Improved density of states and effective charge density in SI/PECVD Si/OxNy interface (2008)
Fonte: SBMICRO 2008: Anais. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
ALBERTIN, Katia Franklin e PEREYRA, Inés. Improved density of states and effective charge density in SI/PECVD Si/OxNy interface. 2008, Anais.. Pennington: The Electrochemical Society, 2008. . Acesso em: 15 nov. 2025.APA
Albertin, K. F., & Pereyra, I. (2008). Improved density of states and effective charge density in SI/PECVD Si/OxNy interface. In SBMICRO 2008: Anais. Pennington: The Electrochemical Society.NLM
Albertin KF, Pereyra I. Improved density of states and effective charge density in SI/PECVD Si/OxNy interface. SBMICRO 2008: Anais. 2008 ;[citado 2025 nov. 15 ]Vancouver
Albertin KF, Pereyra I. Improved density of states and effective charge density in SI/PECVD Si/OxNy interface. SBMICRO 2008: Anais. 2008 ;[citado 2025 nov. 15 ]
