ReP USP - Resultado da busca

Artigo de periodico
The role of the substrate on the structure of reactive sputtered Co3O4: from polycrystalline to highly oriented films (2023)
Azevedo Neto, Nilton Francelosi ; Calligaris, Guilherme A. ; Affonço, Lucas Jorge; Zanatta, Antonio Ricardo ; Soares, Márcio Medeiros ; Silva, José Humberto Dias da
Source: Thin Solid Films. Unidade: IFSC
Subjects: FILMES FINOS, DIFRAÇÃO POR RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
AZEVEDO NETO, Nilton Francelosi et al. The role of the substrate on the structure of reactive sputtered Co3O4: from polycrystalline to highly oriented films. Thin Solid Films, v. 782, p. 140040-1-140040-7, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2023.140040. Acesso em: 04 set. 2024.
APA
Azevedo Neto, N. F., Calligaris, G. A., Affonço, L. J., Zanatta, A. R., Soares, M. M., & Silva, J. H. D. da. (2023). The role of the substrate on the structure of reactive sputtered Co3O4: from polycrystalline to highly oriented films. Thin Solid Films, 782, 140040-1-140040-7. doi:10.1016/j.tsf.2023.140040
NLM
Azevedo Neto NF, Calligaris GA, Affonço LJ, Zanatta AR, Soares MM, Silva JHD da. The role of the substrate on the structure of reactive sputtered Co3O4: from polycrystalline to highly oriented films [Internet]. Thin Solid Films. 2023 ; 782 140040-1-140040-7.[citado 2024 set. 04 ] Available from: https://doi.org/10.1016/j.tsf.2023.140040
Vancouver
Azevedo Neto NF, Calligaris GA, Affonço LJ, Zanatta AR, Soares MM, Silva JHD da. The role of the substrate on the structure of reactive sputtered Co3O4: from polycrystalline to highly oriented films [Internet]. Thin Solid Films. 2023 ; 782 140040-1-140040-7.[citado 2024 set. 04 ] Available from: https://doi.org/10.1016/j.tsf.2023.140040
Trabalho de evento-resumo
Compositional, structural, morphological and optical characterization of cobalt oxide thin films prepared by sputtering (2015)
Ferri, F. A.; Zanatta, Antonio Ricardo
Source: Resumos. Conference titles: Encontro Nacional de Física da Matéria Condensada. Unidade: IFSC
Subjects: FILMES FINOS, DIFRAÇÃO POR RAIOS X, COBALTO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
FERRI, F. A. e ZANATTA, Antonio Ricardo. Compositional, structural, morphological and optical characterization of cobalt oxide thin films prepared by sputtering. 2015, Anais.. São Paulo: Sociedade Brasileira de Física - SBF, 2015. Disponível em: http://www1.sbfisica.org.br/eventos/enfmc/xxxviii/sys/resumos/R0596-1.pdf. Acesso em: 04 set. 2024.
APA
Ferri, F. A., & Zanatta, A. R. (2015). Compositional, structural, morphological and optical characterization of cobalt oxide thin films prepared by sputtering. In Resumos. São Paulo: Sociedade Brasileira de Física - SBF. Recuperado de http://www1.sbfisica.org.br/eventos/enfmc/xxxviii/sys/resumos/R0596-1.pdf
NLM
Ferri FA, Zanatta AR. Compositional, structural, morphological and optical characterization of cobalt oxide thin films prepared by sputtering [Internet]. Resumos. 2015 ;[citado 2024 set. 04 ] Available from: http://www1.sbfisica.org.br/eventos/enfmc/xxxviii/sys/resumos/R0596-1.pdf
Vancouver
Ferri FA, Zanatta AR. Compositional, structural, morphological and optical characterization of cobalt oxide thin films prepared by sputtering [Internet]. Resumos. 2015 ;[citado 2024 set. 04 ] Available from: http://www1.sbfisica.org.br/eventos/enfmc/xxxviii/sys/resumos/R0596-1.pdf
Artigo de periodico
Influence of Ni concentration on the crystallization of amorphous Si films and on the development of different Ni-silicide phases (2014)
Zanatta, Antonio Ricardo; Ingram, D. C.; Kordesch, M. E.
Source: Journal of Applied Physics. Unidade: IFSC
Subjects: NÍQUEL, SEMICONDUTORES, DIFRAÇÃO POR RAIOS X, CRISTALIZAÇÃO, FILMES FINOS (COMPOSIÇÃO;ESTRUTURA;PROPRIEDADES)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
ZANATTA, Antonio Ricardo e INGRAM, D. C. e KORDESCH, M. E. Influence of Ni concentration on the crystallization of amorphous Si films and on the development of different Ni-silicide phases. Journal of Applied Physics, v. 116, n. 12, p. 123508-1-123508-6, 2014Tradução . . Disponível em: https://doi.org/10.1063/1.4896589. Acesso em: 04 set. 2024.
APA
Zanatta, A. R., Ingram, D. C., & Kordesch, M. E. (2014). Influence of Ni concentration on the crystallization of amorphous Si films and on the development of different Ni-silicide phases. Journal of Applied Physics, 116( 12), 123508-1-123508-6. doi:10.1063/1.4896589
NLM
Zanatta AR, Ingram DC, Kordesch ME. Influence of Ni concentration on the crystallization of amorphous Si films and on the development of different Ni-silicide phases [Internet]. Journal of Applied Physics. 2014 ; 116( 12): 123508-1-123508-6.[citado 2024 set. 04 ] Available from: https://doi.org/10.1063/1.4896589
Vancouver
Zanatta AR, Ingram DC, Kordesch ME. Influence of Ni concentration on the crystallization of amorphous Si films and on the development of different Ni-silicide phases [Internet]. Journal of Applied Physics. 2014 ; 116( 12): 123508-1-123508-6.[citado 2024 set. 04 ] Available from: https://doi.org/10.1063/1.4896589

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