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Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool (2016)
Rodrigues, Cleber Lima; Rizzutto, Marcia de Almeida; Silva, Tiago Fiorini da; Mayer, B M; Added, Nemitala; Rizzutto, Marcia de Almeida; Tabacniks, Manfredo Harri
Source: Posters - Resumo. Conference titles: Encontro de Física. Unidade: IF
Subjects: FÍSICA DA MATÉRIA CONDENSADA, INSTRUMENTAÇÃO (FÍSICA), ANÁLISE DE DADOS, SOFTWARES, DETETORES, FEIXES, ESPALHAMENTO
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ABNT
RODRIGUES, Cleber Lima et al. Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool. 2016, Anais.. São Paulo: SBF, 2016. Disponível em: http://www1.sbfisica.org.br/eventos/enf/2016/sys/resumos/R1935-1.pdf. Acesso em: 13 nov. 2024.
APA
Rodrigues, C. L., Rizzutto, M. de A., Silva, T. F. da, Mayer, B. M., Added, N., Rizzutto, M. de A., & Tabacniks, M. H. (2016). Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool. In Posters - Resumo. São Paulo: SBF. Recuperado de http://www1.sbfisica.org.br/eventos/enf/2016/sys/resumos/R1935-1.pdf
NLM
Rodrigues CL, Rizzutto M de A, Silva TF da, Mayer BM, Added N, Rizzutto M de A, Tabacniks MH. Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool [Internet]. Posters - Resumo. 2016 ;[citado 2024 nov. 13 ] Available from: http://www1.sbfisica.org.br/eventos/enf/2016/sys/resumos/R1935-1.pdf
Vancouver
Rodrigues CL, Rizzutto M de A, Silva TF da, Mayer BM, Added N, Rizzutto M de A, Tabacniks MH. Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool [Internet]. Posters - Resumo. 2016 ;[citado 2024 nov. 13 ] Available from: http://www1.sbfisica.org.br/eventos/enf/2016/sys/resumos/R1935-1.pdf
Artigo de periodico
Characterization of etched ion tracks in CR39 and makrofol (2007)
Delgado, A O; Rizzutto, Marcia de Almeida; Lima, A R; Silva, A A R da; Carmignotto, Marco Antonio Pannunzio ; Tabacniks, Manfredo Harri ; Added, Nemitala
Source: Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms. Unidade: IF
Assunto: ANÁLISE DE DADOS
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ABNT
DELGADO, A O et al. Characterization of etched ion tracks in CR39 and makrofol. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms, v. 257, n. 1-2, p. 536-540, 2007Tradução . . Disponível em: https://doi.org/10.1016/j.nimb.2007.01.109. Acesso em: 13 nov. 2024.
APA
Delgado, A. O., Rizzutto, M. de A., Lima, A. R., Silva, A. A. R. da, Carmignotto, M. A. P., Tabacniks, M. H., & Added, N. (2007). Characterization of etched ion tracks in CR39 and makrofol. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms, 257( 1-2), 536-540. doi:10.1016/j.nimb.2007.01.109
NLM
Delgado AO, Rizzutto M de A, Lima AR, Silva AAR da, Carmignotto MAP, Tabacniks MH, Added N. Characterization of etched ion tracks in CR39 and makrofol [Internet]. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms. 2007 ; 257( 1-2): 536-540.[citado 2024 nov. 13 ] Available from: https://doi.org/10.1016/j.nimb.2007.01.109
Vancouver
Delgado AO, Rizzutto M de A, Lima AR, Silva AAR da, Carmignotto MAP, Tabacniks MH, Added N. Characterization of etched ion tracks in CR39 and makrofol [Internet]. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms. 2007 ; 257( 1-2): 536-540.[citado 2024 nov. 13 ] Available from: https://doi.org/10.1016/j.nimb.2007.01.109
Artigo de periodico
X-ray production yield in standardized thick target PIXE (2006)
Aburaya, Jim Heiji; Added, Nemitala; Tabacniks, Manfredo Harri ; Rizzutto, Marcia de Almeida; Barbosa, Marcel Dupret Lopes
Source: Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions With Materials and Atoms. Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, ANÁLISE DE DADOS, ESPECTROMETRIA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
ABURAYA, Jim Heiji et al. X-ray production yield in standardized thick target PIXE. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions With Materials and Atoms, v. 249, n. 1-2, p. 792-795, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.nimb.2006.03.141. Acesso em: 13 nov. 2024.
APA
Aburaya, J. H., Added, N., Tabacniks, M. H., Rizzutto, M. de A., & Barbosa, M. D. L. (2006). X-ray production yield in standardized thick target PIXE. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions With Materials and Atoms, 249( 1-2), 792-795. doi:10.1016/j.nimb.2006.03.141
NLM
Aburaya JH, Added N, Tabacniks MH, Rizzutto M de A, Barbosa MDL. X-ray production yield in standardized thick target PIXE [Internet]. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions With Materials and Atoms. 2006 ; 249( 1-2): 792-795.[citado 2024 nov. 13 ] Available from: https://doi.org/10.1016/j.nimb.2006.03.141
Vancouver
Aburaya JH, Added N, Tabacniks MH, Rizzutto M de A, Barbosa MDL. X-ray production yield in standardized thick target PIXE [Internet]. Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions With Materials and Atoms. 2006 ; 249( 1-2): 792-795.[citado 2024 nov. 13 ] Available from: https://doi.org/10.1016/j.nimb.2006.03.141

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