Development and characterization of 'SI IND.3''N IND.4' plasma etching processes (1995)
Source: Proceedings. Conference titles: Congress of the Brazilian Microelectronics Society. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
DIETRICH, Alvaro Batista e VERDONCK, Patrick Bernard e MANSANO, Ronaldo Domingues. Development and characterization of 'SI IND.3''N IND.4' plasma etching processes. 1995, Anais.. Porto Alegre: Instituto de Informatica da Ufrgs, 1995. . Acesso em: 03 out. 2024.APA
Dietrich, A. B., Verdonck, P. B., & Mansano, R. D. (1995). Development and characterization of 'SI IND.3''N IND.4' plasma etching processes. In Proceedings. Porto Alegre: Instituto de Informatica da Ufrgs.NLM
Dietrich AB, Verdonck PB, Mansano RD. Development and characterization of 'SI IND.3''N IND.4' plasma etching processes. Proceedings. 1995 ;[citado 2024 out. 03 ]Vancouver
Dietrich AB, Verdonck PB, Mansano RD. Development and characterization of 'SI IND.3''N IND.4' plasma etching processes. Proceedings. 1995 ;[citado 2024 out. 03 ]