Deposition rate influence in O3 sensing response of sputtered ZnO thin films (2017)
- Authors:
- USP affiliated authors: CORRER, WAGNER RAFAEL - IFSC ; MASTELARO, VALMOR ROBERTO - IFSC
- Unidade: IFSC
- DOI: 10.3390/proceedings1040429
- Subjects: OZÔNIO; SENSOR; NANOCOMPOSITOS
- Keywords: Metal oxide gas sensor; Zinc oxide; RF-sputtering synthesis; Gas sensing effects
- Language: Inglês
- Imprenta:
- Source:
- Título: Proceedings
- ISSN: 2504-3900
- Volume/Número/Paginação/Ano: v. 1, n. 4, p. 429-1-429-4, Sept. 2017
- Conference titles: Eurosensors
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
COLMENARES, Nathaly e CORRER, Wagner Rafael e MASTELARO, Valmor Roberto. Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. Disponível em: https://doi.org/10.3390/proceedings1040429. Acesso em: 25 jan. 2026. , 2017 -
APA
Colmenares, N., Correr, W. R., & Mastelaro, V. R. (2017). Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. doi:10.3390/proceedings1040429 -
NLM
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2026 jan. 25 ] Available from: https://doi.org/10.3390/proceedings1040429 -
Vancouver
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2026 jan. 25 ] Available from: https://doi.org/10.3390/proceedings1040429 - Zinc oxide sputtered films for ozone gas sensing
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Informações sobre o DOI: 10.3390/proceedings1040429 (Fonte: oaDOI API)
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