Mousinho, Ana Paula; Mansano, Ronaldo Domingues 
Source: Program and Abstracts.. Conference titles: Brazilian Meeting on Plasma Physics. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. 2003, Anais.. São Paulo: SBF, 2003. . Acesso em: 24 jan. 2026.APA
Mousinho, A. P., & Mansano, R. D. (2003). Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. In Program and Abstracts.. São Paulo: SBF.NLM
Mousinho AP, Mansano RD. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. Program and Abstracts. 2003 ;[citado 2026 jan. 24 ]Vancouver
Mousinho AP, Mansano RD. Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition. Program and Abstracts. 2003 ;[citado 2026 jan. 24 ]
