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Artigo de periodico
Comparison of adsorbent films obtained by plasma polymerization of oxygenated organic compounds (2008)
Lima, R R; Hernandez, L. F.; Fachini, E.; Demarquette, Nicole Raymonde ; Silva, Maria Lucia Pereira da
Source: Sensors and Actuators B. Unidade: EP
Subjects: PLASMA, POLIMERIZAÇÃO, POLÍMEROS (MATERIAIS)
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ABNT
LIMA, R R et al. Comparison of adsorbent films obtained by plasma polymerization of oxygenated organic compounds. Sensors and Actuators B, n. 1, p. 110-119, 2008Tradução . . Disponível em: https://doi.org/10.1016/j.snb.2007.07.135. Acesso em: 14 out. 2024.
APA
Lima, R. R., Hernandez, L. F., Fachini, E., Demarquette, N. R., & Silva, M. L. P. da. (2008). Comparison of adsorbent films obtained by plasma polymerization of oxygenated organic compounds. Sensors and Actuators B, ( 1), 110-119. doi:10.1016/j.snb.2007.07.135
NLM
Lima RR, Hernandez LF, Fachini E, Demarquette NR, Silva MLP da. Comparison of adsorbent films obtained by plasma polymerization of oxygenated organic compounds [Internet]. Sensors and Actuators B. 2008 ;( 1): 110-119.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2007.07.135
Vancouver
Lima RR, Hernandez LF, Fachini E, Demarquette NR, Silva MLP da. Comparison of adsorbent films obtained by plasma polymerization of oxygenated organic compounds [Internet]. Sensors and Actuators B. 2008 ;( 1): 110-119.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2007.07.135
Artigo de periodico
Production and deposition of adsorbent films by plasma polymerization on low cost micromachined non-planar microchannels for preconcentration of organic compound in air (2005)
Lima, Roberto da Rocha; Carvalho, Rodrigo Amorim Motta; Nascimento Filho, Antonio Pereira do; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde
Source: SENSORS AND ACTUATORS B-CHEMICAL. Unidades: EP, IF
Subjects: POLÍMEROS (MATERIAIS), POLIMERIZAÇÃO, PLASMA
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ABNT
LIMA, Roberto da Rocha et al. Production and deposition of adsorbent films by plasma polymerization on low cost micromachined non-planar microchannels for preconcentration of organic compound in air. SENSORS AND ACTUATORS B-CHEMICAL, v. 108, n. 1-2, p. 435-444, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.snb.2004.11.023. Acesso em: 14 out. 2024.
APA
Lima, R. da R., Carvalho, R. A. M., Nascimento Filho, A. P. do, Silva, M. L. P. da, & Demarquette, N. R. (2005). Production and deposition of adsorbent films by plasma polymerization on low cost micromachined non-planar microchannels for preconcentration of organic compound in air. SENSORS AND ACTUATORS B-CHEMICAL, 108( 1-2), 435-444. doi:10.1016/j.snb.2004.11.023
NLM
Lima R da R, Carvalho RAM, Nascimento Filho AP do, Silva MLP da, Demarquette NR. Production and deposition of adsorbent films by plasma polymerization on low cost micromachined non-planar microchannels for preconcentration of organic compound in air [Internet]. SENSORS AND ACTUATORS B-CHEMICAL. 2005 ; 108( 1-2): 435-444.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.11.023
Vancouver
Lima R da R, Carvalho RAM, Nascimento Filho AP do, Silva MLP da, Demarquette NR. Production and deposition of adsorbent films by plasma polymerization on low cost micromachined non-planar microchannels for preconcentration of organic compound in air [Internet]. SENSORS AND ACTUATORS B-CHEMICAL. 2005 ; 108( 1-2): 435-444.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.11.023
Artigo de periodico
Plasma polymerized TEOS films for nanochannels formation and sensor development (2005)
Carvalho, Rodrigo Amorim Motta; Lima, R R; Nascimento Filho, Antonio Pereira do; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde
Source: SENSORS AND ACTUATORS B-CHEMICAL. Unidade: EP
Subjects: POLÍMEROS (MATERIAIS), PLASMA, POLIMERIZAÇÃO
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ABNT
CARVALHO, Rodrigo Amorim Motta et al. Plasma polymerized TEOS films for nanochannels formation and sensor development. SENSORS AND ACTUATORS B-CHEMICAL, v. 108, n. 1-2, p. 955-963, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.snb.2004.12.117. Acesso em: 14 out. 2024.
