High density plasma chemical vapor deposition of amorphous carbon films (2003)
- Authors:
- Autor USP: MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Source:
- Título: Program and Abstracts.
- Conference titles: Brazilian Meeting on Plasma Physics
-
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. High density plasma chemical vapor deposition of amorphous carbon films. 2003, Anais.. São Paulo: SBF, 2003. . Acesso em: 06 maio 2026. -
APA
Mousinho, A. P., & Mansano, R. D. (2003). High density plasma chemical vapor deposition of amorphous carbon films. In Program and Abstracts.. São Paulo: SBF. -
NLM
Mousinho AP, Mansano RD. High density plasma chemical vapor deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2026 maio 06 ] -
Vancouver
Mousinho AP, Mansano RD. High density plasma chemical vapor deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2026 maio 06 ] - Obtention of polymeric membrane fuel cells by low pressure plasma technique: evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support
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