Study of the thermal stability of the al / tiw / tisi2 / si structure (1991)
Furlan, Rogério 
; Van der Spiegel, J; Swart, Jacobus Willibrordus
Source: Journal of the Electrochemical Society. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
FURLAN, Rogério e VAN DER SPIEGEL, J e SWART, Jacobus Willibrordus. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society, v. 138, n. 8 , p. 2377-81, 1991Tradução . . Acesso em: 17 out. 2024.APA
Furlan, R., Van der Spiegel, J., & Swart, J. W. (1991). Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society, 138( 8 ), 2377-81.NLM
Furlan R, Van der Spiegel J, Swart JW. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society. 1991 ;138( 8 ): 2377-81.[citado 2024 out. 17 ]Vancouver
Furlan R, Van der Spiegel J, Swart JW. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society. 1991 ;138( 8 ): 2377-81.[citado 2024 out. 17 ]