APA
Carvalho, R. A. M., Lima, R. R., Nascimento Filho, A. P. do, Silva, M. L. P. da, & Demarquette, N. R. (2005). Plasma polymerized TEOS films for nanochannels formation and sensor development. SENSORS AND ACTUATORS B-CHEMICAL, 108( 1-2), 955-963. doi:10.1016/j.snb.2004.12.117
NLM
Carvalho RAM, Lima RR, Nascimento Filho AP do, Silva MLP da, Demarquette NR. Plasma polymerized TEOS films for nanochannels formation and sensor development [Internet]. SENSORS AND ACTUATORS B-CHEMICAL. 2005 ;108( 1-2): 955-963.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.12.117
Vancouver
Carvalho RAM, Lima RR, Nascimento Filho AP do, Silva MLP da, Demarquette NR. Plasma polymerized TEOS films for nanochannels formation and sensor development [Internet]. SENSORS AND ACTUATORS B-CHEMICAL. 2005 ;108( 1-2): 955-963.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.12.117
Artigo de periodico
Improvement on organic compound adsorption and/or detection by using metallic thin films deposited onto highly rough silicon substrates (2005)
Carvalho, Alexsander Tressino de; Silva, Maria Lucia Pereira da; Nascimento Filho, Antonio Pereira do; Jesus, Dosil Pereira de; Santos Filho, Sebastião Gomes dos
Source: Sensors and Actuators B - Chemical. Unidades: IQ, EP
Subjects: FILMES FINOS, COMPOSTOS ORGÂNICOS
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ABNT
CARVALHO, Alexsander Tressino de et al. Improvement on organic compound adsorption and/or detection by using metallic thin films deposited onto highly rough silicon substrates. Sensors and Actuators B - Chemical, v. 108, n. 1-2, p. 947-954, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.snb.2004.11.065. Acesso em: 14 out. 2024.
APA
Carvalho, A. T. de, Silva, M. L. P. da, Nascimento Filho, A. P. do, Jesus, D. P. de, & Santos Filho, S. G. dos. (2005). Improvement on organic compound adsorption and/or detection by using metallic thin films deposited onto highly rough silicon substrates. Sensors and Actuators B - Chemical, 108( 1-2), 947-954. doi:10.1016/j.snb.2004.11.065
NLM
Carvalho AT de, Silva MLP da, Nascimento Filho AP do, Jesus DP de, Santos Filho SG dos. Improvement on organic compound adsorption and/or detection by using metallic thin films deposited onto highly rough silicon substrates [Internet]. Sensors and Actuators B - Chemical. 2005 ; 108( 1-2): 947-954.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.11.065
Vancouver
Carvalho AT de, Silva MLP da, Nascimento Filho AP do, Jesus DP de, Santos Filho SG dos. Improvement on organic compound adsorption and/or detection by using metallic thin films deposited onto highly rough silicon substrates [Internet]. Sensors and Actuators B - Chemical. 2005 ; 108( 1-2): 947-954.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.snb.2004.11.065
Artigo de periodico
Obtention of selective membranes for water and hydrophobic liquids plasma enhanced chemical vapor deposition on porous substrates (2004)
Bankovic, Predrag; Demarquette, Nicole Raymonde ; Silva, Maria Lucia Pereira da
Source: Materials Science and Engineering B,. Unidade: EP
Subjects: MATERIAIS, PLASMA
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ABNT
BANKOVIC, Predrag e DEMARQUETTE, Nicole Raymonde e SILVA, Maria Lucia Pereira da. Obtention of selective membranes for water and hydrophobic liquids plasma enhanced chemical vapor deposition on porous substrates. Materials Science and Engineering B, v. 112, p. 165-170, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.mseb.2004.05.026. Acesso em: 14 out. 2024.
