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Artigo de periodico
Highly oriented NiSi2@Si thin-nanocomposite produced by solid state diffusion: Morphological and crystallographic characterization (2022)
Costa, Daniel da Silva; Kellermann, Guinther; Craievich, Aldo Felix ; Montoro, Luciano A.; Oliveira, Camilla K. B. Q. M.; Afonso, Conrado R. M.; Huck-Iriart, Cristián; Lisando J. Giovanetti; Requejo, Felix G.; Zanella, Igor G.; Mazzaro, Irineu; Szameitat, Erico S.; Cardoso, Rodrigo P.
Source: Surfaces and Interfaces. Unidade: IF
Subjects: CRISTALOGRAFIA FÍSICA, MATERIAIS NANOESTRUTURADOS, ESPALHAMENTO DE RAIOS X A BAIXOS ÂNGULOS
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ABNT
COSTA, Daniel da Silva et al. Highly oriented NiSi2@Si thin-nanocomposite produced by solid state diffusion: Morphological and crystallographic characterization. Surfaces and Interfaces, v. 29, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.surfin.2022.101763. Acesso em: 25 maio 2024.
APA
Costa, D. da S., Kellermann, G., Craievich, A. F., Montoro, L. A., Oliveira, C. K. B. Q. M., Afonso, C. R. M., et al. (2022). Highly oriented NiSi2@Si thin-nanocomposite produced by solid state diffusion: Morphological and crystallographic characterization. Surfaces and Interfaces, 29. doi:10.1016/j.surfin.2022.101763
NLM
Costa D da S, Kellermann G, Craievich AF, Montoro LA, Oliveira CKBQM, Afonso CRM, Huck-Iriart C, Lisando J. Giovanetti, Requejo FG, Zanella IG, Mazzaro I, Szameitat ES, Cardoso RP. Highly oriented NiSi2@Si thin-nanocomposite produced by solid state diffusion: Morphological and crystallographic characterization [Internet]. Surfaces and Interfaces. 2022 ; 29[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.surfin.2022.101763
Vancouver
Costa D da S, Kellermann G, Craievich AF, Montoro LA, Oliveira CKBQM, Afonso CRM, Huck-Iriart C, Lisando J. Giovanetti, Requejo FG, Zanella IG, Mazzaro I, Szameitat ES, Cardoso RP. Highly oriented NiSi2@Si thin-nanocomposite produced by solid state diffusion: Morphological and crystallographic characterization [Internet]. Surfaces and Interfaces. 2022 ; 29[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.surfin.2022.101763
Artigo de periodico
In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film (2021)
Costa, Daniel da Silva; Kellermann, Guinther; Craievich, Aldo Felix ; Giovanetti, Lisandro J; Huck-Iriart, Cristián; Requejo, Félix G
Unidade: IF
Assunto: NANOPARTÍCULAS
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COSTA, Daniel da Silva et al. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film. v. 879, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.jallcom.2021.160345. Acesso em: 25 maio 2024.
APA
Costa, D. da S., Kellermann, G., Craievich, A. F., Giovanetti, L. J., Huck-Iriart, C., & Requejo, F. G. (2021). In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film, 879. doi:10.1016/j.jallcom.2021.160345
NLM
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345
Vancouver
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345
Artigo de periodico
NiO/CeO2-Sm2O3 nanocomposites for partial oxidation of methane: In-situ experiments by dispersive X-ray absorption spectroscopy (2021)
Toscani, Lucia M; Craievich, Aldo Felix ; Fantini, Márcia Carvalho de Abreu
Unidade: IF
Assunto: ESPECTROSCOPIA DE RAIO X
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ABNT
TOSCANI, Lucia M e CRAIEVICH, Aldo Felix e FANTINI, Márcia Carvalho de Abreu. NiO/CeO2-Sm2O3 nanocomposites for partial oxidation of methane: In-situ experiments by dispersive X-ray absorption spectroscopy. v. 626, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.apcata.2021.118357. Acesso em: 25 maio 2024.
APA
Toscani, L. M., Craievich, A. F., & Fantini, M. C. de A. (2021). NiO/CeO2-Sm2O3 nanocomposites for partial oxidation of methane: In-situ experiments by dispersive X-ray absorption spectroscopy, 626. doi:10.1016/j.apcata.2021.118357
NLM
Toscani LM, Craievich AF, Fantini MC de A. NiO/CeO2-Sm2O3 nanocomposites for partial oxidation of methane: In-situ experiments by dispersive X-ray absorption spectroscopy [Internet]. 2021 ; 626[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.apcata.2021.118357
Vancouver
Toscani LM, Craievich AF, Fantini MC de A. NiO/CeO2-Sm2O3 nanocomposites for partial oxidation of methane: In-situ experiments by dispersive X-ray absorption spectroscopy [Internet]. 2021 ; 626[citado 2024 maio 25 ] Available from: https://doi.org/10.1016/j.apcata.2021.118357
Artigo de periodico
Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers (2019)
García Molleja, J ; Burgi, Juan; Kellermann, G; Craievich, Aldo Felix ; Neuenschwander, R; Jouan, P Y; Djouadi, M A; Piccoli, M; Bemporad, E; Felicis, D de; Feugeas J N
Source: Journal of Physical Chemistry B. Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, RADIAÇÃO SINCROTRON
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ABNT
GARCÍA MOLLEJA, J et al. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, v. 123, n. 7, p. 1679−1687, 2019Tradução . . Disponível em: https://doi.org/10.1021/acs.jpcb.8b09496. Acesso em: 25 maio 2024.
