Source: Resumos. Conference titles: Congresso Brasileiro de Aplicacoes de Vacuo Na Industria e Na Ciencia. Unidade: EP
Assunto: VÁCUO
ABNT
BOTTECCHIA, J P e ANDRADE, Adnei Melges de. Building of a PECVD reactor: details of the architecture and its influence on the characteristics of the a-Si:H films. 1995, Anais.. Brasília: Sbv/Unicamp/Unb, 1995. . Acesso em: 02 maio 2026.APA
Bottecchia, J. P., & Andrade, A. M. de. (1995). Building of a PECVD reactor: details of the architecture and its influence on the characteristics of the a-Si:H films. In Resumos. Brasília: Sbv/Unicamp/Unb.NLM
Bottecchia JP, Andrade AM de. Building of a PECVD reactor: details of the architecture and its influence on the characteristics of the a-Si:H films. Resumos. 1995 ;[citado 2026 maio 02 ]Vancouver
Bottecchia JP, Andrade AM de. Building of a PECVD reactor: details of the architecture and its influence on the characteristics of the a-Si:H films. Resumos. 1995 ;[citado 2026 maio 02 ]
