Source: Program. Conference titles: International Conference on the Structure of Non Crystalline Materials - NCM. Unidade: IFSC
Subjects: CRISTALIZAÇÃO, FILMES FINOS, SILICIO
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ABNT
ZANATTA, Antonio Ricardo e INGRAM, D. C. e KORDESCH, M. E. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. 2013, Anais.. Trento: University of Trento, 2013. . Acesso em: 07 jul. 2024.APA
Zanatta, A. R., Ingram, D. C., & Kordesch, M. E. (2013). Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. In Program. Trento: University of Trento.NLM
Zanatta AR, Ingram DC, Kordesch ME. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. Program. 2013 ;[citado 2024 jul. 07 ]Vancouver
Zanatta AR, Ingram DC, Kordesch ME. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. Program. 2013 ;[citado 2024 jul. 07 ]
