Electrical characterization of MOS capacitors with gate of nickel/aluminum (2001)
Source: Extended Abstracts. Conference titles: Workshop of SIBRATI. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
NAVIA, Alan Rodrigo e SANTOS FILHO, Sebastião Gomes dos. Electrical characterization of MOS capacitors with gate of nickel/aluminum. 2001, Anais.. São Paulo: EPUSP, 2001. Disponível em: http://www.lsi.usp.br/. Acesso em: 15 out. 2024.APA
Navia, A. R., & Santos Filho, S. G. dos. (2001). Electrical characterization of MOS capacitors with gate of nickel/aluminum. In Extended Abstracts. São Paulo: EPUSP. Recuperado de http://www.lsi.usp.br/NLM
Navia AR, Santos Filho SG dos. Electrical characterization of MOS capacitors with gate of nickel/aluminum [Internet]. Extended Abstracts. 2001 ;[citado 2024 out. 15 ] Available from: http://www.lsi.usp.br/Vancouver
Navia AR, Santos Filho SG dos. Electrical characterization of MOS capacitors with gate of nickel/aluminum [Internet]. Extended Abstracts. 2001 ;[citado 2024 out. 15 ] Available from: http://www.lsi.usp.br/