Source: Journal of Non-Crystalline Solids. Unidades: IF, EP
Subjects: MATÉRIA CONDENSADA (PROPRIEDADES MECÂNICAS), MATERIAIS, MATERIAIS, SEMICONDUTORES
ABNT
SCOPEL, Wanderla Luis et al. Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition. Journal of Non-Crystalline Solids, v. 288, n. 1-3, p. 88-95, 2001Tradução . . Disponível em: https://doi.org/10.1016/s0022-3093(01)00608-1. Acesso em: 08 out. 2024.APA
Scopel, W. L., Cuzinatto, R. R., Tabacniks, M. H., Fantini, M. C. de A., Alayo Chávez, M. I., & Pereyra, I. (2001). Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition. Journal of Non-Crystalline Solids, 288( 1-3), 88-95. doi:10.1016/s0022-3093(01)00608-1NLM
Scopel WL, Cuzinatto RR, Tabacniks MH, Fantini MC de A, Alayo Chávez MI, Pereyra I. Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition [Internet]. Journal of Non-Crystalline Solids. 2001 ; 288( 1-3): 88-95.[citado 2024 out. 08 ] Available from: https://doi.org/10.1016/s0022-3093(01)00608-1Vancouver
Scopel WL, Cuzinatto RR, Tabacniks MH, Fantini MC de A, Alayo Chávez MI, Pereyra I. Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition [Internet]. Journal of Non-Crystalline Solids. 2001 ; 288( 1-3): 88-95.[citado 2024 out. 08 ] Available from: https://doi.org/10.1016/s0022-3093(01)00608-1