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Artigo de periodico
Characterization of diamond replicas microfabricated silicon molds (2004)
Martins, D R; Salvadori, Maria Cecília Barbosa da Silveira; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Metastable and Nanocrystalline Materials. Unidade: IF
Subjects: DIAMANTE, MATERIAIS NANOESTRUTURADOS, NANOTECNOLOGIA
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ABNT
MARTINS, D R et al. Characterization of diamond replicas microfabricated silicon molds. Journal of Metastable and Nanocrystalline Materials, 2004Tradução . . Disponível em: http://publica-sbi.if.usp.br/PDFs/pd002.pdf. Acesso em: 26 ago. 2024.
APA
Martins, D. R., Salvadori, M. C. B. da S., Mansano, R. D., & Verdonck, P. B. (2004). Characterization of diamond replicas microfabricated silicon molds. Journal of Metastable and Nanocrystalline Materials. Recuperado de http://publica-sbi.if.usp.br/PDFs/pd002.pdf
NLM
Martins DR, Salvadori MCB da S, Mansano RD, Verdonck PB. Characterization of diamond replicas microfabricated silicon molds [Internet]. Journal of Metastable and Nanocrystalline Materials. 2004 ;[citado 2024 ago. 26 ] Available from: http://publica-sbi.if.usp.br/PDFs/pd002.pdf
Vancouver
Martins DR, Salvadori MCB da S, Mansano RD, Verdonck PB. Characterization of diamond replicas microfabricated silicon molds [Internet]. Journal of Metastable and Nanocrystalline Materials. 2004 ;[citado 2024 ago. 26 ] Available from: http://publica-sbi.if.usp.br/PDFs/pd002.pdf
Artigo de periodico
Light element analysis using ERDA method with an ionization chamber (2001)
Added, Nemitala; Chubaci, Jose Fernando Diniz; Matsuoka, Masao; Castro, R A; Radtke, M; Alonso, E; Liguori Neto, Raphael; Rizzutto, Marcia de Almeida; Tabacniks, Manfredo Harri ; Mansano, Ronaldo Domingues
Source: Nuclear Instruments and Methods in Physics Research B. Unidade: IF
Subjects: DETECÇÃO DE PARTÍCULAS, ÍONS, FEIXES, ELASTICIDADE, FILMES FINOS, ESPECTROSCOPIA DE RAIO X
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ABNT
ADDED, Nemitala et al. Light element analysis using ERDA method with an ionization chamber. Nuclear Instruments and Methods in Physics Research B, v. 175, p. 787-790, 2001Tradução . . Disponível em: https://doi.org/10.1016/s0168-583x(00)00604-2. Acesso em: 26 ago. 2024.
APA
Added, N., Chubaci, J. F. D., Matsuoka, M., Castro, R. A., Radtke, M., Alonso, E., et al. (2001). Light element analysis using ERDA method with an ionization chamber. Nuclear Instruments and Methods in Physics Research B, 175, 787-790. doi:10.1016/s0168-583x(00)00604-2
NLM
Added N, Chubaci JFD, Matsuoka M, Castro RA, Radtke M, Alonso E, Liguori Neto R, Rizzutto M de A, Tabacniks MH, Mansano RD. Light element analysis using ERDA method with an ionization chamber [Internet]. Nuclear Instruments and Methods in Physics Research B. 2001 ; 175 787-790.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0168-583x(00)00604-2
Vancouver
Added N, Chubaci JFD, Matsuoka M, Castro RA, Radtke M, Alonso E, Liguori Neto R, Rizzutto M de A, Tabacniks MH, Mansano RD. Light element analysis using ERDA method with an ionization chamber [Internet]. Nuclear Instruments and Methods in Physics Research B. 2001 ; 175 787-790.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0168-583x(00)00604-2
Artigo de periodico
Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle (2001)
Gonçalves Neto, Luiz; Roberto, Luciana Brassolatti; Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Cirino, Giuseppe Antonio; Stefani, Mario Antonio
Source: Applied Optics. Unidades: EESC, EP
Assunto: ÓPTICA
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ABNT
GONÇALVES NETO, Luiz et al. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle. Applied Optics, v. 40, n. Ja 2001, p. 211-218, 2001Tradução . . Disponível em: https://doi.org/10.1364/ao.40.000211. Acesso em: 26 ago. 2024.
APA
Gonçalves Neto, L., Roberto, L. B., Verdonck, P. B., Mansano, R. D., Cirino, G. A., & Stefani, M. A. (2001). Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle. Applied Optics, 40( Ja 2001), 211-218. doi:10.1364/ao.40.000211
NLM
Gonçalves Neto L, Roberto LB, Verdonck PB, Mansano RD, Cirino GA, Stefani MA. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle [Internet]. Applied Optics. 2001 ; 40( Ja 2001): 211-218.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1364/ao.40.000211
Vancouver
Gonçalves Neto L, Roberto LB, Verdonck PB, Mansano RD, Cirino GA, Stefani MA. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle [Internet]. Applied Optics. 2001 ; 40( Ja 2001): 211-218.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1364/ao.40.000211
Artigo de periodico
Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering (2000)
Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Nogueira, P. M.; Maciel, H. S.; Otani, Choyu
Source: Thin Solid Films. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, n. 373, p. 243-246, 2000Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(00)01088-9. Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Massi, M., Zambom, L. da S., Verdonck, P. B., Nogueira, P. M., Maciel, H. S., & Otani, C. (2000). Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, ( 373), 243-246. doi:10.1016/s0040-6090(00)01088-9
NLM
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Vancouver
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Artigo de periodico
Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures (1996)
Verdonck, Patrick Bernard; Hasenack, Claus Martin; Mansano, Ronaldo Domingues
Source: Journal of Vacuum Science and Technology B. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
VERDONCK, Patrick Bernard e HASENACK, Claus Martin e MANSANO, Ronaldo Domingues. Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures. Journal of Vacuum Science and Technology B, v. 14, n. 1 , p. 538-42, 1996Tradução . . Disponível em: https://doi.org/10.1116/1.588426. Acesso em: 26 ago. 2024.
APA
Verdonck, P. B., Hasenack, C. M., & Mansano, R. D. (1996). Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures. Journal of Vacuum Science and Technology B, 14( 1 ), 538-42. doi:10.1116/1.588426
NLM
Verdonck PB, Hasenack CM, Mansano RD. Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures [Internet]. Journal of Vacuum Science and Technology B. 1996 ;14( 1 ): 538-42.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1116/1.588426
Vancouver
Verdonck PB, Hasenack CM, Mansano RD. Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures [Internet]. Journal of Vacuum Science and Technology B. 1996 ;14( 1 ): 538-42.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1116/1.588426
Artigo de periodico
Deep trench etching in silicon with fluorine containing plasmas (1996)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, H. S.
Source: Applied Surface Science. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Deep trench etching in silicon with fluorine containing plasmas. Applied Surface Science, v. 100-1, p. 583-6, 1996Tradução . . Disponível em: https://doi.org/10.1016/0169-4332(96)00343-1. Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1996). Deep trench etching in silicon with fluorine containing plasmas. Applied Surface Science, 100-1, 583-6. doi:10.1016/0169-4332(96)00343-1
NLM
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Applied Surface Science. 1996 ;100-1 583-6.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/0169-4332(96)00343-1
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Applied Surface Science. 1996 ;100-1 583-6.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/0169-4332(96)00343-1

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