Dry etching of resist for three level resist process using statistical design of experiments (1995)
Source: Proceedings. Conference titles: Congress of the Brazilian Microelectronics Society. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Dry etching of resist for three level resist process using statistical design of experiments. 1995, Anais.. Porto Alegre: Instituto de Informatica da Ufrgs, 1995. . Acesso em: 16 jul. 2024.APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1995). Dry etching of resist for three level resist process using statistical design of experiments. In Proceedings. Porto Alegre: Instituto de Informatica da Ufrgs.NLM
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2024 jul. 16 ]Vancouver
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2024 jul. 16 ]