APA
Bankovic, P., Demarquette, N. R., & Silva, M. L. P. da. (2004). Obtention of selective membranes for water and hydrophobic liquids plasma enhanced chemical vapor deposition on porous substrates. Materials Science and Engineering B,, 112, 165-170. doi:10.1016/j.mseb.2004.05.026
NLM
Bankovic P, Demarquette NR, Silva MLP da. Obtention of selective membranes for water and hydrophobic liquids plasma enhanced chemical vapor deposition on porous substrates [Internet]. Materials Science and Engineering B,. 2004 ; 112 165-170.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.mseb.2004.05.026
Vancouver
Bankovic P, Demarquette NR, Silva MLP da. Obtention of selective membranes for water and hydrophobic liquids plasma enhanced chemical vapor deposition on porous substrates [Internet]. Materials Science and Engineering B,. 2004 ; 112 165-170.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.mseb.2004.05.026
Parte de monografia/livro
Influence of RF frequency on production of adsorbent organic films by PECVD (2003)
Nascimento Filho, Antonio Pereira do; Hamanaka, Cristian Otsuka; Jesus, Dosil Pereira de; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde
Source: Microelectronic Technology and Devices SBMicro 2003. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
NASCIMENTO FILHO, Antonio Pereira do et al. Influence of RF frequency on production of adsorbent organic films by PECVD. Microelectronic Technology and Devices SBMicro 2003. Tradução . Pennington: Electrochemical Society, 2003. . . Acesso em: 14 out. 2024.
APA
Nascimento Filho, A. P. do, Hamanaka, C. O., Jesus, D. P. de, Silva, M. L. P. da, & Demarquette, N. R. (2003). Influence of RF frequency on production of adsorbent organic films by PECVD. In Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society.
NLM
Nascimento Filho AP do, Hamanaka CO, Jesus DP de, Silva MLP da, Demarquette NR. Influence of RF frequency on production of adsorbent organic films by PECVD. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Vancouver
Nascimento Filho AP do, Hamanaka CO, Jesus DP de, Silva MLP da, Demarquette NR. Influence of RF frequency on production of adsorbent organic films by PECVD. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Parte de monografia/livro
Simulations of silicon microstructure for preconcentration of metallic ions (2003)
Silva, José Alberto Fracassi da; Furlan, Rogério ; Simões, Eliphas Wagner; Silva, Maria Lucia Pereira da; Pereira, Marcos Tadeu
Source: Microelectronic Technology and Devices SBMicro 2003. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
SILVA, José Alberto Fracassi da et al. Simulations of silicon microstructure for preconcentration of metallic ions. Microelectronic Technology and Devices SBMicro 2003. Tradução . Pennington: Electrochemical Society, 2003. . Disponível em: https://repositorio.usp.br/directbitstream/c522e842-8ccc-410e-9a47-c4e00003c8a1/pereira-2003-simulations%20of%20silicon%20microstructure.pdf. Acesso em: 14 out. 2024.
APA
Silva, J. A. F. da, Furlan, R., Simões, E. W., Silva, M. L. P. da, & Pereira, M. T. (2003). Simulations of silicon microstructure for preconcentration of metallic ions. In Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society. Recuperado de https://repositorio.usp.br/directbitstream/c522e842-8ccc-410e-9a47-c4e00003c8a1/pereira-2003-simulations%20of%20silicon%20microstructure.pdf
NLM
Silva JAF da, Furlan R, Simões EW, Silva MLP da, Pereira MT. Simulations of silicon microstructure for preconcentration of metallic ions [Internet]. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ] Available from: https://repositorio.usp.br/directbitstream/c522e842-8ccc-410e-9a47-c4e00003c8a1/pereira-2003-simulations%20of%20silicon%20microstructure.pdf
Vancouver
Silva JAF da, Furlan R, Simões EW, Silva MLP da, Pereira MT. Simulations of silicon microstructure for preconcentration of metallic ions [Internet]. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ] Available from: https://repositorio.usp.br/directbitstream/c522e842-8ccc-410e-9a47-c4e00003c8a1/pereira-2003-simulations%20of%20silicon%20microstructure.pdf
Parte de monografia/livro
Characterization of electrospinning process using blends of polyacrylonitrile and carbon particles (2003)
Silva, Ana Neilde Rodrigues da; Furlan, Rogério ; Ramos, I.; Silva, Maria Lucia Pereira da; Fachini, E.; Santiago-Avilés, Jorge Juan
Source: Microelectronic Technology and Devices SBMicro 2003. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Subjects: MICROELETRÔNICA, BLENDAS
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ABNT
SILVA, Ana Neilde Rodrigues da et al. Characterization of electrospinning process using blends of polyacrylonitrile and carbon particles. Microelectronic Technology and Devices SBMicro 2003. Tradução . Pennington: Electrochemical Society, 2003. . . Acesso em: 14 out. 2024.
