Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition (2003)
- Authors:
- Autor USP: MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Source:
- Título: Program and Abstracts.
- Conference titles: Brazilian Meeting on Plasma Physics
-
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. 2003, Anais.. São Paulo: SBF, 2003. . Acesso em: 03 out. 2024. -
APA
Mousinho, A. P., & Mansano, R. D. (2003). Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. In Program and Abstracts.. São Paulo: SBF. -
NLM
Mousinho AP, Mansano RD. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. Program and Abstracts. 2003 ;[citado 2024 out. 03 ] -
Vancouver
Mousinho AP, Mansano RD. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. Program and Abstracts. 2003 ;[citado 2024 out. 03 ] - Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering
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