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Artigo de periodico
Diffraction gratings fabricated in DLC thin films (2010)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Jasinevicius, Renato Goulart; Gonçalves Neto, Luiz
Source: Surface and Coatings Technology. Unidades: EP, EESC
Subjects: HOLOGRAMAS, ANÁLISE DE FOURIER, ÓPTICA
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ABNT
CIRINO, Giuseppe Antonio et al. Diffraction gratings fabricated in DLC thin films. Surface and Coatings Technology, v. 204, n. 18-19, p. 2966-2970, 2010Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2010.02.037. Acesso em: 05 nov. 2024.
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Jasinevicius, R. G., & Gonçalves Neto, L. (2010). Diffraction gratings fabricated in DLC thin films. Surface and Coatings Technology, 204( 18-19), 2966-2970. doi:10.1016/j.surfcoat.2010.02.037
NLM
Cirino GA, Mansano RD, Verdonck PB, Jasinevicius RG, Gonçalves Neto L. Diffraction gratings fabricated in DLC thin films [Internet]. Surface and Coatings Technology. 2010 ; 204( 18-19): 2966-2970.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.surfcoat.2010.02.037
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Jasinevicius RG, Gonçalves Neto L. Diffraction gratings fabricated in DLC thin films [Internet]. Surface and Coatings Technology. 2010 ; 204( 18-19): 2966-2970.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.surfcoat.2010.02.037
Artigo de periodico
Physical characterization of plasma deposited polymeric proton exchange membrane used in fuel cells (2010)
Polak, Peter Lubomir; Mansano, Ronaldo Domingues ; Silva, Rui Alberto; Silva, Igor Proença; Ribeiro, Maria Cristina
Source: Materials science forum. Unidade: EP
Subjects: CÉLULAS A COMBUSTÍVEL, PLASMA
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ABNT
POLAK, Peter Lubomir et al. Physical characterization of plasma deposited polymeric proton exchange membrane used in fuel cells. Materials science forum, v. 638-642, p. 1158-1163, 2010Tradução . . Disponível em: https://doi.org/10.4028/www.scientific.net/MSF.638-642.1158. Acesso em: 05 nov. 2024.
APA
Polak, P. L., Mansano, R. D., Silva, R. A., Silva, I. P., & Ribeiro, M. C. (2010). Physical characterization of plasma deposited polymeric proton exchange membrane used in fuel cells. Materials science forum, 638-642, 1158-1163. doi:10.4028/www.scientific.net/MSF.638-642.1158
NLM
Polak PL, Mansano RD, Silva RA, Silva IP, Ribeiro MC. Physical characterization of plasma deposited polymeric proton exchange membrane used in fuel cells [Internet]. Materials science forum. 2010 ;638-642 1158-1163.[citado 2024 nov. 05 ] Available from: https://doi.org/10.4028/www.scientific.net/MSF.638-642.1158
Vancouver
Polak PL, Mansano RD, Silva RA, Silva IP, Ribeiro MC. Physical characterization of plasma deposited polymeric proton exchange membrane used in fuel cells [Internet]. Materials science forum. 2010 ;638-642 1158-1163.[citado 2024 nov. 05 ] Available from: https://doi.org/10.4028/www.scientific.net/MSF.638-642.1158
Artigo de periodico
Characterization of diamond replicas microfabricated silicon molds (2004)
Martins, D R; Salvadori, Maria Cecília Barbosa da Silveira; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Metastable and Nanocrystalline Materials. Unidade: IF
Subjects: DIAMANTE, MATERIAIS NANOESTRUTURADOS, NANOTECNOLOGIA
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ABNT
MARTINS, D R et al. Characterization of diamond replicas microfabricated silicon molds. Journal of Metastable and Nanocrystalline Materials, 2004Tradução . . Disponível em: http://publica-sbi.if.usp.br/PDFs/pd002.pdf. Acesso em: 05 nov. 2024.
APA
Martins, D. R., Salvadori, M. C. B. da S., Mansano, R. D., & Verdonck, P. B. (2004). Characterization of diamond replicas microfabricated silicon molds. Journal of Metastable and Nanocrystalline Materials. Recuperado de http://publica-sbi.if.usp.br/PDFs/pd002.pdf
NLM
Martins DR, Salvadori MCB da S, Mansano RD, Verdonck PB. Characterization of diamond replicas microfabricated silicon molds [Internet]. Journal of Metastable and Nanocrystalline Materials. 2004 ;[citado 2024 nov. 05 ] Available from: http://publica-sbi.if.usp.br/PDFs/pd002.pdf
Vancouver
Martins DR, Salvadori MCB da S, Mansano RD, Verdonck PB. Characterization of diamond replicas microfabricated silicon molds [Internet]. Journal of Metastable and Nanocrystalline Materials. 2004 ;[citado 2024 nov. 05 ] Available from: http://publica-sbi.if.usp.br/PDFs/pd002.pdf
Artigo de periodico
LPCVD deposition of silicon nitride assisted by high density plasmas (1999)
Zambom, Luís da Silva ; Mansano, Ronaldo Domingues ; Furlan, Rogério ; Verdonck, Patrick Bernard
Source: Thin Solid Films. Unidade: EP
Assunto: FILMES FINOS
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ABNT
ZAMBOM, Luís da Silva et al. LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, v. 343-344, p. 299-301, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01587-9. Acesso em: 05 nov. 2024.
APA
Zambom, L. da S., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1999). LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, 343-344, 299-301. doi:10.1016/s0040-6090(98)01587-9
NLM
Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9
Vancouver
Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9
Artigo de periodico
Anisotropic reactive ion etching in silicon, using a graphite electrode (1998)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Sensors and Actuators A. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, v. 65, n. 2-3, p. 180-186, 1998Tradução . . Disponível em: https://doi.org/10.1016/s0924-4247(97)01681-6. Acesso em: 05 nov. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1998). Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, 65( 2-3), 180-186. doi:10.1016/s0924-4247(97)01681-6
NLM
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6

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