Production of hidrogenated amorphous silicon films frow a low frequency glow discharge

Production of hidrogenated amorphous silicon films frow a low frequency glow discharge (1992)

Authors:
Autor USP: BAGNATO, VANDERLEI SALVADOR - IFQSC
Unidade: IFQSC
Subjects: CIRCUITOS ELETRÔNICOS; MATÉRIA CONDENSADA
Language: Inglês
Imprenta:
- Publisher: UNICAMP
- Publisher place: Campinas
- Date published: 1992
Source:
- Título: Proccedings
Conference titles: Workshop on Crystalline and Amorphous Silicon and its Alloys

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ABNT

FRAGALLI, J. F. et al. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. 1992, Anais.. Campinas: UNICAMP, 1992. . Acesso em: 10 jan. 2026.
APA

Fragalli, J. F., Misoguti, L., Nakagaito, A. N., Branz, H., Grivickas, V., & Bagnato, V. S. (1992). Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. In Proccedings. Campinas: UNICAMP.
NLM

Fragalli JF, Misoguti L, Nakagaito AN, Branz H, Grivickas V, Bagnato VS. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. Proccedings. 1992 ;[citado 2026 jan. 10 ]
Vancouver

Fragalli JF, Misoguti L, Nakagaito AN, Branz H, Grivickas V, Bagnato VS. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. Proccedings. 1992 ;[citado 2026 jan. 10 ]