APA
García Molleja, J., Burgi, J., Kellermann, G., Craievich, A. F., Neuenschwander, R., Jouan, P. Y., et al. (2019). Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, 123( 7), 1679−1687. doi:10.1021/acs.jpcb.8b09496
NLM
García Molleja J, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123( 7): 1679−1687.[citado 2024 maio 25 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Vancouver
García Molleja J, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123( 7): 1679−1687.[citado 2024 maio 25 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Artigo de periodico
Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers (2019)
Molleja, J García; Burgi, J; Kellermann, G; Craievich, Aldo Felix; Neuenschwander, R; Jouan, P Y; Djouadi, M A; Piccoli, M; Bemporad, E; Felicis, D de; Feugeas J N
Source: Journal of Physical Chemistry B. Unidade: IF
Assunto: FILMES FINOS
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ABNT
MOLLEJA, J García et al. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, v. 123, p. 1679−1687, 2019Tradução . . Disponível em: https://doi.org/10.1021/acs.jpcb.8b09496. Acesso em: 25 maio 2024.
APA
Molleja, J. G., Burgi, J., Kellermann, G., Craievich, A. F., Neuenschwander, R., Jouan, P. Y., et al. (2019). Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, 123, 1679−1687. doi:10.1021/acs.jpcb.8b09496
NLM
Molleja JG, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123 1679−1687.[citado 2024 maio 25 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Vancouver
Molleja JG, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123 1679−1687.[citado 2024 maio 25 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Artigo de periodico
Effect of nanoclustering and dipolar interactions in heat generation for magnetic hyperthermia (2016)
Coral, Diego F.; Mendoza Zelis, Pedro; Sanchez, Francisco H.; Raap, Marcela B. Fernandez van; Marciello, Marzia; Puerto Morales, Maria del; Craievich, Aldo Felix
Source: LANGMUIR. Unidade: IF
Subjects: RAIOS X, SILÍCIO
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ABNT
CORAL, Diego F. et al. Effect of nanoclustering and dipolar interactions in heat generation for magnetic hyperthermia. LANGMUIR, v. fe2016, n. 5, p. 1201-1213, 2016Tradução . . Disponível em: http://pubs.acs.org/doi/abs/10.1021/acs.langmuir.5b03559. Acesso em: 25 maio 2024.
APA
Coral, D. F., Mendoza Zelis, P., Sanchez, F. H., Raap, M. B. F. van, Marciello, M., Puerto Morales, M. del, & Craievich, A. F. (2016). Effect of nanoclustering and dipolar interactions in heat generation for magnetic hyperthermia. LANGMUIR, fe2016( 5), 1201-1213. doi:10.1021/acs.langmuir.5b03559
NLM
Coral DF, Mendoza Zelis P, Sanchez FH, Raap MBF van, Marciello M, Puerto Morales M del, Craievich AF. Effect of nanoclustering and dipolar interactions in heat generation for magnetic hyperthermia [Internet]. LANGMUIR. 2016 ; fe2016( 5): 1201-1213.[citado 2024 maio 25 ] Available from: http://pubs.acs.org/doi/abs/10.1021/acs.langmuir.5b03559
Vancouver
Coral DF, Mendoza Zelis P, Sanchez FH, Raap MBF van, Marciello M, Puerto Morales M del, Craievich AF. Effect of nanoclustering and dipolar interactions in heat generation for magnetic hyperthermia [Internet]. LANGMUIR. 2016 ; fe2016( 5): 1201-1213.[citado 2024 maio 25 ] Available from: http://pubs.acs.org/doi/abs/10.1021/acs.langmuir.5b03559
Artigo de periodico
(1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique (2016)
Burgi, Juan; Garcia Molleja, Javier; Bolmaro, Raul; Piccoli, Mattia; Bemporad, Edoardo; Feugeas, Jorge; Craievich, Aldo Felix
Source: EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. Unidade: IF
Subjects: RAIOS X, SILÍCIO
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ABNT
BURGI, Juan et al. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, v. 74, n. 1, p. 10301, 2016Tradução . . Disponível em: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html. Acesso em: 25 maio 2024.
APA
Burgi, J., Garcia Molleja, J., Bolmaro, R., Piccoli, M., Bemporad, E., Feugeas, J., & Craievich, A. F. (2016). (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 74( 1), 10301. doi:10.1051/epjap/2016150446
NLM
Burgi J, Garcia Molleja J, Bolmaro R, Piccoli M, Bemporad E, Feugeas J, Craievich AF. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique [Internet]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. 2016 ; 74( 1): 10301.[citado 2024 maio 25 ] Available from: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html
Vancouver
Burgi J, Garcia Molleja J, Bolmaro R, Piccoli M, Bemporad E, Feugeas J, Craievich AF. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique [Internet]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. 2016 ; 74( 1): 10301.[citado 2024 maio 25 ] Available from: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html

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