APA
Silva, A. N. R. da, Furlan, R., Ramos, I., Silva, M. L. P. da, Fachini, E., & Santiago-Avilés, J. J. (2003). Characterization of electrospinning process using blends of polyacrylonitrile and carbon particles. In Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society.
NLM
Silva ANR da, Furlan R, Ramos I, Silva MLP da, Fachini E, Santiago-Avilés JJ. Characterization of electrospinning process using blends of polyacrylonitrile and carbon particles. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Vancouver
Silva ANR da, Furlan R, Ramos I, Silva MLP da, Fachini E, Santiago-Avilés JJ. Characterization of electrospinning process using blends of polyacrylonitrile and carbon particles. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Artigo de periodico
Use of plasma polymerized highly polar organic compound films for sensor development (2003)
Nascimento Filho, Antonio Pereira do; Silva, Maria Lucia Pereira da; Galeazzo, Elisabete ; Demarquette, Nicole Raymonde
Source: Sensors and Actuators B : Chemical. Unidade: EP
Subjects: POLIMERIZAÇÃO, PLASMA
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ABNT
NASCIMENTO FILHO, Antonio Pereira do et al. Use of plasma polymerized highly polar organic compound films for sensor development. Sensors and Actuators B : Chemical, v. 91, n. 1-3, p. 370-377, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0925-4005(03)00111-4. Acesso em: 14 out. 2024.
APA
Nascimento Filho, A. P. do, Silva, M. L. P. da, Galeazzo, E., & Demarquette, N. R. (2003). Use of plasma polymerized highly polar organic compound films for sensor development. Sensors and Actuators B : Chemical, 91( 1-3), 370-377. doi:10.1016/s0925-4005(03)00111-4
NLM
Nascimento Filho AP do, Silva MLP da, Galeazzo E, Demarquette NR. Use of plasma polymerized highly polar organic compound films for sensor development [Internet]. Sensors and Actuators B : Chemical. 2003 ; 91( 1-3): 370-377.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/s0925-4005(03)00111-4
Vancouver
Nascimento Filho AP do, Silva MLP da, Galeazzo E, Demarquette NR. Use of plasma polymerized highly polar organic compound films for sensor development [Internet]. Sensors and Actuators B : Chemical. 2003 ; 91( 1-3): 370-377.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/s0925-4005(03)00111-4
Artigo de periodico
Use of HMDS/hexane double layers for obtaining low cost selective membrane (2003)
Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde ; Tan, Ing Hwie
Source: Cellulose. Unidade: EP
Subjects: SILÍCIO, PLASMA
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ABNT
SILVA, Maria Lucia Pereira da e DEMARQUETTE, Nicole Raymonde e TAN, Ing Hwie. Use of HMDS/hexane double layers for obtaining low cost selective membrane. Cellulose, v. 10, p. 171-178, 2003Tradução . . Acesso em: 14 out. 2024.
APA
Silva, M. L. P. da, Demarquette, N. R., & Tan, I. H. (2003). Use of HMDS/hexane double layers for obtaining low cost selective membrane. Cellulose, 10, 171-178.
NLM
Silva MLP da, Demarquette NR, Tan IH. Use of HMDS/hexane double layers for obtaining low cost selective membrane. Cellulose. 2003 ;10 171-178.[citado 2024 out. 14 ]
Vancouver
Silva MLP da, Demarquette NR, Tan IH. Use of HMDS/hexane double layers for obtaining low cost selective membrane. Cellulose. 2003 ;10 171-178.[citado 2024 out. 14 ]
Parte de monografia/livro
Plasma polymerized ethyl ether for obtaining thin films for sensor development (2003)
Lima, Roberto da Rocha; Carvalho, Rodrigo Amorim Motta; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde
Source: Microelectronic Technology and Devices SBMicro 2003. Unidades: IF, EP
Subjects: MICROELETRÔNICA, PLASMA (MICROELETRÔNICA)
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ABNT
LIMA, Roberto da Rocha et al. Plasma polymerized ethyl ether for obtaining thin films for sensor development. Microelectronic Technology and Devices SBMicro 2003. Tradução . Pennington: Electrochemical Society, 2003. . . Acesso em: 14 out. 2024.
