Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films

Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films (2006)

Authors:
USP affiliated authors: ZANATTA, ANTONIO RICARDO - IFSC
Unidades: IFSC
DOI: 10.1063/1.2362877
Subjects: ESPECTROSCOPIA RAMAN; FILMES FINOS; SILÍCIO; NÍQUEL; TEMPERATURA
Language: Inglês
Imprenta:
- Publisher: American Institute of Physics - AIP
- Place of publication: Melville
- Date published: 2006
Source:
- Título do periódico: Journal of Applied Physics
- ISSN: 0021-8979
- Volume/Número/Paginação/Ano: v. 100, n. 9, p. 094311-1-094311-7, Nov. 2006

Informações sobre o DOI: 10.1063/1.2362877 (Fonte: oaDOI API)

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ABNT

FERRI, Fabio Aparecido; ZANATTA, Antonio Ricardo; CHAMBOULEYRON, I. Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films. Journal of Applied Physics, Melville, American Institute of Physics - AIP, v. No 2006, n. 9, p. 094311-1-094311-7, 2006. DOI: 10.1063/1.2362877.
APA

Ferri, F. A., Zanatta, A. R., & Chambouleyron, I. (2006). Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films. Journal of Applied Physics, No 2006( 9), 094311-1-094311-7. doi:10.1063/1.2362877
NLM

Ferri FA, Zanatta AR, Chambouleyron I. Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films. Journal of Applied Physics. 2006 ; No 2006( 9): 094311-1-094311-7.
Vancouver

Ferri FA, Zanatta AR, Chambouleyron I. Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films. Journal of Applied Physics. 2006 ; No 2006( 9): 094311-1-094311-7.