Simulation of anisotropic etching of silicon using a cellular automata model (2008)
Fonte: SBMICRO 2008: Anais. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
OLIVEIRA JUNIOR, Jose Pinto de e PAEZ CARREÑO, Marcelo Nelson. Simulation of anisotropic etching of silicon using a cellular automata model. 2008, Anais.. Pennington: The Electrochemical Society, 2008. Disponível em: https://doi.org/10.1149/1.2956015. Acesso em: 17 out. 2024.APA
Oliveira Junior, J. P. de, & Paez Carreño, M. N. (2008). Simulation of anisotropic etching of silicon using a cellular automata model. In SBMICRO 2008: Anais. Pennington: The Electrochemical Society. doi:10.1149/1.2956015NLM
Oliveira Junior JP de, Paez Carreño MN. Simulation of anisotropic etching of silicon using a cellular automata model [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2024 out. 17 ] Available from: https://doi.org/10.1149/1.2956015Vancouver
Oliveira Junior JP de, Paez Carreño MN. Simulation of anisotropic etching of silicon using a cellular automata model [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2024 out. 17 ] Available from: https://doi.org/10.1149/1.2956015