On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films (2021)
- Autores:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- DOI: 10.1016/j.jmrt.2021.06.090
- Assuntos: FILMES FINOS; TITÂNIO; ESPECTROSCOPIA RAMAN
- Palavras-chave do autor: Titanium oxynitride (TixOyNz); Raman scattering; XPS spectroscopy
- Agências de fomento:
- Idioma: Inglês
- Imprenta:
- Local: Rio de Janeiro
- Data de publicação: 2021
- Fonte:
- Título: Journal of Materials Research and Technology
- ISSN: 2238-7854
- Volume/Número/Paginação/Ano: v. 14, p. 864-870, Sept.-Oct. 2021
- Este periódico é de acesso aberto
- Este artigo é de acesso aberto
- URL de acesso aberto
- Cor do Acesso Aberto: gold
- Licença: cc-by-nc-nd
-
ABNT
ZANATTA, Antonio Ricardo et al. On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films. Journal of Materials Research and Technology, v. 14, p. 864-870, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.jmrt.2021.06.090. Acesso em: 01 out. 2024. -
APA
Zanatta, A. R., Cemin, F., Echeverrigaray, F. G., & Alvarez, F. (2021). On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films. Journal of Materials Research and Technology, 14, 864-870. doi:10.1016/j.jmrt.2021.06.090 -
NLM
Zanatta AR, Cemin F, Echeverrigaray FG, Alvarez F. On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films [Internet]. Journal of Materials Research and Technology. 2021 ; 14 864-870.[citado 2024 out. 01 ] Available from: https://doi.org/10.1016/j.jmrt.2021.06.090 -
Vancouver
Zanatta AR, Cemin F, Echeverrigaray FG, Alvarez F. On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films [Internet]. Journal of Materials Research and Technology. 2021 ; 14 864-870.[citado 2024 out. 01 ] Available from: https://doi.org/10.1016/j.jmrt.2021.06.090 - Influence of the substrate on the growth of Co3O4 films deposited by reactive DC magnetron sputtering
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Informações sobre o DOI: 10.1016/j.jmrt.2021.06.090 (Fonte: oaDOI API)
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