Study of sputtering processes, on metallic thin films, due to low energy ion implantation (2013)
- Authors:
- USP affiliated authors: RIZZUTTO, MARCIA DE ALMEIDA - IF ; SILVA, TIAGO FIORINI DA - IF ; ADDED, NEMITALA - IF ; TABACNIKS, MANFREDO HARRI - IF
- Unidade: IF
- Subjects: FÍSICA (ESTUDO E ENSINO) (CONGRESSOS); REAÇÕES NUCLEARES
- Language: Inglês
- Imprenta:
- Conference titles: Reunião de Trabalho sobre Física Nuclear no Brasil
-
ABNT
ROSA, Edson P et al. Study of sputtering processes, on metallic thin films, due to low energy ion implantation. 2013, Anais.. São Paulo: SBF, 2013. Disponível em: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf. Acesso em: 27 dez. 2025. -
APA
Rosa, E. P., Marcia A. Rizzutto,, Rodrigues, C. L., Trindade, G. F., Silva, T. F. da, Moro, M. V., et al. (2013). Study of sputtering processes, on metallic thin films, due to low energy ion implantation. In . São Paulo: SBF. Recuperado de http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf -
NLM
Rosa EP, Marcia A. Rizzutto, Rodrigues CL, Trindade GF, Silva TF da, Moro MV, Added N, Tabacniks MH. Study of sputtering processes, on metallic thin films, due to low energy ion implantation [Internet]. 2013 ;[citado 2025 dez. 27 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf -
Vancouver
Rosa EP, Marcia A. Rizzutto, Rodrigues CL, Trindade GF, Silva TF da, Moro MV, Added N, Tabacniks MH. Study of sputtering processes, on metallic thin films, due to low energy ion implantation [Internet]. 2013 ;[citado 2025 dez. 27 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf - Automatic energy calibration algorithm for an RBS setup
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