Source: Journal of Non-Crystalline Solids. Unidade: IFSC
Assunto: FÍSICA
ABNT
TADA, M e OHSAKI, H e AEGERTER, Michel André. Structural difference of surface and sub-surface native oxides of evaporated amorphous silicon. Journal of Non-Crystalline Solids, v. 120, n. 1-3, p. 275-82, 1990Tradução . . Disponível em: https://doi.org/10.1016/0022-3093(90)90213-6. Acesso em: 21 out. 2025.APA
Tada, M., Ohsaki, H., & Aegerter, M. A. (1990). Structural difference of surface and sub-surface native oxides of evaporated amorphous silicon. Journal of Non-Crystalline Solids, 120( 1-3), 275-82. doi:10.1016/0022-3093(90)90213-6NLM
Tada M, Ohsaki H, Aegerter MA. Structural difference of surface and sub-surface native oxides of evaporated amorphous silicon [Internet]. Journal of Non-Crystalline Solids. 1990 ;120( 1-3): 275-82.[citado 2025 out. 21 ] Available from: https://doi.org/10.1016/0022-3093(90)90213-6Vancouver
Tada M, Ohsaki H, Aegerter MA. Structural difference of surface and sub-surface native oxides of evaporated amorphous silicon [Internet]. Journal of Non-Crystalline Solids. 1990 ;120( 1-3): 275-82.[citado 2025 out. 21 ] Available from: https://doi.org/10.1016/0022-3093(90)90213-6