacuum arc plasma deposition systems (2002)
Martins, Deilton Reis; Salvadori, Maria Cecília Barbosa da Silveira; Verdonck, Patrick Bernard; Brown, I G
Source: Applied Physics Letters. Unidades: IF, EP
Subjects: VÁCUO, FÍSICA DE PLASMAS, FILMES FINOS
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ABNT
MARTINS, Deilton Reis et al. Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, v. 81, n. 11, p. 1969-1971, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1506019. Acesso em: 23 jun. 2024.
APA
Martins, D. R., Salvadori, M. C. B. da S., Verdonck, P. B., & Brown, I. G. (2002). Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, 81( 11), 1969-1971. doi:10.1063/1.1506019
NLM
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.1506019
Vancouver
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2024 jun. 23 ] Available from: https://doi.org/10.1063/1.1506019

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