APA
Lima, R. da R., Carvalho, R. A. M., Silva, M. L. P. da, & Demarquette, N. R. (2003). Plasma polymerized ethyl ether for obtaining thin films for sensor development. In Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society.
NLM
Lima R da R, Carvalho RAM, Silva MLP da, Demarquette NR. Plasma polymerized ethyl ether for obtaining thin films for sensor development. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Vancouver
Lima R da R, Carvalho RAM, Silva MLP da, Demarquette NR. Plasma polymerized ethyl ether for obtaining thin films for sensor development. In: Microelectronic Technology and Devices SBMicro 2003. Pennington: Electrochemical Society; 2003. [citado 2024 out. 14 ]
Artigo de periodico
Paper surface modification by plasma deposition of double layers of organic silicon compounds (2001)
Tan, Ing Hwie; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde
Source: Journal of Materials Chemistry. Unidade: EP
Assunto: ENGENHARIA METALÚRGICA
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ABNT
TAN, Ing Hwie e SILVA, Maria Lucia Pereira da e DEMARQUETTE, Nicole Raymonde. Paper surface modification by plasma deposition of double layers of organic silicon compounds. Journal of Materials Chemistry, v. 11, n. 4, p. 1019-1025, 2001Tradução . . Disponível em: https://doi.org/10.1039/b008050k. Acesso em: 14 out. 2024.
APA
Tan, I. H., Silva, M. L. P. da, & Demarquette, N. R. (2001). Paper surface modification by plasma deposition of double layers of organic silicon compounds. Journal of Materials Chemistry, 11( 4), 1019-1025. doi:10.1039/b008050k
NLM
Tan IH, Silva MLP da, Demarquette NR. Paper surface modification by plasma deposition of double layers of organic silicon compounds [Internet]. Journal of Materials Chemistry. 2001 ; 11( 4): 1019-1025.[citado 2024 out. 14 ] Available from: https://doi.org/10.1039/b008050k
Vancouver
Tan IH, Silva MLP da, Demarquette NR. Paper surface modification by plasma deposition of double layers of organic silicon compounds [Internet]. Journal of Materials Chemistry. 2001 ; 11( 4): 1019-1025.[citado 2024 out. 14 ] Available from: https://doi.org/10.1039/b008050k
Artigo de periodico
Modification of surface properties of alumina by plasma treatment (2000)
Pereira, Gilberto José; Silva, Maria Lucia Pereira da; Wang, Shu Hui ; Gouvêa, Douglas
Source: Journal of Materials Chemistry. Unidade: EP
Subjects: MATERIAIS (TRATAMENTO), CERÂMICA
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ABNT
PEREIRA, Gilberto José et al. Modification of surface properties of alumina by plasma treatment. Journal of Materials Chemistry, v. 10, n. 2, 2000Tradução . . Disponível em: https://doi.org/10.1039/a909049e. Acesso em: 14 out. 2024.
APA
Pereira, G. J., Silva, M. L. P. da, Wang, S. H., & Gouvêa, D. (2000). Modification of surface properties of alumina by plasma treatment. Journal of Materials Chemistry, 10( 2). doi:10.1039/a909049e
NLM
Pereira GJ, Silva MLP da, Wang SH, Gouvêa D. Modification of surface properties of alumina by plasma treatment [Internet]. Journal of Materials Chemistry. 2000 ; 10( 2):[citado 2024 out. 14 ] Available from: https://doi.org/10.1039/a909049e
Vancouver
Pereira GJ, Silva MLP da, Wang SH, Gouvêa D. Modification of surface properties of alumina by plasma treatment [Internet]. Journal of Materials Chemistry. 2000 ; 10( 2):[citado 2024 out. 14 ] Available from: https://doi.org/10.1039/a909049e
Trabalho de evento-anais periodico
Micromechanical structures development for chemical analysis: study of the porous silicon as adsorbent (1999)
Souza, Silvana Gasparotto de; Galeazzo, Elisabete ; Silva, Maria Lucia Pereira da; Furlan, Rogério ; Ramírez Fernandez, Francisco Javier
Source: Proceedings of SPIE. Conference titles: Electronics and Structures for MENS. Unidade: EP
Assunto: SENSORES ELETROMECÂNICOS
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ABNT
SOUZA, Silvana Gasparotto de et al. Micromechanical structures development for chemical analysis: study of the porous silicon as adsorbent. Proceedings of SPIE. Bellingham: Escola Politécnica, Universidade de São Paulo. . Acesso em: 14 out. 2024. , 1999
APA
Souza, S. G. de, Galeazzo, E., Silva, M. L. P. da, Furlan, R., & Ramírez Fernandez, F. J. (1999). Micromechanical structures development for chemical analysis: study of the porous silicon as adsorbent. Proceedings of SPIE. Bellingham: Escola Politécnica, Universidade de São Paulo.
