Source: Final Program. Conference titles: Encontro da Sociedade Brasileira de Pesquisas em Materiais (SBPMat. Unidade: EP
Subjects: FILMES FINOS, RESISTÊNCIA DOS MATERIAIS, PROPRIEDADES DOS MATERIAIS
ABNT
RECCO, Abel André Cândido et al. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy. 2006, Anais.. Rio de Janeiro: SBPMat, 2006. Disponível em: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf. Acesso em: 17 out. 2024.APA
Recco, A. A. C., Kunioshi, C. T., Moré Farías, M. C., Oliveira, I. C., Maciel, H. S., Souza, R. M. de, & Tschiptschin, A. P. (2006). Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy. In Final Program. Rio de Janeiro: SBPMat. Recuperado de https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdfNLM
Recco AAC, Kunioshi CT, Moré Farías MC, Oliveira IC, Maciel HS, Souza RM de, Tschiptschin AP. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy [Internet]. Final Program. 2006 ;[citado 2024 out. 17 ] Available from: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdfVancouver
Recco AAC, Kunioshi CT, Moré Farías MC, Oliveira IC, Maciel HS, Souza RM de, Tschiptschin AP. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy [Internet]. Final Program. 2006 ;[citado 2024 out. 17 ] Available from: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf