ReP USP - Resultado da busca

Artigo de periodico
Backside contact effect on the morphological and optical features of porous silicon photonic crystals (2009)
Huanca, Danilo Roque ; Raimundo, Daniel Scodeler; Salcedo, Walter Jaimes
Fonte: Microelectronics Journal. Unidade: EP
Assuntos: NANOTECNOLOGIA, MICROELETRÔNICA, ELETROQUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
HUANCA, Danilo Roque e RAIMUNDO, Daniel Scodeler e SALCEDO, Walter Jaimes. Backside contact effect on the morphological and optical features of porous silicon photonic crystals. Microelectronics Journal, v. 40, n. 4-5, p. 744-748, 2009Tradução . . Disponível em: https://doi.org/10.1016/j.mejo.2008.11.005. Acesso em: 06 set. 2024.
APA
Huanca, D. R., Raimundo, D. S., & Salcedo, W. J. (2009). Backside contact effect on the morphological and optical features of porous silicon photonic crystals. Microelectronics Journal, 40( 4-5), 744-748. doi:10.1016/j.mejo.2008.11.005
NLM
Huanca DR, Raimundo DS, Salcedo WJ. Backside contact effect on the morphological and optical features of porous silicon photonic crystals [Internet]. Microelectronics Journal. 2009 ; 40( 4-5): 744-748.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/j.mejo.2008.11.005
Vancouver
Huanca DR, Raimundo DS, Salcedo WJ. Backside contact effect on the morphological and optical features of porous silicon photonic crystals [Internet]. Microelectronics Journal. 2009 ; 40( 4-5): 744-748.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/j.mejo.2008.11.005
Artigo de periodico
Anodic porous alumina structural characteristics study based on SEM image processing and analysis (2009)
Raimundo, Daniel Scodeler; Calíope, Priscila Braga; Huanca, Danilo Roque ; Salcedo, Walter Jaimes
Fonte: Microelectronics Journal. Unidade: EP
Assuntos: NANOTECNOLOGIA, MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RAIMUNDO, Daniel Scodeler et al. Anodic porous alumina structural characteristics study based on SEM image processing and analysis. Microelectronics Journal, v. 40, n. 4-5, p. 844-847, 2009Tradução . . Disponível em: https://doi.org/10.1016/j.mejo.2008.11.024. Acesso em: 06 set. 2024.
APA
Raimundo, D. S., Calíope, P. B., Huanca, D. R., & Salcedo, W. J. (2009). Anodic porous alumina structural characteristics study based on SEM image processing and analysis. Microelectronics Journal, 40( 4-5), 844-847. doi:10.1016/j.mejo.2008.11.024
NLM
Raimundo DS, Calíope PB, Huanca DR, Salcedo WJ. Anodic porous alumina structural characteristics study based on SEM image processing and analysis [Internet]. Microelectronics Journal. 2009 ; 40( 4-5): 844-847.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/j.mejo.2008.11.024
Vancouver
Raimundo DS, Calíope PB, Huanca DR, Salcedo WJ. Anodic porous alumina structural characteristics study based on SEM image processing and analysis [Internet]. Microelectronics Journal. 2009 ; 40( 4-5): 844-847.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/j.mejo.2008.11.024
Trabalho de evento
Comparison between drain induced barrier lowering in partially and fully depleted 0.13'mu'm SOI nMOSFETs in low temperature operation (2004)
Pavanello, Marcelo Antonio ; Martino, João Antonio ; Simoen, Eddy ; Claeys, Cor
Fonte: Proceedings. Nome do evento: European Workshop on Low Temperature Electronics. Unidade: EP
Assunto: MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PAVANELLO, Marcelo Antonio et al. Comparison between drain induced barrier lowering in partially and fully depleted 0.13'mu'm SOI nMOSFETs in low temperature operation. 2004, Anais.. Noordwijk: Escola Politécnica, Universidade de São Paulo, 2004. . Acesso em: 06 set. 2024.
APA
Pavanello, M. A., Martino, J. A., Simoen, E., & Claeys, C. (2004). Comparison between drain induced barrier lowering in partially and fully depleted 0.13'mu'm SOI nMOSFETs in low temperature operation. In Proceedings. Noordwijk: Escola Politécnica, Universidade de São Paulo.
NLM
Pavanello MA, Martino JA, Simoen E, Claeys C. Comparison between drain induced barrier lowering in partially and fully depleted 0.13'mu'm SOI nMOSFETs in low temperature operation. Proceedings. 2004 ;[citado 2024 set. 06 ]
Vancouver
Pavanello MA, Martino JA, Simoen E, Claeys C. Comparison between drain induced barrier lowering in partially and fully depleted 0.13'mu'm SOI nMOSFETs in low temperature operation. Proceedings. 2004 ;[citado 2024 set. 06 ]
Artigo de periodico
Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77k (1997)
Pavanello, Marcelo Antonio ; Martino, João Antonio ; Colinge, Jean-Pierre
Fonte: Microelectronic Engineering. Unidade: EP
Assunto: MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PAVANELLO, Marcelo Antonio e MARTINO, João Antonio e COLINGE, Jean-Pierre. Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77k. Microelectronic Engineering, v. 36, n. 1-4, p. 375-378, 1997Tradução . . Disponível em: https://doi.org/10.1016/s0167-9317(97)00083-x. Acesso em: 06 set. 2024.
APA
Pavanello, M. A., Martino, J. A., & Colinge, J. -P. (1997). Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77k. Microelectronic Engineering, 36( 1-4), 375-378. doi:10.1016/s0167-9317(97)00083-x
NLM
Pavanello MA, Martino JA, Colinge J-P. Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77k [Internet]. Microelectronic Engineering. 1997 ; 36( 1-4): 375-378.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/s0167-9317(97)00083-x
Vancouver
Pavanello MA, Martino JA, Colinge J-P. Analytical modeling of the substrate effect on accumulation-mode SOI pMOSFETs at room temperature and at 77k [Internet]. Microelectronic Engineering. 1997 ; 36( 1-4): 375-378.[citado 2024 set. 06 ] Available from: https://doi.org/10.1016/s0167-9317(97)00083-x

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