NLM
Souza SG de, Galeazzo E, Silva MLP da, Furlan R, Ramírez Fernandez FJ. Micromechanical structures development for chemical analysis: study of the porous silicon as adsorbent. Proceedings of SPIE. 1999 ; 3891 376-394.[citado 2024 out. 14 ]
Vancouver
Souza SG de, Galeazzo E, Silva MLP da, Furlan R, Ramírez Fernandez FJ. Micromechanical structures development for chemical analysis: study of the porous silicon as adsorbent. Proceedings of SPIE. 1999 ; 3891 376-394.[citado 2024 out. 14 ]
Artigo de periodico
Experimental and theoretical characterization of f'SI' (och ind.3) (2) (och ind.2) (-): a gas phase fluoride-siloxirane adduct (1997)
Morgon, N A; Argenton, A B; Silva, Maria Lucia Pereira da; Riveros, José Manuel
Source: Journal of the American Chemical Society. Unidade: IQ
Assunto: TERMOQUÍMICA
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ABNT
MORGON, N A et al. Experimental and theoretical characterization of f'SI' (och ind.3) (2) (och ind.2) (-): a gas phase fluoride-siloxirane adduct. Journal of the American Chemical Society, v. 119, n. 7 , p. 1708-16, 1997Tradução . . Acesso em: 14 out. 2024.
APA
Morgon, N. A., Argenton, A. B., Silva, M. L. P. da, & Riveros, J. M. (1997). Experimental and theoretical characterization of f'SI' (och ind.3) (2) (och ind.2) (-): a gas phase fluoride-siloxirane adduct. Journal of the American Chemical Society, 119( 7 ), 1708-16.
NLM
Morgon NA, Argenton AB, Silva MLP da, Riveros JM. Experimental and theoretical characterization of f'SI' (och ind.3) (2) (och ind.2) (-): a gas phase fluoride-siloxirane adduct. Journal of the American Chemical Society. 1997 ;119( 7 ): 1708-16.[citado 2024 out. 14 ]
Vancouver
Morgon NA, Argenton AB, Silva MLP da, Riveros JM. Experimental and theoretical characterization of f'SI' (och ind.3) (2) (och ind.2) (-): a gas phase fluoride-siloxirane adduct. Journal of the American Chemical Society. 1997 ;119( 7 ): 1708-16.[citado 2024 out. 14 ]
Artigo de periodico
Gas-phase nucleophilic reactions in tetraalkoxysilanes (1995)
Silva, Maria Lucia Pereira da; Riveros, José Manuel
Source: Journal of Mass Spectrometry. Unidades: IQ, EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
SILVA, Maria Lucia Pereira da e RIVEROS, José Manuel. Gas-phase nucleophilic reactions in tetraalkoxysilanes. Journal of Mass Spectrometry, v. 30, p. 733-40, 1995Tradução . . Disponível em: https://doi.org/10.1002/jms.1190300512. Acesso em: 14 out. 2024.
APA
Silva, M. L. P. da, & Riveros, J. M. (1995). Gas-phase nucleophilic reactions in tetraalkoxysilanes. Journal of Mass Spectrometry, 30, 733-40. doi:10.1002/jms.1190300512
NLM
Silva MLP da, Riveros JM. Gas-phase nucleophilic reactions in tetraalkoxysilanes [Internet]. Journal of Mass Spectrometry. 1995 ;30 733-40.[citado 2024 out. 14 ] Available from: https://doi.org/10.1002/jms.1190300512
Vancouver
Silva MLP da, Riveros JM. Gas-phase nucleophilic reactions in tetraalkoxysilanes [Internet]. Journal of Mass Spectrometry. 1995 ;30 733-40.[citado 2024 out. 14 ] Available from: https://doi.org/10.1002/jms.1190300512

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