PECVD deposited dielectrics for a-Si:H thin film transistors (1996)
Source: Resumos. Conference titles: Seminário Iberoamericano de Tecnologia de Mostradores de Cristal Líquido. Unidade: EP
Assunto: CRISTAIS LÍQUIDOS
ABNT
SASSAKI, Carlos Alberto et al. PECVD deposited dielectrics for a-Si:H thin film transistors. 1996, Anais.. Campinas: IM/CTI, 1996. . Acesso em: 16 out. 2024.APA
Sassaki, C. A., Andrade, A. M. de, Fonseca, F. J., Abade, K. A., Dirani, E. A. T., & Sanematsu, M. S. (1996). PECVD deposited dielectrics for a-Si:H thin film transistors. In Resumos. Campinas: IM/CTI.NLM
Sassaki CA, Andrade AM de, Fonseca FJ, Abade KA, Dirani EAT, Sanematsu MS. PECVD deposited dielectrics for a-Si:H thin film transistors. Resumos. 1996 ;[citado 2024 out. 16 ]Vancouver
Sassaki CA, Andrade AM de, Fonseca FJ, Abade KA, Dirani EAT, Sanematsu MS. PECVD deposited dielectrics for a-Si:H thin film transistors. Resumos. 1996 ;[citado 2024 out. 16 ]