Deposition rate influence in O3 sensing response of sputtered ZnO thin films (2017)
- Authors:
- USP affiliated authors: CORRER, WAGNER RAFAEL - IFSC ; MASTELARO, VALMOR ROBERTO - IFSC
- Unidade: IFSC
- DOI: 10.3390/proceedings1040429
- Subjects: OZÔNIO; SENSOR; NANOCOMPOSITOS
- Keywords: Metal oxide gas sensor; Zinc oxide; RF-sputtering synthesis; Gas sensing effects
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Proceedings
- ISSN: 2504-3900
- Volume/Número/Paginação/Ano: v. 1, n. 4, p. 429-1-429-4, Sept. 2017
- Conference titles: Eurosensors
- Este periódico é de assinatura
- Este artigo é de acesso aberto
- URL de acesso aberto
- Cor do Acesso Aberto: hybrid
- Licença: cc-by
-
ABNT
COLMENARES, Nathaly e CORRER, Wagner Rafael e MASTELARO, Valmor Roberto. Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. Disponível em: https://doi.org/10.3390/proceedings1040429. Acesso em: 01 out. 2024. , 2017 -
APA
Colmenares, N., Correr, W. R., & Mastelaro, V. R. (2017). Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. doi:10.3390/proceedings1040429 -
NLM
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2024 out. 01 ] Available from: https://doi.org/10.3390/proceedings1040429 -
Vancouver
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2024 out. 01 ] Available from: https://doi.org/10.3390/proceedings1040429 - XAS and XPS studies of Zn1-xCoxO thin films applied as gas sensors
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Informações sobre o DOI: 10.3390/proceedings1040429 (Fonte: oaDOI API)
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