Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films (2013)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- Subjects: CRISTALIZAÇÃO; FILMES FINOS; SILICIO
- Language: Inglês
- Imprenta:
- Publisher: University of Trento
- Publisher place: Trento
- Date published: 2013
- Source:
- Título do periódico: Program
- Conference titles: International Conference on the Structure of Non Crystalline Materials - NCM
-
ABNT
ZANATTA, Antonio Ricardo e INGRAM, D. C. e KORDESCH, M. E. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. 2013, Anais.. Trento: University of Trento, 2013. . Acesso em: 29 set. 2024. -
APA
Zanatta, A. R., Ingram, D. C., & Kordesch, M. E. (2013). Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. In Program. Trento: University of Trento. -
NLM
Zanatta AR, Ingram DC, Kordesch ME. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. Program. 2013 ;[citado 2024 set. 29 ] -
Vancouver
Zanatta AR, Ingram DC, Kordesch ME. Influence of nickel concentration on the metal-induced crystallization of amorphous silicon thin films. Program. 2013 ;[citado 2024 set. 29 ] - Effect of Ga incorporation on photoinduced phenomena in Ge-S glasses
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