High density plasma chemical vapor deposition of amorphous carbon films (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues 
Source: Program and Abstracts.. Conference titles: Brazilian Meeting on Plasma Physics. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. High density plasma chemical vapor deposition of amorphous carbon films. 2003, Anais.. São Paulo: SBF, 2003. . Acesso em: 05 maio 2026.APA
Mousinho, A. P., & Mansano, R. D. (2003). High density plasma chemical vapor deposition of amorphous carbon films. In Program and Abstracts.. São Paulo: SBF.NLM
Mousinho AP, Mansano RD. High density plasma chemical vapor deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2026 maio 05 ]Vancouver
Mousinho AP, Mansano RD. High density plasma chemical vapor deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2026 maio 05 ]
