Filtros : "1996" "Journal of Solid-State Devices and Circuits" "EP" Removidos: "MATERIAIS CERÂMICOS" "YANAGIHARA, JURANDIR ITIZO" "FEA" Limpar

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  • Source: Journal of Solid-State Devices and Circuits. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
    • ABNT

      BRAGA, Nelson Liebentritt de Almeida e ZASNICOFF, Luiz Sergio. Quantitative analysis of an enhanced diffusion along interfacial misfit dislocations in 'SI' / 'SI' ('GE') heterostructures. Journal of Solid-State Devices and Circuits, v. 4 , n. ja 1996, p. 1-6, 1996Tradução . . Acesso em: 12 nov. 2024.
    • APA

      Braga, N. L. de A., & Zasnicoff, L. S. (1996). Quantitative analysis of an enhanced diffusion along interfacial misfit dislocations in 'SI' / 'SI' ('GE') heterostructures. Journal of Solid-State Devices and Circuits, 4 ( ja 1996), 1-6.
    • NLM

      Braga NL de A, Zasnicoff LS. Quantitative analysis of an enhanced diffusion along interfacial misfit dislocations in 'SI' / 'SI' ('GE') heterostructures. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 1-6.[citado 2024 nov. 12 ]
    • Vancouver

      Braga NL de A, Zasnicoff LS. Quantitative analysis of an enhanced diffusion along interfacial misfit dislocations in 'SI' / 'SI' ('GE') heterostructures. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 1-6.[citado 2024 nov. 12 ]
  • Source: Journal of Solid-State Devices and Circuits. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
    • ABNT

      BELLODI, Marcello e MARTINO, João Antonio e FLANDRE, Denis. New empirical model for leakage drain current of soi mosfets valid from room to high temperatures. Journal of Solid-State Devices and Circuits, v. 4 , n. ja 1996, p. 7-10, 1996Tradução . . Acesso em: 12 nov. 2024.
    • APA

      Bellodi, M., Martino, J. A., & Flandre, D. (1996). New empirical model for leakage drain current of soi mosfets valid from room to high temperatures. Journal of Solid-State Devices and Circuits, 4 ( ja 1996), 7-10.
    • NLM

      Bellodi M, Martino JA, Flandre D. New empirical model for leakage drain current of soi mosfets valid from room to high temperatures. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 7-10.[citado 2024 nov. 12 ]
    • Vancouver

      Bellodi M, Martino JA, Flandre D. New empirical model for leakage drain current of soi mosfets valid from room to high temperatures. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 7-10.[citado 2024 nov. 12 ]
  • Source: Journal of Solid-State Devices and Circuits. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
    • ABNT

      CORRERA, Fatima Salete e ABRAO, T. 2.488 gb / s 1: 4/1:16 demultiplexer : an experience on the design of high-speed digital 'GA''AS' ics. Journal of Solid-State Devices and Circuits, v. 4 , n. ja 1996, p. 24-31, 1996Tradução . . Acesso em: 12 nov. 2024.
    • APA

      Correra, F. S., & Abrao, T. (1996). 2.488 gb / s 1: 4/1:16 demultiplexer : an experience on the design of high-speed digital 'GA''AS' ics. Journal of Solid-State Devices and Circuits, 4 ( ja 1996), 24-31.
    • NLM

      Correra FS, Abrao T. 2.488 gb / s 1: 4/1:16 demultiplexer : an experience on the design of high-speed digital 'GA''AS' ics. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 24-31.[citado 2024 nov. 12 ]
    • Vancouver

      Correra FS, Abrao T. 2.488 gb / s 1: 4/1:16 demultiplexer : an experience on the design of high-speed digital 'GA''AS' ics. Journal of Solid-State Devices and Circuits. 1996 ;4 ( ja 1996): 24-31.[citado 2024 nov. 12 ]

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