Massi, Marcos; Mansano, Ronaldo Domingues 
; Maciel, Homero Santiago; Verdonck, Patrick Bernard
Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Subjects: CIRCUITOS INTEGRADOS, SEMICONDUTORES
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ABNT
MASSI, Marcos et al. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 26 ago. 2024.APA
Massi, M., Mansano, R. D., Maciel, H. S., & Verdonck, P. B. (1997). Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI.NLM
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]Vancouver
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]
