Fonte: Proceedings. Nome do evento: International Symposium on Silicon-on-Insulator Technology and Devices. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
SONNENBERG, Victor e MARTINO, João Antonio. Determination of silicon film doping concentration and back interface oxide charge density using SOI-MOS capacitor. 2001, Anais.. Pennington: The Electrochemical Society, 2001. . Acesso em: 16 nov. 2025.APA
Sonnenberg, V., & Martino, J. A. (2001). Determination of silicon film doping concentration and back interface oxide charge density using SOI-MOS capacitor. In Proceedings. Pennington: The Electrochemical Society.NLM
Sonnenberg V, Martino JA. Determination of silicon film doping concentration and back interface oxide charge density using SOI-MOS capacitor. Proceedings. 2001 ;[citado 2025 nov. 16 ]Vancouver
Sonnenberg V, Martino JA. Determination of silicon film doping concentration and back interface oxide charge density using SOI-MOS capacitor. Proceedings. 2001 ;[citado 2025 nov. 16 ]
