Contamination due to memory effects in filtered vacuum arc plasma deposition systems (2002)
Source: Applied Physics Letters. Unidades: IF, EP
Subjects: VÁCUO, FÍSICA DE PLASMAS, FILMES FINOS
ABNT
MARTINS, Deilton Reis et al. Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, v. 81, n. 11, p. 1969-1971, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1506019. Acesso em: 03 maio 2026.APA
Martins, D. R., Salvadori, M. C. B. da S., Verdonck, P. B., & Brown, I. G. (2002). Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, 81( 11), 1969-1971. doi:10.1063/1.1506019NLM
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2026 maio 03 ] Available from: https://doi.org/10.1063/1.1506019Vancouver
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2026 maio 03 ] Available from: https://doi.org/10.1063/1.1506019
